专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06518193B1 Substrate processing system 有权
公开(公告)号：US06518193B1
公开(公告)日：2003-02-11
申请号：US09802424
申请日：2001-03-09
申请人： Kiran Kumar , Zhihai Wang , Rudy Rios , Wilbur G. Catabay , Richard D. Schinella
发明人： Kiran Kumar , Zhihai Wang , Rudy Rios , Wilbur G. Catabay , Richard D. Schinella
IPC分类号： H01L21302
CPC分类号： H01L21/67167 , C23C14/566 , C23C16/4401 , H01L21/67017 , H01L21/67201 , H01L21/76802 , H01L21/76843
摘要： An apparatus for performing contaminant sensitive processing on a substrate. A substrate load chamber receives the substrate from an ambient contaminant laden environment, and isolates the substrate from the ambient contaminant laden environment. The substrate load chamber further forms a first environment of intermediate cleanliness around the substrate. A substrate pass through chamber receives the substrate from the substrate load chamber, and isolates the substrate from the intermediate cleanliness of the first environment of the substrate load chamber. The substrate pass through chamber further forms a second environment of high cleanliness around the substrate. A substrate transfer chamber receives the substrate from the substrate pass through chamber, and isolates the substrate from the high cleanliness of the second environment of the substrate pass through chamber. The substrate transfer chamber maintains a third environment of high cleanliness around the substrate, and transfers the substrate into more than one substrate processing chambers, where the substrate is selectively transferred into and out of the more than one substrate processing chambers without leaving the high cleanliness of the third environment. The substrate transfer chamber also selectively passes the substrate to the substrate pass through chamber when the substrate pass through chamber has formed the high cleanliness of the second environment. The substrate pass through chamber also receives the substrate from the substrate transfer chamber, and selectively passes the substrate to the substrate load chamber when the substrate load chamber has formed the intermediate cleanliness of the first environment. The substrate load chamber receives the substrate from the substrate pass through chamber, and selectively passes the substrate out of the substrate load chamber and into the ambient contaminant laden environment when the substrate load chamber is not open to the substrate pass through chamber.

IPRDB

热门服务

关于我们

友情链接

联系方式