会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • DUAL-SIDE IMPRINTING LITHOGRAPHY SYSTEM
    • 双面印刷系统
    • US20090061035A1
    • 2009-03-05
    • US12035702
    • 2008-02-22
    • Eun-hyoung CHOSung-hoon CHOAJin-seung SOHNDu-hyun LEE
    • Eun-hyoung CHOSung-hoon CHOAJin-seung SOHNDu-hyun LEE
    • B29C35/08
    • G03F7/0002B82Y10/00B82Y40/00
    • Provided is a dual-side imprinting lithography system that includes a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin; a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit; a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit; a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays; and a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays.
    • 提供了一种双面压印光刻系统,其包括支撑介质的介质支撑单元,其中介质的两个表面都涂覆有紫外线(UV)硬化树脂; 第一模具支撑单元和第二模具支撑单元,其分别支撑分别位于介质支撑单元的上方和介质支撑单元下方的第一模具和第二模具; 垂直移动装置,其垂直移动介质支撑单元,第一模具支撑单元和第二模具支撑单元中的至少一个; 第一UV辐射装置,其安装在第一模具支撑单元上方以辐射紫外线; 以及第二UV辐射装置,其安装在所述第二模具支撑单元的下方以辐射紫外线。