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1. 发明授权

US5367827A Wire guide structure for power window 失效
标题翻译：电动车窗导轨结构
公开(公告)号：US5367827A
公开(公告)日：1994-11-29
申请号：US145624
申请日：1993-11-04
申请人： Keiichi Tajima , Toshiyuki Tsukamoto
发明人： Keiichi Tajima , Toshiyuki Tsukamoto
IPC分类号： E05F11/48
CPC分类号： E05F11/486 , E05F15/697 , E05Y2201/654 , E05Y2201/664 , E05Y2900/55
摘要： A power window device in which a drive pulley around which a wire to open and close a window is wound is disposed within a case of a power window drive section and a wire guide for guiding the wire is mounted on the case. The wire guide is composed of a first wire guide for guiding one end of the wire and a second wire guide for guiding the other end of the wire. The second wire guide is removably coupled to the first wire guide. A wire guide angle .theta..sub.0 between the wire guides can be changed merely by exchanging the second wire guide. Even when a different wire guide angle is required, the size of the component to be replaced can be reduced, as can the cost to manufacture.
摘要翻译：在电动车窗驱动部的壳体内设置电动车窗装置，其中卷绕有打开和关闭窗的线的驱动带轮被布置在电动窗驱动部的壳体内，并且用于引导线的线引导件安装在壳体上。线引导件由用于引导线的一端的第一线引导件和用于引导线的另一端的第二线引导件组成。第二线引导件可拆卸地联接到第一线引导件。可以通过更换第二线引导件来改变导线器之间的导线角度θ0。即使需要不同的导线角度，也可以减少要更换的部件的尺寸，以及制造成本。

2. 发明授权

US5676762A Process for distributing ultra high purity gases with minimized corrosion 失效
标题翻译：以最小的腐蚀分配超高纯度气体的方法
公开(公告)号：US5676762A
公开(公告)日：1997-10-14
申请号：US506867
申请日：1995-07-25
申请人： Masao Kimura , Toshiyuki Tsukamoto , Kohei Tarutani , Jean-Marie Friedt
发明人： Masao Kimura , Toshiyuki Tsukamoto , Kohei Tarutani , Jean-Marie Friedt
IPC分类号： F17D1/04 , B01J4/00 , B08B9/00 , B08B9/02 , F17C9/00 , B08B3/04 , B08B5/00 , B08B5/04
CPC分类号： B08B9/032 , B08B9/00 , B08B9/0321 , B08B9/0323 , F17C9/00
摘要： A process for reducing corrosion in a gas distribution network of ultra high purity gas or any part of said distribution network, including: (a) Wet cleaning the gas distribution network or at least one part thereof with a wet cleaning agent, (b) Liquid drying the gas distribution network or the at least one part thereof with an H.sub.2 O desorbing liquid drying agent selected from the group consisting of acetone dimethylacetal DMP, 2.2 dichloropropane DCP or 2.2 dibromopropane DBP, mixtures thereof and any equivalent thereof, (c) purging said gas distribution network or any part thereof with a dry high purity gas comprising less than 1 ppm of any impurity, and (d) evacuating the gas distribution network or any part thereof at a pressure which is lower than 5.times.10.sup.4 Pascal (e) exposing the gas distribution network or any part thereof to an atmosphere including an ultra high purity corrosive gas or air.
摘要翻译：一种用于减少超高纯度气体或所述分配网络的任何部分的气体分配网络中的腐蚀的方法，包括：（a）用湿式清洁剂湿气清洁气体分配网络或其至少一部分，（b）液体用选自丙酮二甲基缩醛DMP，2.2二氯丙烷DCP或2.2二溴丙烷DBP，其混合物和其任何等同物的H 2 O解吸液体干燥剂干燥气体分配网络或其至少一部分，（c）吹扫所述气体分配网络或其任何部分具有包含小于1ppm的任何杂质的干燥高纯度气体，以及（d）以低于5×104帕斯卡的压力（e）将气体分布网络或其任何部分抽空（e）网络或其任何部分到包括超高纯度腐蚀性气体或空气的气氛中。

3. 发明授权

US08308350B2 Method of determining thermal property of substrate and method of deciding heat treatment condition 失效
标题翻译：确定基材热性能的方法和决定热处理条件的方法
公开(公告)号：US08308350B2
公开(公告)日：2012-11-13
申请号：US11573257
申请日：2005-08-09
申请人： Yoichiro Yasuda , Toshiyuki Tsukamoto , Masamori Sanaka , Hiroshi Asechi , Atsuhiro Ogura
发明人： Yoichiro Yasuda , Toshiyuki Tsukamoto , Masamori Sanaka , Hiroshi Asechi , Atsuhiro Ogura
IPC分类号： G01N25/20 , G01K3/00 , G01K13/00 , G01J5/00
CPC分类号： H01L21/324 , G01N25/20 , G01N25/72 , H01L21/67115 , H01L21/67248
摘要： [Problem] To provide a method that can determine a thermal property of a substrate in a short time and a method that can determine a thermal process condition of an open-loop step.[Solving Means] In accordance with the substrate thermal property determining method of the present invention in a rapid thermal processing apparatus 1 comprising lamps 9 for heating a wafer W and temperature sensors T1 to T7 arranged so as to oppose the lamps 9, temperature data sequentially outputted from the temperature sensors T1 to T7 is obtained, while subjecting the wafer W arranged between the lamps 9 and temperature sensors T1 to T7 to pulsed heating with the lamps 9. Thereafter, the thermal property of the wafer W is determined by using the temperature data.
摘要翻译： [问题]提供一种可以在短时间内确定基板的热性能的方法以及可以确定开环步骤的热处理条件的方法。 [解决方案]根据本发明的快速热处理装置1中的基板热特性确定方法，包括用于加热晶片W的灯9和布置成与灯9相对布置的温度传感器T1至T7，温度数据顺序地在将灯9和温度传感器T1〜T7之间配置的晶片W进行脉冲加热的同时，对从温度传感器T1〜T7输出的温度传感器T1〜T7进行脉冲加热。此后，通过使用温度数据。

4. 发明申请

US20060113404A1 Cleaning device for vehicle lamp 审中-公开
标题翻译：汽车灯清洁装置
公开(公告)号：US20060113404A1
公开(公告)日：2006-06-01
申请号：US11288718
申请日：2005-11-28
申请人： Masaaki Sato , Yasuhiro Ichikawa , Toshiyuki Tsukamoto , Masaru Sakai
发明人： Masaaki Sato , Yasuhiro Ichikawa , Toshiyuki Tsukamoto , Masaru Sakai
IPC分类号： B05B1/10
CPC分类号： B60S1/528
摘要： In a cleaning device for a vehicle lamp for jetting a cleaning liquid to a front surface of a vehicle lamp by a piston and a cylinder, the piston is urged in the direction in which it is retracted into the cylinder by a tensile spring arranged between the piston and the cylinder and passing through the inside of the piston.
摘要翻译：在用于通过活塞和气缸将清洁液体喷射到车辆灯的前表面的车辆用灯具的清洁装置中，活塞通过布置在活塞和气缸并穿过活塞内部。

5. 外观设计

USD534933S1 Wire saw 有权
公开(公告)号：USD534933S1
公开(公告)日：2007-01-09
申请号：US29230934
申请日：2005-05-31
申请人： Toshiyuki Tsukamoto , Toshinobu Shimizu
设计人： Toshiyuki Tsukamoto , Toshinobu Shimizu

6. 发明授权

US6060034A Abatement system for ClF3 containing exhaust gases 失效
标题翻译：含有废气的ClF3排放系统
公开(公告)号：US6060034A
公开(公告)日：2000-05-09
申请号：US89237
申请日：1998-06-02
申请人： Toshiyuki Tsukamoto
发明人： Toshiyuki Tsukamoto
IPC分类号： B01D53/34 , B01D53/04 , B01D53/68
CPC分类号： B01D53/685
摘要： A process for the abatement of a ClF.sub.x containing gas such as exhaust gases from a reactor wherein at least one step of the manufacture of integrated circuit is carried out, wherein the ClF.sub.x containing gas is passed through a bed of adsorbent comprising sodalime having a moisture content of less than 3% by weight, to substantially remove all of the ClF.sub.x compound from the ClF.sub.x containing gas with substantially no generation of byproducts.
摘要翻译：一种用于减少含有ClF x的气体例如来自反应器的废气的方法，其中进行集成电路的制造的至少一个步骤，其中含ClF x的气体通过吸附剂床，所述吸附剂床含有含水分含量小于3重量％，以基本上不产生副产物从含ClF x的气体中基本上除去所有的ClFx化合物。

7. 发明申请

US20070291818A1 Method Of Determining Thermal Property Of Substrate And Method Of Deciding Heat Treatment Condition 失效
标题翻译：确定基材热性能的方法和决定热处理条件的方法
公开(公告)号：US20070291818A1
公开(公告)日：2007-12-20
申请号：US11573257
申请日：2005-08-09
申请人： Yoichiro Yasuda , Toshiyuki Tsukamoto , Masamori Sanaka , Hiroshi Asechi , Atsuhiro Ogura
发明人： Yoichiro Yasuda , Toshiyuki Tsukamoto , Masamori Sanaka , Hiroshi Asechi , Atsuhiro Ogura
IPC分类号： G01N25/20
CPC分类号： H01L21/324 , G01N25/20 , G01N25/72 , H01L21/67115 , H01L21/67248
摘要： [Problem] To provide a method that can determine a thermal property of a substrate in a short time and a method that can determine a thermal process condition of an open-loop step. [Solving Means] In accordance with the substrate thermal property determining method of the present invention in a rapid thermal processing apparatus 1 comprising lamps 9 for heating a wafer W and temperature sensors T1 to T7 arranged so as to oppose the lamps 9, temperature data sequentially outputted from the temperature sensors T1 to T7 is obtained, while subjecting the wafer W arranged between the lamps 9 and temperature sensors T1 to T7 to pulsed heating with the lamps 9. Thereafter, the thermal property of the wafer W is determined by using the temperature data.
摘要翻译： [问题]提供一种可以在短时间内确定基板的热性能的方法以及可以确定开环步骤的热处理条件的方法。 [解决方案]根据本发明的基板热特性确定方法，在快速热处理设备1中，包括用于加热晶片W的灯9和布置成与灯9相对的温度传感器T 1至T 7，温度在布置在灯9和温度传感器T 1至T 7之间的晶片W对灯9进行脉冲加热的同时，获得从温度传感器T 1至T 7顺序地输出的数据。此后，通过使用温度数据来确定晶片W的热性质。

8. 外观设计

USD533203S1 Wire saw 有权
公开(公告)号：USD533203S1
公开(公告)日：2006-12-05
申请号：US29230935
申请日：2005-05-31
申请人： Toshiyuki Tsukamoto , Toshinobu Shimizu
设计人： Toshiyuki Tsukamoto , Toshinobu Shimizu

9. 发明授权

US5591273A Process for distributing ultra high purity gases with minimized contamination and particulates 失效
标题翻译：以最小的污染物和微粒分布超高纯度气体的方法
公开(公告)号：US5591273A
公开(公告)日：1997-01-07
申请号：US366468
申请日：1994-12-30
申请人： Toshiyuki Tsukamoto , Norbert Fanjat , Jean Friedt
发明人： Toshiyuki Tsukamoto , Norbert Fanjat , Jean Friedt
IPC分类号： F17D1/04 , B01J4/00 , B08B9/00 , B08B9/02 , F17C9/00 , B08B3/04 , B08B5/00 , B08B5/04
CPC分类号： B08B9/032 , B08B9/00 , B08B9/0321 , B08B9/0323 , F17C9/00
摘要： A process for distributing ultra high purity gases with minimized contamination and particulates including; (a) purging said distribution network or any part thereof with dry inert high purity gas comprising less than 1 ppm of any impurity; (b) evacuating said distribution network or any part thereof at a pressure which is lower than 5.times.10.sup.4 Pascal; (b') optionally wet cleaning a gas distribution network or any part thereof with a wet cleaning agent, thereafter (c) liquid drying the gas distribution network or any part thereof with an H.sub.2 O desorbing liquid drying agent selected from the group including acetone dimethylacetal DMP, 2-2 dichloropropane DCP or 2-2 dibromopropane DBP, mixtures thereof and any equivalent thereof, and (d) distributing an ultra high purity gas through the distribution network or any part thereof.
摘要翻译：一种用于以最小化的污染物和微粒排放超高纯度气体的方法，包括：（a）用包含少于1ppm任何杂质的干惰性高纯度气体清洗所述分配网络或其任何部分; （b）以低于5×10 4帕斯卡的压力排空所述分配网络或其任何部分; （b'）任选地用湿式清洁剂湿气清洁气体分配网络或其任何部分，然后（c）用选自包括丙酮二甲基缩醛DMP的H 2 O解吸液体干燥剂液体干燥气体分配网络或其任何部分，2-2二氯丙烷DCP或2-2二溴丙烷DBP，其混合物和任何等同物，和（d）通过分配网络或其任何部分分配超高纯度气体。

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