会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • Polycyclic ester containing cyano group and lactone skeleton
    • 含有氰基和内酯骨架的多环酯
    • US08236971B2
    • 2012-08-07
    • US12900776
    • 2010-10-08
    • Keizo InoueTakahiro IwahamaMasamichi NishimuraKiyoharu Tsutsumi
    • Keizo InoueTakahiro IwahamaMasamichi NishimuraKiyoharu Tsutsumi
    • C07D307/93C08G61/04
    • C07D307/93C08F220/36
    • A polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2═C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.
    • 由下式(1)表示的含有氰基和内酯骨架的多环酯:其中,Ra表示例如可以具有卤素原子的氢原子或碳原子数1〜6的烷基, R 1各自表示例如卤素原子或具有1〜6个碳原子的烷基或卤代烷基; “m”是R1的数量; “n”是氰基的数目; 和CH 2 = C(Ra)COO-基团可以具有内部构象和外部构象。 因此,提供了含有氰基和内酯骨架的新型多环酯,其通常用作高官能聚合物的单体组分。 例如衍生自该化合物的聚合物高度可溶于有机溶剂,同时通常保持稳定化学品,并且在水解后表现出改善的水解性和/或改善的在水中的溶解性。
    • 10. 发明申请
    • POLYMER FOR LITHOGRAPHIC PURPOSES AND METHOD FOR PRODUCING SAME
    • 用于平版印刷用途的聚合物及其生产方法
    • US20110065044A1
    • 2011-03-17
    • US12992423
    • 2009-06-01
    • Arimichi OkumuraKeizo InoueKazuki Okamoto
    • Arimichi OkumuraKeizo InoueKazuki Okamoto
    • G03F7/004G03F7/20C08G63/08
    • G03F7/0397C08F216/125C08F220/06C08F220/18C08F220/28
    • A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.
    • 用于光刻目的的聚合物至少具有由以下通式(I)表示的重复结构单元。 在式(I)中,R 1,R 3,R 4和R 6各自独立地表示氢原子,卤素原子,氰基,烷基或卤代烷基; R2和R5各自独立地表示氢原子,氰基等; X1和X2各自独立地表示单键,或取代或未取代的二价亚烷基,亚烯基或亚环烷基等; X 3和X 4各自独立地表示单键或-CO-; R 7,R 8,R 9和R 10各自独立地表示氢原子,烷基或环烷基。 用于光刻目的的聚合物在线边缘粗糙度(LER)和耐蚀刻性之间具有良好的平衡,并且允许非常精细和均匀的图案化。