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1. 发明授权

US08119392B2 Biocompatible resists 有权
标题翻译：生物相容的抗蚀剂
公开(公告)号：US08119392B2
公开(公告)日：2012-02-21
申请号：US10835757
申请日：2004-04-30
申请人： Kenneth E. Gonsalves , Wei He
发明人： Kenneth E. Gonsalves , Wei He
IPC分类号： C12M1/00 , A61K47/48 , A61K38/06
CPC分类号： G03F7/0392 , G03F7/265
摘要： This invention relates to biomaterials, biocompatible photoresists, and electroactive photoresists, and methods to engineer the interactions between biomaterials and cells. In one aspect, this invention provides for modifying surface topography through micro-patterning techniques that require no organic solvent development to reveal the lithographic patterns. Cells can be cultured on these surfaces directly and exhibit strong cell alignment features.
摘要翻译：本发明涉及生物材料，生物相容性光致抗蚀剂和电活性光致抗蚀剂，以及设计生物材料与细胞之间相互作用的方法。在一个方面，本发明提供了通过不需要有机溶剂开发来显示平版印刷图案的微图案化技术改性表面形貌。可以直接在这些表面上培养细胞并显示出强的细胞对准特征。

2. 发明授权

US07776505B2 High resolution resists for next generation lithographies 有权
标题翻译：高分辨率可抵抗下一代平版印刷
公开(公告)号：US07776505B2
公开(公告)日：2010-08-17
申请号：US11226912
申请日：2005-09-14
申请人： Kenneth E. Gonsalves
发明人： Kenneth E. Gonsalves
IPC分类号： G03F7/028 , G03F7/039
CPC分类号： G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： The present invention addresses many of the current limitations in sub-100 nm lithographic techniques by providing novel resists that achieve high sensitivity, high contrast, high resolution, and high dry-etch resistance for pattern transfer to a substrate. In one embodiment, the present invention provides a polymeric resist comprising an adamantyl component and a photoacid generating component.
摘要翻译：本发明通过提供新颖的抗蚀剂来解决亚100nm光刻技术中的许多当前局限，其实现了高灵敏度，高对比度，高分辨率和高的干蚀刻电阻，用于图案转印到衬底。在一个实施方案中，本发明提供了包含金刚烷基组分和光酸产生组分的聚合物抗蚀剂。

3. 发明授权

US4842641A Synthesis of iron-cobalt powders 失效
标题翻译：铁钴粉末的合成
公开(公告)号：US4842641A
公开(公告)日：1989-06-27
申请号：US183931
申请日：1988-04-20
申请人： Kenneth E. Gonsalves
发明人： Kenneth E. Gonsalves
IPC分类号： B22F9/30 , C01G51/00 , H01F1/06
CPC分类号： H01F1/06 , B22F9/305 , C01G51/006 , C01P2002/72 , C01P2002/74 , C01P2002/82 , C01P2004/10 , C01P2006/40
摘要： This invention is directed to the preparation of Iron-cobalt powders by reacting iron tricobalt hydrido dodecacarbonyl with iron pentacarbonyl and pyrolyzing the resulting metal-organic iron cobalt clusters.
摘要翻译：本发明涉及通过使三钴十二羰基铁与五羰基铁反应并使得到的金属 - 有机铁钴簇发生热解制备铁 - 钴粉末。

4. 发明授权

US08685616B2 Photoacid generators and lithographic resists comprising the same 有权
标题翻译：光生酸产生剂和包含其的光刻抗蚀剂
公开(公告)号：US08685616B2
公开(公告)日：2014-04-01
申请号：US12997132
申请日：2009-06-10
申请人： Kenneth E. Gonsalves , Mingxing Wang
发明人： Kenneth E. Gonsalves , Mingxing Wang
IPC分类号： G03F7/004 , C07C303/38 , G03F7/039
CPC分类号： G03F7/027 , C07C303/38 , C07C309/65 , C07C309/73 , C07C309/75 , C07C311/48 , C07C381/12 , C07C2602/42 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0397 , Y10S430/106 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
摘要翻译：本发明提供用于化学放大抗蚀剂的光酸产生剂和使用其的光刻法。

5. 发明授权

US07833690B2 Photoacid generators and lithographic resists comprising the same 有权
标题翻译：光生酸产生剂和包含其的光刻抗蚀剂
公开(公告)号：US07833690B2
公开(公告)日：2010-11-16
申请号：US11544463
申请日：2006-10-06
申请人： Kenneth E. Gonsalves , Mingxing Wang
发明人： Kenneth E. Gonsalves , Mingxing Wang
IPC分类号： G03C1/73 , G03F7/004 , G03F7/029
CPC分类号： G03F7/0045 , C07C309/29 , C07C309/42 , C07C381/12 , G03F7/0397 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I):
摘要翻译：本发明涉及光酸产生化合物，包含光酸产生化合物的平版印刷抗蚀剂，以及各种光刻工艺技术和应用。在一个实施方案中，本发明提供式（I）的光酸产生剂：

6. 发明授权

US5589011A Nanostructured steel alloy 失效
标题翻译：纳米结构钢合金
公开(公告)号：US5589011A
公开(公告)日：1996-12-31
申请号：US389778
申请日：1995-02-15
申请人： Kenneth E. Gonsalves
发明人： Kenneth E. Gonsalves
IPC分类号： B22F1/00 , B22F9/24 , B22F9/30 , C01B31/30 , C22C33/02 , C22C38/22 , C22C38/24
CPC分类号： B82Y30/00 , B22F1/0018 , B22F1/0044 , B22F9/24 , B22F9/30 , B22F9/305 , C01B31/301 , C01B31/303 , C22C33/0257 , B22F2005/001 , B22F2009/041 , B22F2998/00 , B22F2998/10 , C01P2002/60 , C01P2002/72 , C01P2002/85 , C01P2004/03 , C01P2004/04 , C01P2004/64
摘要： A nanostructured steel alloy is presented. Preferably, the nanostructured steel is of the M50 type, and comprises iron, molybdenum, chromium, vanadium and carbon. In accordance with an important feature of this invention, the grain size of the steel is in the nanometer range. In accordance with the method of the present invention, the nanostructured steel is prepared via chemical synthesis from iron, molybdenum, chromium and vanadium starting materials. Decomposition of metal precursors or reduction of metal halides is followed by consolidation of the resulting nanostructured steel powders into bulk steel. The nanostructured steel of this invention finds particular utility in the manufacture of cutting tools and bearings.
摘要翻译：提出了一种纳米结构钢合金。优选地，纳米结构钢是M50型，并且包括铁，钼，铬，钒和碳。根据本发明的重要特征，钢的晶粒尺寸在纳米范围内。根据本发明的方法，通过化学合成从铁，钼，铬和钒原料制备纳米结构钢。金属前体的分解或金属卤化物的还原之后，将所得的纳米结构的钢粉末固结成块体钢。本发明的纳米结构钢在切削工具和轴承的制造中具有特别的用途。

7. 发明申请

US20110218140A1 BIODEGRADABLE THERAPEUTIC NANOPARTICLES CONTAINING AN ANTIMICROBIAL AGENT 审中-公开
标题翻译：包含抗微生物剂的生物可降解的治疗性纳米颗粒
公开(公告)号：US20110218140A1
公开(公告)日：2011-09-08
申请号：US12866939
申请日：2009-01-13
申请人： Kenneth E. Gonsalves , Michael J. Bosse , John Kent Ellington , Michael C. Hudson , James M. Horton
发明人： Kenneth E. Gonsalves , Michael J. Bosse , John Kent Ellington , Michael C. Hudson , James M. Horton
IPC分类号： A61K38/14 , A61K31/43 , A61P31/04 , A61P19/00 , B65D85/00 , B82Y5/00
CPC分类号： A61K9/5146 , A61J1/18 , A61K9/5138 , A61K9/5153 , A61K31/43 , A61K38/14
摘要： Compositions that include antimicrobial agents and biodegradable delivery-vehicles adapted to enter a cell and release the antimicrobial agents in the cell as they biodegrade. Also provided are compositions that include first and second delivery vehicles including first and second antimicrobial agents, wherein the first delivery vehicles are adapted to release the first antimicrobial agents at a rate that differs from that at which the second delivery vehicles release the second antimicrobial agents, articles of manufacture that include one or more biodegradable delivery vehicles, and methods of making and using the compositions to treat intracellular and/or extracellular infections are disclosed.
摘要翻译：包括抗微生物剂和可生物降解的递送载体的组合物，其适于进入细胞并在生物降解时将细胞中的抗微生物剂释放。还提供了包含第一和第二递送载体的组合物，其包括第一和第二抗微生物剂，其中第一递送载体适于以不同于第二递送载体释放第二抗微生物剂的速率释放第一抗微生物剂，公开了包括一种或多种可生物降解的递送载体的制品，以及制备和使用该组合物以治疗细胞内和/或细胞外感染的方法。

8. 发明申请

US20110159431A1 PHOTOACID GENERATORS AND LITHOGRAPHIC RESISTS COMPRISING THE SAME 有权
标题翻译：光电发生器和包含它的光刻电阻
公开(公告)号：US20110159431A1
公开(公告)日：2011-06-30
申请号：US12997132
申请日：2009-06-10
申请人： Kenneth E. Gonsalves , Mingxing Wang
发明人： Kenneth E. Gonsalves , Mingxing Wang
IPC分类号： G03F7/004 , C07C311/48 , C07D333/46 , C07C309/73 , G03F7/20 , C07C309/65
CPC分类号： G03F7/027 , C07C303/38 , C07C309/65 , C07C309/73 , C07C309/75 , C07C311/48 , C07C381/12 , C07C2602/42 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0397 , Y10S430/106 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
摘要翻译：本发明提供用于化学放大抗蚀剂和使用其的光刻工艺的光酸发生剂。

9. 发明授权

US07008749B2 High resolution resists for next generation lithographies 失效
公开(公告)号：US07008749B2
公开(公告)日：2006-03-07
申请号：US09992560
申请日：2001-11-05
申请人： Kenneth E. Gonsalves
发明人： Kenneth E. Gonsalves
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30 , C08F30/08 , C08F28/02
CPC分类号： B82Y30/00 , G03F7/0007 , G03F7/0045 , G03F7/0047 , G03F7/038 , G03F7/0392 , G03F7/075 , G03F7/0752 , G03F7/0755 , G03F7/0757 , G03F7/0758 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126 , Y10S430/143 , Y10S430/167
摘要： The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

10. 发明授权

US6033624A Methods for the manufacturing of nanostructured metals, metal carbides, and metal alloys 失效
标题翻译：纳米结构金属，金属碳化物和金属合金的制造方法
公开(公告)号：US6033624A
公开(公告)日：2000-03-07
申请号：US719228
申请日：1996-09-25
申请人： Kenneth E. Gonsalves , Sri Prakash Rangarajan
发明人： Kenneth E. Gonsalves , Sri Prakash Rangarajan
IPC分类号： B22F1/00 , B22F9/24 , B22F9/30 , C01B31/30 , C22C33/02 , B22F3/00
CPC分类号： B22F1/0018 , B22F1/0044 , B22F9/24 , B22F9/30 , B22F9/305 , B82Y30/00 , C01B31/301 , C01B31/303 , C22C33/0257 , B22F2005/001 , B22F2009/041 , B22F2998/00 , B22F2998/10 , C01P2002/60 , C01P2002/72 , C01P2002/85 , C01P2004/03 , C01P2004/04 , C01P2004/64 , Y10S977/776 , Y10S977/777
摘要： Methods for the manufacture of nanostructured metals, metal carbides, and metal alloys are presented, such metals including nanostructured aluminum, chromium, iron, molybdenum, vanadium, and steel. Preferably, the nanostructured steel is of the M50 type, and comprises iron, molybdenum, chromium, vanadium and carbon. Synthesis of M50 steel further comprising nanostructured aluminum, aluminum oxide, or aluminum nitride is also described. In accordance with an important feature of this invention, the grain size of the metals and metal alloys is in the nanometer range. In accordance with the method of the present invention, the nanostructured metals, metal carbides, and metal alloys are prepared via chemical synthesis from aluminum, iron, molybdenum, chromium and vanadium starting materials. Decomposition of metal precursors or co-precipitation or precipitation of metal precursors is followed by consolidation of the resulting nanostructured powders. Alternatively, nanostructured M50 steel may be obtained by mixing of nanocrystalline chromium, iron, molybdenum, and vanadium powders, followed by ball-milling, and consolidation. The nanostructured metals, metal carbides, and metal alloys of this invention find particular utility in the manufacture of cutting tools and bearings, and in ferrofluids, magnetic memory systems, and catalysis.
摘要翻译：提出了制造纳米结构金属，金属碳化物和金属合金的方法，包括纳米结构铝，铬，铁，钼，钒和钢等金属。优选地，纳米结构钢是M50型，并且包括铁，钼，铬，钒和碳。还描述了进一步包含纳米结构铝，氧化铝或氮化铝的M50钢的合成。根据本发明的重要特征，金属和金属合金的晶粒尺寸在纳米范围内。根据本发明的方法，通过铝，铁，钼，铬和钒原料的化学合成制备纳米结构金属，金属碳化物和金属合金。金属前体的分解或金属前体的共沉淀或沉淀之后，将所得的纳米结构粉末固结。或者，可以通过混合纳米晶体铬，铁，钼和钒粉末，然后进行球磨和固结来获得纳米结构的M50钢。本发明的纳米结构金属，金属碳化物和金属合金在制造切削工具和轴承以及在铁磁流体，磁存储器系统和催化中尤其有用。

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