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    • 2. 发明授权
    • Garbage treating apparatus
    • 垃圾处理设备
    • US5753498A
    • 1998-05-19
    • US645621
    • 1996-05-14
    • Masako UedaMasaru NanbaMasahiko IshidaSetuo SaitouKenji Baba
    • Masako UedaMasaru NanbaMasahiko IshidaSetuo SaitouKenji Baba
    • B09B3/00C05F9/02C05F17/02C12M1/02
    • C05F17/0258C05F17/02Y02P20/145Y02W30/43
    • An agitating unit is provided in an upright fermenting reactor for purposes of carrying garbage from a lower portion toward an upper portion of the fermenting reactor. The horizontal distance between the agitator unit, or a spiral blade thereof, and an inner wall surface of the fermenting reactor is made larger in proportion to the axial position of the agitator unit toward the upper portion of the fermenting reactor. On the other hand, an opening between the spiral blade and its drive shaft may made larger in proportion to the axial position of the agitator unit toward the upper portion of the fermenting reactor. With such an arrangement, a flow from a lower portion toward the upper portion and a flow from the upper portion toward the lower portion are simultaneously formed. Due to the ascending flow and the descending flow, the garbage and the compost in the fermenting reactor can be easily mixed with each other and the decomposition of the garbage can speeded up, so that it is possible to carry out a continuous fermentation operation.
    • 在直立发酵反应器中设置搅拌单元,用于从发酵反应器的下部向上部运送垃圾。 搅拌器单元或其螺旋叶片与发酵反应器的内壁表面之间的水平距离与搅拌器单元朝向发酵反应器上部的轴向位置成比例地变大。 另一方面,螺旋叶片及其驱动轴之间的开口可以与搅拌器单元朝向发酵反应器的上部的轴向位置成比例地变大。 通过这样的布置,同时形成从下部朝向上部的流动以及从上部向下部的流动。 由于上升流量和下降流量,发酵反应器中的垃圾和堆肥容易混合,垃圾分解加快,从而可以进行连续发酵操作。 !
    • 5. 发明授权
    • Substrate holding device
    • 基板保持装置
    • US08817449B2
    • 2014-08-26
    • US13634316
    • 2011-03-16
    • Naoki MorimotoMasahiko Ishida
    • Naoki MorimotoMasahiko Ishida
    • H01L21/683
    • H01L21/6831
    • A substrate holding device for clamping a substrate in a processing chamber in which plasma processing is carried out includes a chuck main body having positive and negative electrodes and, a chuck plate having a rib portion capable of bringing the peripheral edge portion of the substrate into surface contact therewith and multiple support portions provided upright and arranged at predetermined intervals in an internal space surrounded by the rib portion, a DC power supply for applying a DC voltage between the two electrodes, an AC power supply for passing an alternating current through the capacitance of the chuck plate, and first measuring means for measuring the alternating current passing through the capacitance of the chuck plate, and further includes removing means for removing an AC component superimposed on the alternating current from a plasma produced in the processing chamber during plasma processing.
    • 用于在执行等离子体处理的处理室中夹持基板的基板保持装置包括具有正极和负极的卡盘主体,以及具有能够使基板的周边部分成为表面的肋部的卡盘板 与其直接连接并且设置在由肋部包围的内部空间中的直立设置的多个支撑部,用于在两个电极之间施加直流电压的直流电源,用于使交流电流通过电容的交流电源 卡盘板和用于测量通过卡盘板电容的交流电流的第一测量装置,还包括用于从等离子体处理期间由处理室中产生的等离子体移除叠加在交流电上的交流分量的去除装置。
    • 6. 发明申请
    • METHOD OF MANAGING SUBSTRATE
    • 管理基板的方法
    • US20110201139A1
    • 2011-08-18
    • US13119985
    • 2009-10-05
    • Masahiko IshidaNaoki MorimotoKouji Sokabe
    • Masahiko IshidaNaoki MorimotoKouji Sokabe
    • H01L21/02
    • H01L21/6831H01L21/67253
    • The electrostatic chuck is made up of: a chuck main body having electrodes; a chuck plate of a dielectric material and having a rib portion with which a peripheral edge portion of the substrate is capable of coming into surface contact, and a plurality of supporting portions which are vertically disposed at a predetermined distance from one another in an inner space enclosed by the rib portion; and a gas introduction means for introducing a predetermined gas into the inner space. When the substrate is held by the electrostatic chuck which is arranged to attract the substrate by the chuck plate and to form a gas atmosphere by supplying a predetermined gas into the inner space, a current value is monitored by causing an AC current to flow in a capacitance of the chuck plate through an AC power supply, a gas flow amount is monitored by causing the gas to flow through the gas introduction means, and a substrate state is managed based on a variation in at least one of the current value and the gas flow amount to prevent damages to the substrate.
    • 静电卡盘由具有电极的卡盘主体构成; 介电材料的卡盘板,具有能够与基板的周缘部进行表面接触的肋部,以及在内部空间中彼此以规定距离垂直配置的多个支撑部 由肋部包围; 以及用于将预定气体引入内部空间的气体引入装置。 当基板被设置成通过卡盘板吸引基板的静电卡盘保持并且通过将预定的气体供应到内部空间来形成气体气氛时,通过使AC电流在 通过交流电源对卡盘板的电容进行监测,通过使气体流过气体引入装置来监测气体流量,并且基于当前值和气体中的至少一个的变化来管理基板状态 流量以防止损坏基板。
    • 8. 发明授权
    • Copper alloy and method of manufacturing the same
    • 铜合金及其制造方法
    • US07485200B2
    • 2009-02-03
    • US11827860
    • 2007-07-12
    • Masahiko IshidaJunichi KumagaiTakeshi Suzuki
    • Masahiko IshidaJunichi KumagaiTakeshi Suzuki
    • C22F1/08
    • C22C9/00C22F1/08
    • This copper alloy contains at least zirconium in an amount of not less than 0.005% by weight and not greater than 0.5% by weight, includes a first grain group including grains having a grain size of not greater than 1.5 μm, a second grain group including grains having a grain size of greater than 1.5 μm and less than 7 μm, the grains having a form which is elongated in one direction, and a third grain group including grains having a grain size of not less than 7 μm, and also the sum of α and β is greater than γ, and α is less than β, where α is a total area ratio of the first grain group, β is a total area ratio of the second grain group, and γ is a total area ratio of the third grain group, based on a unit area, and α+β+γ=1.
    • 该铜合金至少含有不小于0.005重量%且不大于0.5重量%的锆,包括包含晶粒尺寸不大于1.5μm的晶粒的第一晶粒组,第二晶粒组包括 具有大于1.5μm和小于7μm的粒度的晶粒,具有沿一个方向延伸的形状的晶粒和包括具有不小于7μm的晶粒的晶粒的第三晶粒组,以及总和 α和β大于γ,α小于β,其中α是第一颗粒组的总面积比,β是第二颗粒组的总面积比,γ是总面积比 基于单位面积的第三颗粒组,α+β+γ= 1。