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1. 发明授权

US5721091A Composition for forming an electrically conductive layer to be used in patterning 失效
公开(公告)号：US5721091A
公开(公告)日：1998-02-24
申请号：US468829
申请日：1995-06-06
申请人： Keiji Watanabe , Yasuhiro Yoneda , Takashi Maruyama , Keiko Yano , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh
发明人： Keiji Watanabe , Yasuhiro Yoneda , Takashi Maruyama , Keiko Yano , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh
IPC分类号： G03F7/004 , C08G73/02 , G03F7/11 , G03F7/26 , H01B1/12 , H01L21/265 , H05K3/10 , G03C5/00 , B44C1/22
CPC分类号： C08G73/0266 , H01B1/128 , H05K3/105 , Y10S430/143 , Y10S438/95
摘要： A composition for forming an electrically conductive layer which is used in patterning of a resist with electric charge beam, which comprises: (a) 0.1 to 20 parts by weight of sulfonated polyanilines with a sulfonic group content ranging from 20 to 80% based on the aromatic ring, the sulfonated polyaniline having a weight average molecular weight of 500 to 100,000 and a molecular weight dispersion of not more than 5, (b) 100 parts by weight of a solvent, and (c) 0.01 to 30 parts by weight of amines and/or quaternary ammonium salts, and if desired, it further comprises 0 to 200 parts by weight of the following substance(s) (A) and/or (B) as component (d): (A) a high molecular weight compound soluble in the aforesaid solvent (b), (B) a surface active agent.

2. 发明授权

US5804354A Composition for forming conductivity imparting agent and pattern forming method 失效
标题翻译：用于形成导电性赋予剂的组合物和图案形成方法
公开(公告)号：US5804354A
公开(公告)日：1998-09-08
申请号：US876794
申请日：1997-06-16
申请人： Keiji Watanabe , Yasuhiro Yoneda , Takashi Maruyama , Keiko Yano , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh , Takahisa Namiki , Ei Yano , Miwa Igarashi , Yoko Kuramitsu
发明人： Keiji Watanabe , Yasuhiro Yoneda , Takashi Maruyama , Keiko Yano , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh , Takahisa Namiki , Ei Yano , Miwa Igarashi , Yoko Kuramitsu
IPC分类号： C08G73/02 , H01B1/12 , G03C5/00
CPC分类号： H01B1/128 , C08G73/0266 , Y10S430/143
摘要： A composition for forming a conductivity imparting agent comprising: (a) 0.1 to 20 parts by weight of sulfonated polyaniline having a content of a sulfonic acid group of 20 to 80% with respect to an aromatic ring of the sulfonated polyaniline; (b) 100 parts by weight of a solvent; (c) 0.01 to 10 parts by weight of an amine and/or quaternary ammonium salt; and (d) 0.001 to 100 parts by weight of at least one kind of a sulfonic acid group-containing component selected from the following (A) and (B); (A) compounds having a sulfonic acid group; and (B) polymers having a sulfonic acid group.
摘要翻译：一种用于形成导电性赋予剂的组合物，其包含：（a）相对于所述磺化聚苯胺的芳环，为0.1〜20重量份磺酸基含量为20〜80％的磺化聚苯胺; （b）100重量份溶剂; （c）0.01至10重量份的胺和/或季铵盐; 和（d）0.001至100重量份选自以下（A）和（B）的至少一种含磺酸基的组分; （A）具有磺酸基的化合物; 和（B）具有磺酸基的聚合物。

3. 发明授权

US5560870A Composition for forming an electrically conductive layer to be used in patterning 失效
标题翻译：用于形成用于图案化的导电层的组合物
公开(公告)号：US5560870A
公开(公告)日：1996-10-01
申请号：US445730
申请日：1995-05-22
申请人： Keiji Watanabe , Yasuhiro Yoneda , Takashi Maruyama , Keiko Yano , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh
发明人： Keiji Watanabe , Yasuhiro Yoneda , Takashi Maruyama , Keiko Yano , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh
IPC分类号： G03F7/004 , C08G73/02 , G03F7/11 , G03F7/26 , H01B1/12 , H01L21/265 , H05K3/10 , H01B1/00 , H01B1/18
CPC分类号： C08G73/0266 , H01B1/128 , H05K3/105 , Y10S430/143 , Y10S438/95
摘要： A composition for forming an electrically conductive layer which is used in patterning of a resist with electric charge beam, which comprises:(a) 0.1 to 20 parts by weight of sulfonated polyanilines with a sulfonic group content ranging from 20 to 80% based on the aromatic ring, the sulfonated polyaniline having a weight average molecular weight of 500 to 100,000 and a molecular weight dispersion of not more than 5,(b) 100 parts by weight of a solvent, and(c) 0.01 to 30 parts by weight of amines and/or quaternary ammonium salts,and if desired, it further comprises 0 to 200 parts by weight of the following substance(s) (A) and/or (B) as component (d):(A) a high molecular weight compound soluble in the aforesaid solvent (b),(B) a surface active agent.
摘要翻译：一种用于形成导电层的组合物，其用于使用电荷束的抗蚀剂图案化，其包括：（a）基于所述组合物的0.1〜20重量份的磺酸基含量为20〜80％的磺化聚苯胺芳族环，重均分子量为500〜100,000，分子量分布不大于5的磺化聚苯胺，（b）100重量份溶剂，（c）0.01〜30重量份的胺和/或季铵盐，如果需要，其还包含0至200重量份的作为组分（d）的下列物质（A）和/或（B））：（A）高分子量化合物溶于上述溶剂（b），（B）表面活性剂。

4. 发明授权

US5776659A Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer 失效
标题翻译：电离辐射曝光方法利用水溶性苯胺抗静电聚合物层
公开(公告)号：US5776659A
公开(公告)日：1998-07-07
申请号：US762877
申请日：1996-12-12
申请人： Keiji Watanabe , Ei Yano , Takahisa Namiki , Keiko Yano , Takashi Maruyama , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh , Masashi Uzawa , Masami Ishikawa
发明人： Keiji Watanabe , Ei Yano , Takahisa Namiki , Keiko Yano , Takashi Maruyama , Tomio Nakamura , Shigeru Shimizu , Takashi Saitoh , Masashi Uzawa , Masami Ishikawa
IPC分类号： G03F7/004 , C08G73/00 , C08G73/02 , C08L79/00 , C08L79/08 , C09D5/00 , C09D179/00 , C09D179/08 , G03F7/09 , G03F7/11 , G03F7/20 , G03F7/26 , H01L21/027 , H01L21/265 , H01L21/266 , H01L21/66 , G03F7/30
CPC分类号： C08G73/0266 , G03F7/093 , Y10S430/143
摘要： A composition for irradiation with an ionizing radiation, characterized by comprising: (a) 0.01 to 30 parts by weight of a soluble aniline polymer which comprises one or both of the repeating units represented by the following general formulae (1) and (2), said repeating units being included at least 80% of the total repeating units, possesses a weight average molecular weight of not less than 10,000, and is solid at room temperature; and (b) 100 parts by weight of a solvent, ##STR1## wherein R.sup.1 to R.sup.4 represent an electron-donating group, Y.sup.1 to Y.sup.4 represent --SO.sub.3 -- or --COO--, and M.sup.1 to M.sup.4 represent a hydrogen ion, an ammonium ion, an a1kyl ammonium ion with 1 to 8 carbon atoms, an aromatic ammonium ion, or a quaternary ion of an aromatic heterocyclic ring.
摘要翻译：一种用于照射电离辐射的组合物，其特征在于包括：（a）0.01至30重量份的可溶性苯胺聚合物，其包含由以下通式（1）和（2）表示的一个或两个重复单元，所述重复单元包括总重复单元的至少80％，重均分子量不小于10,000，在室温下为固体; （b）100重量份溶剂，其中R1至R4表示给电子基团，Y1至Y4表示-SO3-或-COO-，M1至 M4表示氢离子，铵离子，碳原子数1〜8的烷基铵离子，芳香族铵离子或芳香族杂环的四价离子。

5. 发明授权

US5091285A Method of forming pattern by using an electroconductive composition 失效
标题翻译：使用电磁组合物形成图案的方法
公开(公告)号：US5091285A
公开(公告)日：1992-02-25
申请号：US515444
申请日：1990-04-27
申请人： Keiji Watanabe , Yasuhiro Yoneda , Koichi Kobayashi , Keiko Yano , Tomio Nakamura , Shigeru Shimizu
发明人： Keiji Watanabe , Yasuhiro Yoneda , Koichi Kobayashi , Keiko Yano , Tomio Nakamura , Shigeru Shimizu
IPC分类号： G03F7/004 , G03F7/027 , G03F7/20 , G03F7/26 , H01L21/027 , H01L21/66
CPC分类号： G03F7/0047 , Y10S430/143
摘要： A pattern-forming method using an electroconductive composition comprising at least one TCNQ complex salt selected from the group consisting of isoquinolinium-TCNQ complex salts, quinolinium-TCNQ complex salts, alkyl pyridinium-TCNQ complex salts, and morpholinium-TCNQ complex salts, a specific polymer, and a solvent are disclosed. This composition gives an electroconductive film having a superior long-term storage stability and electroconductive characteristics.When this electroconductive composition is coated on a resist to form an electroconductive film, and a pattern is formed by an irradiation with charging beams, such as electron beams, an accumulation of charges (charge-up) is prevented and a fine resist pattern in which a misregistration is completely prevented is obtained.

6. 发明授权

US5906912A Processes for forming resist pattern and for producing semiconductor device 失效
标题翻译：用于形成抗蚀剂图案和用于制造半导体器件的工艺
公开(公告)号：US5906912A
公开(公告)日：1999-05-25
申请号：US834044
申请日：1997-04-11
申请人： Keiji Watanabe , Miwa Igarashi , Ei Yano , Keiko Yano , Takashi Maruyama , Eiichi Hoshino , Kotaro Shirabe , Masafumi Nakaishi
发明人： Keiji Watanabe , Miwa Igarashi , Ei Yano , Keiko Yano , Takashi Maruyama , Eiichi Hoshino , Kotaro Shirabe , Masafumi Nakaishi
IPC分类号： G03F7/038 , C23F1/00 , G03F7/075 , G03F7/09 , G03F7/11 , G03F7/26 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/311 , H01L21/768 , G03C5/00
CPC分类号： G03F7/093 , G03F1/40 , H01L21/31138 , H01L21/76838
摘要： An electroconductive pattern is formed by coating a substrate with a solution comprising 100 parts by weight of a soluble electroconductive polymer containing an organic radical capable of cross-linking with a cross-linking agent, 5 to 1,000 parts by weight of a cross-linking agent, and 100 to 100,000 parts by weight of a solvent; effecting cross-linking of the resultant coated film to obtain a cured electroconductive film having a sheet resistance of 10.sup.10 .OMEGA./.quadrature. or less; forming a pattern as an upper layer on the cured electroconductive layer; and transferring the pattern of the upper layer to the cured electroconductive layer.
摘要翻译：通过用包含100重量份的含有能够与交联剂交联的有机基团的可溶性导电聚合物的溶液涂布基材来形成导电图案，5至1,000重量份的交联剂和100〜100,000重量份的溶剂; 实现所得涂膜的交联，得到薄膜电阻为1010Ω/□以下的固化导电膜; 在固化的导电层上形成上层的图案; 并将上层的图案转印到固化的导电层上。

7. 发明授权

US5783367A Process for production of semiconductor device and resist developing apparatus used therein 失效
标题翻译：用于制造半导体器件和抗蚀剂显影装置的方法
公开(公告)号：US5783367A
公开(公告)日：1998-07-21
申请号：US379025
申请日：1995-01-27
申请人： Takashi Maruyama , Tatsuo Chijimatsu , Koichi Kobayashi , Keiko Yano , Hiroyuki Kanata
发明人： Takashi Maruyama , Tatsuo Chijimatsu , Koichi Kobayashi , Keiko Yano , Hiroyuki Kanata
IPC分类号： G03F7/30
CPC分类号： G03F7/30 , G03F7/3021 , Y10S134/902
摘要： In the production of semiconductor devices, a pattern-wise exposed resist coating is developed with a developer to form a resist pattern corresponding to the pattern of exposure radiation on an article to be fabricated. The development being carried out with a developer consisting of one or more organic solvents, in at least two stages and in each stage of the development, the development is interrupted when a substantial permeation of the developer of a surface portion of the pattern-forming area of the resist pattern in which the resist pattern remains is completed, and the developed resist coating is dried between this stage and the following development stages. The development of the exposed resist coating is carried out by using a developing apparatus which comprises at least one set of developer-supplying system and rinsing solution-supplying system, and a conveyor means for guiding the article carrying the resist coating.
摘要翻译：在制造半导体器件时，用显影剂显影图案曝光的抗蚀剂涂层，以形成对应于要制造的制品上的曝光辐射图案的抗蚀剂图案。在一个由一种或多种有机溶剂组成的显影剂的显影中，至少在两个阶段和在显影的每一个阶段中进行显影，当图形形成区域的表面部分的显影剂的显着渗透其中抗蚀剂图案保留的抗蚀剂图案完成，并且显影的抗蚀剂涂层在该阶段和随后的显影阶段之间被干燥。曝光的抗蚀剂涂层的开发通过使用包括至少一组显影剂供应系统和冲洗溶液供应系统的显影装置和用于引导携带抗蚀剂涂层的物品的输送装置来进行。

8. 发明授权

US6033134A Resist developing apparatus used in process for production of semiconductor device 失效
标题翻译：用于制造半导体器件的抗蚀剂显影装置
公开(公告)号：US6033134A
公开(公告)日：2000-03-07
申请号：US38105
申请日：1998-03-11
申请人： Takashi Maruyama , Tatsuo Chijimatsu , Koichi Kobayashi , Keiko Yano , Hiroyuki Kanata
发明人： Takashi Maruyama , Tatsuo Chijimatsu , Koichi Kobayashi , Keiko Yano , Hiroyuki Kanata
IPC分类号： G03F7/30 , G03D5/00
CPC分类号： G03F7/30 , G03F7/3021 , Y10S134/902
摘要： In the production of semiconductor devices, a pattern-wise exposed resist coating is developed with a developer to form a resist pattern corresponding to the pattern of exposure radiation on an article to be fabricated. The development being carried out with a developer consisting of one or more organic solvents, in at least two stages and in each stage of the development, the development is interrupted when a substantial permeation of the developer of a surface portion of the pattern-forming area of the resist pattern in which the resist pattern remains is completed, and the developed resist coating is dried between this stage and the following development stages. The development of the exposed resist coating is carried out by using a developing apparatus which comprises at least one set of developer-supplying system and rinsing solution-supplying system, and a conveyor means for guiding the article carrying the resist coating.
摘要翻译：在制造半导体器件时，用显影剂显影图案曝光的抗蚀剂涂层，以形成对应于要制造的制品上的曝光辐射图案的抗蚀剂图案。在一个由一种或多种有机溶剂组成的显影剂的显影中，至少在两个阶段和在显影的每个阶段中进行显影，当图案形成区域的表面部分的显影剂的显着渗透其中抗蚀剂图案保留的抗蚀剂图案完成，并且显影的抗蚀剂涂层在该阶段和随后的显影阶段之间被干燥。曝光的抗蚀剂涂层的开发通过使用包括至少一组显影剂供应系统和冲洗溶液供应系统的显影装置和用于引导携带抗蚀剂涂层的物品的输送装置来进行。

9. 发明授权

US5210696A Electron beam exposure data processing method, electron beam exposure method and apparatus 失效
标题翻译：电子束曝光数据处理方法，电子束曝光方法和装置
公开(公告)号：US5210696A
公开(公告)日：1993-05-11
申请号：US476860
申请日：1990-02-08
申请人： Keiko Yano
发明人： Keiko Yano
IPC分类号： H01L21/027 , H01J37/302
CPC分类号： H01J37/3026 , H01J2237/31769
摘要： An electron beam exposure data processing method includes the steps of inputting exposure data relating to a pattern to be written, and determining whether or not the pattern should be subjected to a framing process. The method further includes performing the framing process when it is determined that the pattern should be subjected to the framing process so that the pattern is partitioned into a frame pattern and an inner pattern surrounded by the frame pattern, reducing the inner pattern by a reduction rate to thereby generate a reduced inner pattern, and determining an exposure dose for the frame pattern and an exposure dose for the reduced inner pattern. There are also provided an electron beam exposure method which employs the electron beam exposure data processing method and an apparatus implementing the same.

10. 发明申请

US20100276359A1 ADSORPTION COLUMN FOR PURIFYING BODY FLUID 审中-公开
标题翻译：用于净化身体液体的吸收柱
公开(公告)号：US20100276359A1
公开(公告)日：2010-11-04
申请号：US12677955
申请日：2008-09-08
申请人： Masamichi Ippommatsu , Chie Kurusu , Riichi Miyamoto , Sayaka Ishii , Kazuki Nakanishi , Hiroyoshi Minakuchi , Keiko Yano
发明人： Masamichi Ippommatsu , Chie Kurusu , Riichi Miyamoto , Sayaka Ishii , Kazuki Nakanishi , Hiroyoshi Minakuchi , Keiko Yano
IPC分类号： B01D15/22
CPC分类号： A61M1/3679 , B01J20/103 , B01J20/2808 , B01J20/28083 , B01J20/28085 , B01J20/28095 , B01J20/3204 , B01J20/327 , B01J20/3274 , B01J20/328 , B01J2220/58
摘要： Provided is an absorption column for body fluid purification by which the saturated adsorption amount of a substance to be adsorbed can be increased or the time required for reaching the saturated adsorption can be shortened, and therefore, the column capacity can be considerably reduced and the treatment time can be considerably shortened. The adsorption column having functional groups 6 specifically binding to a substance to be adsorbed including at least low density lipoprotein, immobilized on the surface of a porous support 5. The porous support 5 has double-pore structure comprising: a skeleton 7 made of a silica gel or silica glass having a three-dimensional network structure; through-pores 8 of an average diameter measured by the mercury intrusion method of 1 μm or more but less than 4 μm and having a three-dimensional network structure, which are formed in the voids of the skeleton; and micropores 9 having an average diameter measured by the mercury intrusion method larger than the grain diameter of the substance to be adsorbed, which are dispersedly formed on the surface of the skeleton.
摘要翻译：本发明提供一种用于体液净化的吸收塔，其中吸附物质的饱和吸附量可以增加或达到饱和吸附所需的时间可以缩短，因此可以显着降低色谱柱容量和处理时间可以大大缩短。该吸附塔具有特定结合待吸附物质的官能团6，该物质固定在多孔载体5的表面上，至少含有低密度脂蛋白。多孔载体5具有双孔结构，包括：由二氧化硅具有三维网络结构的凝胶或二氧化硅玻璃; 通过水银侵入法测量的平均直径为1μm以上且小于4μm的具有三维网状结构的通孔8，其形成在骨架的空隙中; 并且具有通过水银侵入法测量的平均直径的微孔9大于分散形成在骨架表面上的待吸附物质的粒径。

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