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    • 2. 发明授权
    • Photographic elements coated on transparent support with reflective protective overcoat
    • 照相元件涂在透明支架上,带反光保护罩
    • US06586165B2
    • 2003-07-01
    • US09844230
    • 2001-04-27
    • Kevin M. DonovanGlenn M. BrownLloyd A. Lobo
    • Kevin M. DonovanGlenn M. BrownLloyd A. Lobo
    • G03C1795
    • G03C1/7614G03C1/76G03C2001/7635G03C2007/3027Y10S430/151
    • The present invention is a photographic element which includes, in order, a transparent support, at least one silver halide emulsion layer superposed on the support, optionally a white or diffuse reflective layer, and a processing-solution-permeable protective layer on the backside, which protective layer becomes water-resistant in the final product without lamination or fusing. The present invention is also directed to a method of making a photographic print involving developing the photographic element. The resulting print is viewed through the support, which provides protection against scratches and stains, while the polymeric overcoat provides water and stain protection to the reverse of the print where minor scratches or damage are not critical, since the image is not viewed from this side. Thus, this invention provides for a tough, stain resistant and transparent viewing surface and a stain resistant back side, which is permeable to processing solutions.
    • 本发明涉及一种照相元件,其中依次包括透明支持体,叠置在支持体上的至少一个卤化银乳剂层,任选地为白色或漫反射层,背面为处理剂溶液可渗透的保护层, 该保护层在最终产品中不会层压或熔化而变得耐水。 本发明还涉及一种制造涉及显影照相元件的照相印刷品的方法。 通过支撑件观察所得到的印刷品,其提供防划伤和污渍的保护,而聚合物外涂层对印刷品的相反部分提供防水和防污染,其中轻微的划痕或损伤不是关键的,因为从该侧看不到图像 。 因此,本发明提供了对加工溶液是可渗透的韧性,耐污染和透明的观察表面和防污背面。
    • 3. 发明授权
    • Method for processing a photographic element comprising a simultaneously coated protective overcoat
    • 用于处理包含同时涂覆的保护性外涂层的照相元件的方法
    • US06432623B1
    • 2002-08-13
    • US09844050
    • 2001-04-27
    • Kevin M. DonovanLloyd A. Lobo
    • Kevin M. DonovanLloyd A. Lobo
    • G03C526
    • G03C1/7614Y10S430/136
    • A method of processing a photographic imaging element to obtain a protective overcoat is disclosed, which overcoat provides, in the final product, resistance to fingerprints, common stains, and spills. More particularly, the present invention involves a processing-solution-permeable overcoat that becomes water and stain resistant in the photochemically processed product. The overcoat formulation comprises at least one water-dispersible hydrophobic polymer interspersed with a water-soluble polymer. During development or thereafter, before drying, the water-soluble polymer is removed to a significant extent. Subsequently, the imaged element is dried at an elevated temperature to facilitate coalescence of the overcoat to thereby provide enhanced stain resistance and water-resistance.
    • 公开了一种处理照相成像元件以获得保护性外涂层的方法,该外涂层在最终产品中提供对指纹,常见污渍和溢出物的抵抗性。 更具体地说,本发明涉及一种在光化学处理产品中变得防水和防污的加工溶液渗透性外涂层。 外涂层制剂包含至少一种散布有水溶性聚合物的水分散性疏水性聚合物。 在显影过程中或此后,在干燥之前,将水溶性聚合物除去至显着的程度。 随后,将成像元件在升高的温度下干燥以促进外涂层的聚结,从而提供增强的耐污染性和耐水性。