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1. 发明申请

US20100015537A1 BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS 有权
标题翻译：光束剂量计算方法和书写方法和记录载体体系和书写装置
公开(公告)号：US20100015537A1
公开(公告)日：2010-01-21
申请号：US12566525
申请日：2009-09-24
申请人： Keiko EMI , Junichi Suzuki , Takayuki Abe , Tomohiro Iljima , Jun Yashima
发明人： Keiko EMI , Junichi Suzuki , Takayuki Abe , Tomohiro Iljima , Jun Yashima
IPC分类号： G03F7/20 , H01J37/317 , H01J3/26
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

2. 发明授权

US08103980B2 Beam dose computing method and writing method and record carrier body and writing apparatus 有权
标题翻译：光束剂量计算方法和写入方法和记录载体体和书写装置
公开(公告)号：US08103980B2
公开(公告)日：2012-01-24
申请号：US12566525
申请日：2009-09-24
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iljima , Jun Yashima
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iljima , Jun Yashima
IPC分类号： G06F17/50 , G06F19/00 , G03F1/00 , G03C5/00 , G06K9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

3. 发明授权

US08352889B2 Beam dose computing method and writing method and record carrier body and writing apparatus 有权
标题翻译：光束剂量计算方法和写入方法和记录载体体和书写装置
公开(公告)号：US08352889B2
公开(公告)日：2013-01-08
申请号：US13323986
申请日：2011-12-13
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
IPC分类号： G06F17/50 , G06F19/00 , G03F1/00 , G06K9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：射束剂量计算方法包括将目标物体的表面积分成包括不同尺寸的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域，确定带电粒子束的第一校正剂量，以便校正第一区域中的雾化效果，确定用于校正由于第二区域中的负载效应而发生的图案线宽度偏差的校正大小值，以在所述第二区域的各自中创建所述光束的基本剂量图，并且准备接近的图在所述第二区域的各个区域中的效应校正系数，使用该图确定在第三区域中用于邻近效应校正的光束的第二校正剂量，并且使用第一和第二校正剂量来确定表面上每个位置处的实际光束剂量的所述物体。

4. 发明申请

US20070114453A1 BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS 有权
标题翻译：光束剂量计算方法和书写方法和记录载体体系和书写装置
公开(公告)号：US20070114453A1
公开(公告)日：2007-05-24
申请号：US11460848
申请日：2006-07-28
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

5. 发明授权

US07740991B2 Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam 有权
标题翻译：光束剂量计算方法和写入方法和记录载体体和书写装置，用于确定带电粒子束的最佳剂量
公开(公告)号：US07740991B2
公开(公告)日：2010-06-22
申请号：US11460848
申请日：2006-07-28
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe , Tomohiro Iijima , Jun Yashima
IPC分类号： G06F1/00 , G06F19/00 , G06F17/50 , G06K9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764 , H01J2237/31769
摘要： A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.
摘要翻译：光束剂量计算方法包括：从目标对象的表面区域划分出区域的行和列的矩阵，以包括不同大小的第一，第二和第三区域，第三区域的尺寸小于第一和第二区域确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量，确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值，使用所述第二区域中的所述校正大小值来创建使用所述校正的大小值，在所述第二区域的各个区域中的所述光束的基本剂量的映射，以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射，以确定所述光束的第二校正剂量校正所述第三区域中的邻近效应，并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

6. 发明申请

US20070192757A1 PATTERN GENERATION METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS 有权
标题翻译：图案生成方法和充电颗粒光束写字装置
公开(公告)号：US20070192757A1
公开(公告)日：2007-08-16
申请号：US11671243
申请日：2007-02-05
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe
IPC分类号： G06F17/50 , A61N5/00 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764
摘要： A pattern generation method includes changing a dimension of a pattern included in each mesh-like region of a plurality of mesh-like regions by using an area of the pattern and a total sum of lengths of circumferential sides of the pattern included in each mesh-like region to correct a dimension error of the pattern, wherein the dimension error being caused by loading effects and the plurality of mesh-like regions being virtually divided from a pattern forming region of a target object, and generating a pattern of the dimension changed on the target object.
摘要翻译：图案生成方法包括通过使用图案的区域和包括在每个网状区域中的图案的周边的长度的总和来改变包括在多个网状区域的每个网格区域中的图案的尺寸，以校正图案的尺寸误差，其中所述尺寸误差是由加载效应引起的，并且所述多个网状区域从目标对象的图案形成区域虚拟地分割，并且生成维度上的尺寸的图案目标对象。

7. 发明授权

US07619230B2 Charged particle beam writing method and apparatus and readable storage medium 有权
标题翻译：带电粒子束写入方法和装置以及可读存储介质
公开(公告)号：US07619230B2
公开(公告)日：2009-11-17
申请号：US11535725
申请日：2006-09-27
申请人： Junichi Suzuki , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Junichi Suzuki , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G21K5/10 , H01J37/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要翻译：带电粒子束写入方法包括输入用于写入写入区域的图形数据，预测用于写入图案数据的图案的写入时间，通过使用从写入开始时间所需的时间，预测写入时间和带电粒子束的基本剂量，在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量，通过使用写入开始时间所需的时间之间的相关性来获取，预测写入时间和接近效应校正系数，在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数，通过使用基本剂量和后面的邻近效应校正系数可选时间，在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量，以及写入可选的posi 通过使用与剂量对应的带电粒子束，在写入区域中进行。

8. 发明申请

US20070114459A1 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS AND READABLE STORAGE MEDIUM 有权
标题翻译：充电颗粒光束写入方法和装置和可读存储介质
公开(公告)号：US20070114459A1
公开(公告)日：2007-05-24
申请号：US11535725
申请日：2006-09-27
申请人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要翻译：带电粒子束写入方法包括输入用于写入写入区域的图形数据，预测用于写入图案数据的图案的写入时间，通过使用从写入开始时间所需的时间，预测写入时间和带电粒子束的基本剂量，在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量，通过使用写入开始时间所需的时间之间的相关性来获取，预测写入时间和接近效应校正系数，在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数，通过使用基本剂量和后面的邻近效应校正系数可选时间，在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量，以及写入可选的posi 通过使用与剂量对应的带电粒子束，在写入区域中进行。

9. 发明授权

US07669174B2 Pattern generation method and charged particle beam writing apparatus 有权
标题翻译：图案生成方法和带电粒子束写入装置
公开(公告)号：US07669174B2
公开(公告)日：2010-02-23
申请号：US11671243
申请日：2007-02-05
申请人： Keiko Emi , Junichi Suzuki , Takayuki Abe
发明人： Keiko Emi , Junichi Suzuki , Takayuki Abe
IPC分类号： G06F17/50 , G06F19/00 , G21K5/00 , G03F1/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31764
摘要： A pattern generation method includes changing a dimension of a pattern included in each mesh-like region of a plurality of mesh-like regions by using an area of the pattern and a total sum of lengths of circumferential sides of the pattern included in each mesh-like region to correct a dimension error of the pattern, wherein the dimension error being caused by loading effects and the plurality of mesh-like regions being virtually divided from a pattern forming region of a target object, and generating a pattern of the dimension changed on the target object.
摘要翻译：图案生成方法包括通过使用图案的区域和包括在每个网状区域中的图案的周边的长度的总和来改变包括在多个网状区域的每个网格区域中的图案的尺寸，以校正图案的尺寸误差，其中所述尺寸误差是由加载效应引起的，并且所述多个网状区域从目标对象的图案形成区域虚拟地分割，并且生成维度上的尺寸的图案目标对象。

10. 发明授权

US07525110B2 Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography 有权
标题翻译：用于带电粒子束光刻的多重照射效应校正剂量测定技术
公开(公告)号：US07525110B2
公开(公告)日：2009-04-28
申请号：US11671789
申请日：2007-02-06
申请人： Junichi Suzuki , Keiko Emi , Takayuki Abe
发明人： Junichi Suzuki , Keiko Emi , Takayuki Abe
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A charged-particle beam microlithographic apparatus is generally made up of a pattern writing unit and a system controller. The writer has an electron beam source and a pattern generator for forming a pattern image on a workpiece. The system controller includes a unit for correcting proximity and fogging effects occurrable during pattern writing. This unit has a first calculator for calculating a proximity effect-corrected dose, a functional module for calculation of a fog-corrected dose while including therein the influence of the proximity effect, and a multiplier for combining the calculated doses together to determine a total corrected dose. The module has a second calculator for calculating a variable real value representing the proximity-effect influence to be considered during fog correction, and a third calculator for calculating using this value the fog-corrected dose.
摘要翻译：带电粒子束微光刻设备通常由图案写入单元和系统控制器组成。作者具有电子束源和用于在工件上形成图案图像的图案发生器。系统控制器包括用于在模式写入期间发生的用于校正接近度和起雾效果的单元。该单元具有用于计算接近效应校正剂量的第一计算器，用于计算雾化校正剂量的功能模块，同时在其中包括邻近效应的影响，以及用于将计算的剂量组合在一起以确定总校正的乘数剂量。该模块具有第二计算器，用于计算表示在雾化校正期间考虑的邻近效应影响的可变实数值;以及第三计算器，用于使用该值计算雾化校正剂量。

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