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    • 8. 发明申请
    • Photosensitive resin composition, ink jet recording head using such composition and method for manufacturing such recording head
    • 感光树脂组合物,使用这种组合物的喷墨记录头和用于制造这种记录头的方法
    • US20060117564A1
    • 2006-06-08
    • US11291956
    • 2005-12-02
    • Hiroe IshikuraShoji ShibaAkihiko Okano
    • Hiroe IshikuraShoji ShibaAkihiko Okano
    • B21D53/76B41J2/01
    • B41J2/1603B41J2/1629B41J2/1631B41J2/1632B41J2/1634B41J2/1639B41J2/1645Y10T29/49401
    • The present invention provides a method for manufacturing a high quality ink jet head, and an ink jet head manufactured by such a method, in which, in a case where a coating resin layer constituting ink flow path walls is formed, even when a solvent having a strong dissolving force is used, it is not feared that a configuration of an ink flow path pattern is distorted. In the method, a photosensitive resin composition layer in which an inter-molecule bridging reaction proceeds by irradiation of an ionization radiant ray having a first wavelength band and a molecule decaying reaction of main chain decomposing type of the resin proceeds by irradiation of an ionization radiant ray having a second wavelength band different from the first wavelength band is formed on a substrate on which energy generating elements were provided. Thereafter, an ink flow path pattern is formed by the irradiation of the ionization radiant ray having the first wavelength band and a developing process. Then, a coating resin layer constituting ink flow path walls is formed on the ink flow path pattern. After ink discharge ports are formed, the photosensitive resin composition layer forming the ink flow path pattern is dissolved and removed by irradiating the ionization radiant ray having the second wavelength band.
    • 本发明提供一种制造高品质喷墨头的方法和通过这样一种方法制造的喷墨头,其中在形成油墨流路壁的涂布树脂层的情况下,即使当具有 使用强的溶解力,不怕油墨流路图案的构造变形。 在该方法中,通过照射具有第一波长带的电离辐射线和主链分解型树脂的分子衰减反应进行分子间桥接反应的感光性树脂组合物层通过照射电离辐射 在具有能量产生元件的基板上形成具有与第一波长带不同的第二波长带的光线。 此后,通过照射具有第一波长带和显影处理的电离辐射线形成墨流路图案。 然后,在油墨流路图案上形成构成油墨流路壁的涂布树脂层。 在形成喷墨口之后,通过照射具有第二波长带的电离辐射线来溶解形成油墨流路图形的感光性树脂组合物层。
    • 10. 发明申请
    • Ink jet head manufacturing method and ink jet head manufactured by the manufacturing method
    • 喷墨头制造方法和通过制造方法制造的喷墨头
    • US20070132811A1
    • 2007-06-14
    • US10576247
    • 2005-06-27
    • Akihiko OkanoShoji ShibaHiroe Ishikura
    • Akihiko OkanoShoji ShibaHiroe Ishikura
    • G03C5/00B41J2/04
    • B41J2/1603B41J2/1631B41J2/1639B41J2/1645
    • A method of manufacturing an ink jet head which includes a discharge port for discharging an ink droplet, an ink flow path communicated with the discharge port, and an energy generating element for discharging the ink droplet from the discharge port, the method for manufacturing an ink jet head includes a process of forming a photodegradable positive type resist layer on a substrate having the energy generating element, a process of forming a structure which becomes the ink flow path by exposing and developing the photodegradable positive type resist layer, a process of coating the substrate having the structure which becomes the ink flow path with a negative type resist layer, a process of forming the ink discharge port in the negative type resist layer, and a process of forming the ink flow path communicated with the discharge port by removing the structure which becomes the ink flow path, wherein the photodegradable positive type resist layer includes an acrylic copolymer composition, the acrylic copolymer composition containing at least a unit obtained from (meta)acrylic ester as a main content, the acrylic copolymer composition further containing a unit obtained from (meta)acrylic acid, the acrylic copolymer composition contains the (meta)acrylic acid unit at a proportion of 5 to 30 weight %, and weight average molecular weight of the acrylic copolymer ranges from 50000 to 300000.
    • 一种制造喷墨头的方法,该喷墨头包括用于排出墨滴的排出口,与排出口连通的油墨流路,以及用于从排出口排出墨滴的能量产生元件,用于制造墨水的方法 喷墨头包括在具有能量产生元件的基板上形成可光降解的正型抗蚀剂层的工艺,通过曝光和显影可光降解的正型抗蚀剂层形成成为油墨流动路径的结构的工艺, 具有成为具有负型抗蚀剂层的油墨流路的结构的基板,在负型抗蚀剂层中形成油墨排出口的工序,以及通过除去结构形成与排出口连通的油墨流路的工序 其变为油墨流动路径,其中可光降解的正型抗蚀剂层包括丙烯酸共聚物组合物 n,至少含有由(甲基)丙烯酸酯作为主要成分的单元的丙烯酸共聚物组合物,所述丙烯酸共聚物组合物还含有由(甲基)丙烯酸得到的单元,所述丙烯酸共聚物组合物含有(甲基)丙烯酸 单元的比例为5〜30重量%,丙烯酸系共聚物的重均分子量为50000〜300000。