专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060124869A1 Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object 有权
标题翻译：电子束照射装置，电子束照射方法及其制造方法及其制造方法
公开(公告)号：US20060124869A1
公开(公告)日：2006-06-15
申请号：US11335950
申请日：2006-01-20
申请人： Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
发明人： Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
IPC分类号： G21K5/10
CPC分类号： H01J37/3023 , H01J37/3056 , H01J2237/20214 , H01J2237/20221 , H01J2237/30461 , H01J2237/3156 , H01J2237/316 , H01J2237/3165
摘要： Disclosed are an electron beam irradiation apparatus and an electron beam irradiation method that are capable of easily curing a material that is hard to be cured by irradiation of ultraviolet rays and of reducing the number of electron beam irradiation tubes. The electron beam irradiation apparatus has a motor for rotationally driving an irradiation target object, a shield container for rotatably accommodating the irradiation target object, and an electron beam irradiation unit provided in the shield container so that the surface of the irradiation target object is irradiated with electron beams, wherein the electron beam irradiation unit and the irradiation target object are relatively moved when the electron beam irradiation unit irradiates the surface of the irradiation target object with the electron beams during a rotation of the irradiation target object.
摘要翻译：公开了一种电子束照射装置和电子束照射方法，其能够容易地固化通过紫外线的照射难以固化的材料并减少电子束照射管的数量。电子束照射装置具有旋转驱动被照射物体的电动机，用于可旋转地容纳被照射物的保护容器和设置在该屏蔽容器内的电子射线照射部，照射被照射物体的表面被照射电子束，其中当电子束照射单元在照射目标物体旋转期间用电子束照射被照射物体的表面时，电子束照射单元和照射目标物体相对移动。

2. 发明申请

US20060098550A1 Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object 有权
标题翻译：电子束照射装置，电子束照射方法及其制造方法及其制造方法
公开(公告)号：US20060098550A1
公开(公告)日：2006-05-11
申请号：US10528518
申请日：2003-09-18
申请人： Mamoru Usami , Kazushi Tanaka , Kenji Yoneyama , Yukio Kaneko , Takeshi Umega
发明人： Mamoru Usami , Kazushi Tanaka , Kenji Yoneyama , Yukio Kaneko , Takeshi Umega
IPC分类号： G11B7/00
CPC分类号： G21K5/04 , G11B7/26
摘要： An electron beam irradiation apparatus and method capable of easily curing at least part of a surface layer and/or a resin layer composed of materials that are hard to be cured by irradiation of ultraviolet rays. A disc-shaped object manufacturing apparatus and method capable of efficiently forming, on the disc-shaped object, at least part of a surface layer and/or a resin layer such as light transmitting layer, etc, thereunder. An electron beam irradiation apparatus comprises a rotary driving unit for rotationally driving an object, a shield container rotatably accommodating the object, and an electron beam irradiation unit provided in the shield container so that the surface of the object is irradiated with electron beams from an irradiation window thereof, wherein the surface of the object is irritated with the electron beams during its rotation from the irradiation window of the election beam irradiation unit. The surface of the on-rotating object can be thereby irradiated with the electron beams having larger energy than the ultraviolet rays have.
摘要翻译：一种电子束照射装置和方法，其能够容易地固化由通过紫外线的照射而难以固化的材料构成的表面层和/或树脂层的至少一部分。一种盘形物体的制造装置和方法，其能够在盘状物体上有效地形成表面层和/或树脂层如透光层等的至少一部分。一种电子束照射装置，包括用于旋转驱动物体的旋转驱动单元，可旋转地容纳物体的屏蔽容器和设置在屏蔽容器中的电子束照射单元，使得物体的表面被来自照射的电子束照射窗口，其中物体的表面在其从选择光束照射单元的照射窗口旋转期间被电子束刺激。因此，可以用比紫外线具有的能量大的电子束照射旋转物体的表面。

3. 发明申请

US20070280516A1 Artificial Fingerprint Sticking Method, Artificial Fingerprint Sticking Apparatus, Artificial Fingerprint Wiping Method, And Artificial Fingerprint Wiping Apparatus 审中-公开
标题翻译：人造指纹贴附方法，人造指纹贴附装置，人造指纹擦拭方法和人造指纹擦拭装置
公开(公告)号：US20070280516A1
公开(公告)日：2007-12-06
申请号：US11547615
申请日：2005-04-08
申请人： Kenji Yoneyama , Takeshi Umega , Naoki Hayashida , Hidetake Itoh , Kazushi Tanaka , Mamoru Usami , Kazuki Suzawa
发明人： Kenji Yoneyama , Takeshi Umega , Naoki Hayashida , Hidetake Itoh , Kazushi Tanaka , Mamoru Usami , Kazuki Suzawa
IPC分类号： G06K9/00
CPC分类号： G11B7/268 , G11B7/00375
摘要： An object is to stick an artificial fingerprint liquid on a test sample in a constant condition. An artificial fingerprint stamping apparatus 1 operates such that as an arm 10 lowers, the self weight of a stamp unit 3 causes an artificial fingerprint transfer member 9 at the lower end of a stamp pin 6 attached to the arm 10 via a ball bush 11 to be pressed against an artificial fingerprint liquid transfer disk D1 for a predefined period of time, and thus an artificial fingerprint liquid is transferred onto the lower end surface of the artificial fingerprint transfer member 9. Then, after the artificial fingerprint transfer member 9 is positioned above a test disc D1, the arm 10 is lowered so that the self weight of the stamp unit 3 causes the artificial fingerprint transfer member 9 to be pressed against the test disc D1 for a predefined period of time.
摘要翻译：目的是将人造指纹液固定在测试样品上。人造指纹冲压装置1的操作使得当手臂10降低时，印模单元3的自重使印模销6的下端处的人造指纹转印构件9经由滚珠衬套11至按压人造指纹液转印盘D 1预定的时间，由此将人造指纹液转印到人造指纹转印部件9的下端面上。然后，在将人造指纹转印部件9定位在测试盘D 1上方，臂10被降低，使得印模单元3的自重使人造指纹转印构件9在预定时间段内被压靠在测试盘D1上。

4. 发明授权

US07205558B2 Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object 有权
标题翻译：电子束照射装置，电子束照射方法及其制造方法及其制造方法
公开(公告)号：US07205558B2
公开(公告)日：2007-04-17
申请号：US11335950
申请日：2006-01-20
申请人： Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
发明人： Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
IPC分类号： G21K5/10
CPC分类号： H01J37/3023 , H01J37/3056 , H01J2237/20214 , H01J2237/20221 , H01J2237/30461 , H01J2237/3156 , H01J2237/316 , H01J2237/3165
摘要： Disclosed are an electron beam irradiation apparatus and an electron beam irradiation method that are capable of easily curing a material that is hard to be cured by irradiation of ultraviolet rays and of reducing the number of electron beam irradiation tubes. The electron beam irradiation apparatus has a motor for rotationally driving an irradiation target object, a shield container for rotatably accommodating the irradiation target object, and an electron beam irradiation unit provided in the shield container so that the surface of the irradiation target object is irradiated with electron beams, wherein the electron beam irradiation unit and the irradiation target object are relatively moved when the electron beam irradiation unit irradiates the surface of the irradiation target object with the electron beams during a rotation of the irradiation target object.
摘要翻译：公开了一种电子束照射装置和电子束照射方法，其能够容易地固化通过紫外线的照射难以固化的材料并减少电子束照射管的数量。电子束照射装置具有旋转驱动被照射物体的电动机，用于可旋转地容纳被照射物的保护容器和设置在该屏蔽容器内的电子射线照射部，照射被照射物体的表面被照射电子束，其中当电子束照射单元在照射目标物体旋转期间用电子束照射被照射物体的表面时，电子束照射单元和照射目标物体相对移动。

5. 发明授权

US07193956B2 Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object 有权
标题翻译：电子束照射装置，电子束照射方法及其制造方法及其制造方法
公开(公告)号：US07193956B2
公开(公告)日：2007-03-20
申请号：US10528518
申请日：2003-09-18
申请人： Mamoru Usami , Kazushi Tanaka , Kenji Yoneyama , Yukio Kaneko , Takeshi Umega
发明人： Mamoru Usami , Kazushi Tanaka , Kenji Yoneyama , Yukio Kaneko , Takeshi Umega
IPC分类号： G11B7/00
CPC分类号： G21K5/04 , G11B7/26
摘要： An electron beam irradiation apparatus and method capable of easily curing at least part of a surface layer and/or a resin layer composed of materials that are hard to be cured by irradiation of ultraviolet rays. A disc-shaped object manufacturing apparatus and method capable of efficiently forming, on the disc-shaped object, at least part of a surface layer and/or a resin layer such as light transmitting layer, etc, thereunder. An electron beam irradiation apparatus comprises a rotary driving unit for rotationally driving an object, a shield container rotatably accommodating the object, and an electron beam irradiation unit provided in the shield container so that the surface of the object is irradiated with electron beams from an irradiation window thereof, wherein the surface of the object is irritated with the electron beams during its rotation from the irradiation window of the election beam irradiation unit. The surface of the on-rotating object can be thereby irradiated with the electron beams having larger energy than the ultraviolet rays have.
摘要翻译：一种电子束照射装置和方法，其能够容易地固化由通过紫外线的照射而难以固化的材料构成的表面层和/或树脂层的至少一部分。一种盘形物体的制造装置和方法，其能够在盘状物体上有效地形成表面层和/或树脂层如透光层等的至少一部分。一种电子束照射装置，包括用于旋转驱动物体的旋转驱动单元，可旋转地容纳物体的屏蔽容器和设置在屏蔽容器中的电子束照射单元，使得物体的表面被来自照射的电子束照射窗口，其中物体的表面在其从选择光束照射单元的照射窗口旋转期间被电子束刺激。因此，可以用比紫外线具有的能量大的电子束照射旋转物体的表面。

6. 发明申请

US20050202202A1 Production method for disk-like recording medium 审中-公开
标题翻译：盘状记录介质的制造方法
公开(公告)号：US20050202202A1
公开(公告)日：2005-09-15
申请号：US10528243
申请日：2003-09-17
申请人： Kenji Yoneyama , Kazushi Tanaka , Naoki Hayashida , Mamoru Usami
发明人： Kenji Yoneyama , Kazushi Tanaka , Naoki Hayashida , Mamoru Usami
IPC分类号： G11B7/26 , B32B3/02
CPC分类号： G11B7/26
摘要： A disc-shaped recording medium manufacturing method involves the use of electron beams for easily curing a resin layer composed of a resin material that is hard to be cured by irradiation of ultraviolet rays and capable of manufacturing a disc-shaped recording medium with a high yield without affecting a recording layer even by irradiating the electron beams. The disc-shaped recording medium manufacturing method of manufacturing the disc-shaped recording medium having a layer composed mainly of resin on a recording layer provided on a disc-shaped substrate, includes the steps of irradiating the layer composed mainly of the resin with electron beams of which an acceleration voltage is equal to or higher than 20 kV and is equal to or lower than 100 kV, and curing at least the surface of the layer composed mainly of the resin.
摘要翻译：盘状记录介质的制造方法涉及使用电子束，容易地固化由通过紫外线的照射难以固化的树脂材料构成的树脂层，并能够以高产率制造盘状记录介质即使通过照射电子束也不会影响记录层。在设置在盘状基板上的记录层上制造具有主要由树脂构成的层的盘状记录介质制造方法包括以下步骤：用电子束照射主要由树脂构成的层其加速电压等于或高于20kV并且等于或低于100kV，并且至少固化主要由树脂构成的层的表面。

7. 发明申请

US20050161599A1 Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object 审中-公开
标题翻译：电子束照射装置，电子束照射方法及其制造方法及其制造方法
公开(公告)号：US20050161599A1
公开(公告)日：2005-07-28
申请号：US11045748
申请日：2005-01-28
申请人： Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
发明人： Kenji Yoneyama , Kazushi Tanaka , Mamoru Usami
IPC分类号： G21K5/10 , A61N5/10 , G01N23/00 , G11B7/26 , G21K5/00 , G21K5/04
CPC分类号： H01J37/3023 , H01J37/3056 , H01J2237/20214 , H01J2237/20221 , H01J2237/30461 , H01J2237/3156 , H01J2237/316 , H01J2237/3165
摘要： Disclosed are an electron beam irradiation apparatus and an electron beam irradiation method that are capable of easily curing a material that is hard to be cured by irradiation of ultraviolet rays and of reducing the number of electron beam irradiation tubes. The electron beam irradiation apparatus has a motor for rotationally driving an irradiation target object, a shield container for rotatably accommodating the irradiation target object, and an electron beam irradiation unit provided in the shield container so that the surface of the irradiation target object is irradiated with electron beams, wherein the electron beam irradiation unit and the irradiation target object are relatively moved when the electron beam irradiation unit irradiates the surface of the irradiation target object with the electron beams during a rotation of the irradiation target object.
摘要翻译：公开了一种电子束照射装置和电子束照射方法，其能够容易地固化通过紫外线的照射难以固化的材料并减少电子束照射管的数量。电子束照射装置具有旋转驱动被照射物体的电动机，用于可旋转地容纳被照射物的保护容器和设置在该屏蔽容器内的电子射线照射部，照射被照射物体的表面被照射电子束，其中当电子束照射单元在照射目标物体旋转期间用电子束照射被照射物体的表面时，电子束照射单元和照射目标物体相对移动。

8. 发明授权

US07348555B2 Apparatus and method for irradiating electron beam 失效
标题翻译：用于照射电子束的装置和方法
公开(公告)号：US07348555B2
公开(公告)日：2008-03-25
申请号：US11029810
申请日：2005-01-04
申请人： Mamoru Usami , Kazushi Tanaka , Yukio Kaneko , Naoyuki Echigo , Hiroshi Tominaga , Akihiko Kizaki , Kunihiko Ozaki
发明人： Mamoru Usami , Kazushi Tanaka , Yukio Kaneko , Naoyuki Echigo , Hiroshi Tominaga , Akihiko Kizaki , Kunihiko Ozaki
IPC分类号： H01J49/32
CPC分类号： G21K5/04
摘要： An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.
摘要翻译：电子束照射装置包括转向传递机构; 转照射室; 电子束照射部; 更换室，其构造成使目标进出转动照射室; 外部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构，目标保持机构; 内部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构，所述内部照射目标保持台由所述转动传递机构 ; 构造成驱动转向传递机构的转动机构; 以及电梯机构，被构造成上下移动支撑内照射目标保持台的转向传递机构。

9. 发明申请

US20050173654A1 Apparatus and method for irradiating electron beam 失效
标题翻译：用于照射电子束的装置和方法
公开(公告)号：US20050173654A1
公开(公告)日：2005-08-11
申请号：US11029810
申请日：2005-01-04
申请人： Mamoru Usami , Kazushi Tanaka , Yukio Kaneko , Naoyuki Echigo , Hiroshi Tominaga , Akihiko Kizaki , Kunihiko Ozaki
发明人： Mamoru Usami , Kazushi Tanaka , Yukio Kaneko , Naoyuki Echigo , Hiroshi Tominaga , Akihiko Kizaki , Kunihiko Ozaki
IPC分类号： A61L2/08 , G21K5/00 , G21K5/04 , G21K5/10
CPC分类号： G21K5/04
摘要： An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.
摘要翻译：电子束照射装置包括转向传递机构; 转照射室; 电子束照射部; 更换室，其构造成使目标进出转动照射室; 外部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构，目标保持机构; 内部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构，所述内部照射目标保持台由所述转动传递机构 ; 构造成驱动转向传递机构的转动机构; 以及电梯机构，被构造成上下移动支撑内照射目标保持台的转向传递机构。

10. 发明授权

US07282726B2 Apparatus and method for irradiating electron beam 失效
标题翻译：用于照射电子束的装置和方法
公开(公告)号：US07282726B2
公开(公告)日：2007-10-16
申请号：US11029815
申请日：2005-01-04
申请人： Mamoru Usami , Kazushi Tanaka , Yukio Kaneko , Naoyuki Echigo , Akihiko Kizaki , Hiroshi Tominaga , Kunihiko Ozaki
发明人： Mamoru Usami , Kazushi Tanaka , Yukio Kaneko , Naoyuki Echigo , Akihiko Kizaki , Hiroshi Tominaga , Kunihiko Ozaki
IPC分类号： A61I2/00
CPC分类号： H01J37/18 , B29C2035/0877 , H01J2237/3156
摘要： An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.
摘要翻译：电子束照射装置包括转向传递机构; 转转室; 电子束照射部; 更换室，其配置成使目标进出转向传送室; 被配置为形成更换室的一部分的外部照射目标保持台，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构; 内部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构，所述内侧照射目标保持台由所述转动机制; 转动机构，其构造成转动转向机构;以及升降机构，其构造成使转动机构上下移动; 以及旋转机构，设置在所述电子束照射部，并且被配置为使所述目标旋转。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式