会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明申请
    • Magnetic disk apparatus with dual stage actuator
    • 带双级执行器的磁盘设备
    • US20060039079A1
    • 2006-02-23
    • US11200999
    • 2005-08-09
    • Masahito KobayashiShinsuke NakagawaHidehiko NumasatoYoshio Soyama
    • Masahito KobayashiShinsuke NakagawaHidehiko NumasatoYoshio Soyama
    • G11B5/596
    • G11B5/596G11B5/556
    • In one embodiment, a magnetic disk apparatus comprises a magnetic disk for recording information; a magnetic head that reads information from, or writes information to, the magnetic disk; an actuator device that drives the magnetic head; and a control system that controls the driving of the actuator device. The actuator device is configured by a dual stage actuator comprising a fine actuator that drives the head and a coarse actuator that drives the magnetic head together with the fine actuator. The control system includes a fine controller that generates an operational value for driving the fine actuator and a coarse controller that generates an operational amount for driving the coarse actuator. The control system includes a mechanism for smoothly changing the operational amount generated by the fine controller immediately before saturation resulting from an applied voltage limit of the fine actuator or at the time the fine actuator returns to a control range from the saturation.
    • 在一个实施例中,磁盘装置包括用于记录信息的磁盘; 从磁盘读取信息或将信息写入磁盘的磁头; 驱动磁头的致动器装置; 以及控制致动器装置的驱动的控制系统。 致动器装置由双级致动器构成,该双级致动器包括驱动头部的精细致动器和与精细致动器一起驱动磁头的粗略致动器。 该控制系统包括产生用于驱动精细致动器的操作值的精细控制器和产生用于驱动粗动作器的操作量的粗略控制器。 该控制系统包括一个机构,用于在精细致动器施加的电压极限之前或在精细致动器从饱和状态返回到控制范围时,立即在精确控制器产生的精确控制器之前平滑地改变操作量。
    • 9. 发明授权
    • NF3 treating process
    • NF3治疗过程
    • US06342194B1
    • 2002-01-29
    • US09545521
    • 2000-04-07
    • Takayuki IshibashiShinsuke Nakagawa
    • Takayuki IshibashiShinsuke Nakagawa
    • B01J802
    • B01D53/685B01D53/82B01J8/02
    • A process for treating NF3 useful as a dry etching gas and cleaning gas in processes for producing LSI, TFT, and solar cell and in an electron photographic processes. The treating process comprises following step: (a) preparing a reactor including agitator blades for agitating gas in the reactor and generating a flow of the gas, and a gas flow guide tube for efficiently circulating and dispersing the gas flow generated by the agitator blades in a space of the reactor; (b) stationarily placing at least one substance selected from the group consisting of a metal and a metal compound within a reactor, the metal being at least one metal selected from the group consisting of Si, B, W, Mo, V, Se, Te and Ge, the metal compound being at least one metal compound selected from the group consisting of solid compounds of Si, B, W, Mo, V, Se, Te and Ge: (c) introducing a gas containing NF3 into the reactor to react the introduced gas with at least one substance of the metal and the metal compound at a temperature ranging from 400 to 900° C. upon operating the agitator blades of the reactor so as to form a fluoride gas; and (d) capturing the fluoride gas.
    • 一种用于制造LSI,TFT和太阳能电池的工艺中用作干蚀刻气体和清洁气体的NF 3的方法以及电子照相法。 处理方法包括以下步骤:(a)制备包括用于在反应器中搅拌气体并产生气体流的搅拌器叶片的反应器,以及用于有效地将由搅拌器叶片产生的气流循环和分散的气流引导管 反应堆的一个空间; (b)在反应器内固定放置选自金属和金属化合物的至少一种物质,所述金属为选自Si,B,W,Mo,V,Se, Te和Ge的金属化合物,选自Si,B,W,Mo,V,Se,Te和Ge的固体化合物中的至少一种金属化合物:(c)将含有NF 3的气体引入反应器 在操作反应器的搅拌叶片时,引入的气体与金属和金属化合物的至少一种物质在400-900℃的温度下反应,以形成氟化物气体; 和(d)捕获氟化物气体。
    • 10. 发明授权
    • Method of refining rare gas fluoride excimer laser gas
    • 精炼稀有气体氟化物准分子激光气体的方法
    • US4964137A
    • 1990-10-16
    • US466930
    • 1990-01-18
    • Minoru AramakiShinsuke NakagawaHisaji NakanoHiroshi IchimuraMasahiro Tainaka
    • Minoru AramakiShinsuke NakagawaHisaji NakanoHiroshi IchimuraMasahiro Tainaka
    • H01S3/097H01S3/036H01S3/223H01S3/225
    • H01S3/036H01S3/225
    • A laser gas used in a rare gas fluoride excimer laser is efficiently refined with little loss of the principal rare gas such as Ar, Kr or Xe by sequential contact of the laser gas first with a reactive metal, e.g. Si or Fe, for conversion of the fluorine source gas such as F.sub.2 or NF.sub.3 to a metal fluoride, then with a solid alkaline compound, e.g. Ca(OH).sub.2, for conversion of gaseous fluorides to solid metal fluorides, next with zeolite which is adsorbent of most of the remaining impurities and finally with an alkaline metal, e.g. Ca or Na, for decomposition of CF.sub.4 to form a solid metal fluoride and carbon. CF.sub.4 is formed during operation of the excimer laser by reaction of fluorine with a fluororesin used as electrical insulator in the laser apparatus, and accumulation of CF.sub.4 in the laser gas caused significal lowering of the laser output power.
    • 在稀有气体氟化物准分子激光器中使用的激光气体通过先将激光气体与活性金属例如反应性金属顺序接触而有效地精制而不损失诸如Ar,Kr或Xe的主要稀有气体。 Si或Fe,用于将氟源气体如F2或NF3转化为金属氟化物,然后用固体碱性化合物,例如, Ca(OH)2,用于将气态氟化物转化为固体金属氟化物,接下来是沸石,其是大部分剩余杂质的吸附剂,最后是碱金属,例如碱金属。 Ca或Na,用于分解CF4以形成固体金属氟化物和碳。 在激光装置中通过氟与用作电绝缘体的氟树脂反应而在准分子激光器的操作期间形成CF4,并且CF4在激光气体中的积聚导致激光输出功率的显着降低。