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2. 发明授权

US5500326A Method of producing master and working pattern plates for etching and photolithographic apparatus therefor 失效
标题翻译：制造用于蚀刻的主工作图案板和工作图案板的方法及其光刻设备
公开(公告)号：US5500326A
公开(公告)日：1996-03-19
申请号：US67340
申请日：1993-05-25
申请人： Kei Kobayashi , Yoji Shiraishi
发明人： Kei Kobayashi , Yoji Shiraishi
IPC分类号： G03F7/20 , G03F7/26 , G03F7/00
CPC分类号： G03F7/70425 , G03F7/2045 , G03F7/70475 , G03F7/70716
摘要： In a method of producing master and working pattern plates for etching to form a shadow mask, various etching patterns are needed, for example, a pattern of predetermined holes for passing electron beams, a pattern of register marks necessary for accurate alignment of a pair of obverse and reverse working pattern plates, and a frame pattern for cutting off a portion which is to be a shadow mask from a metal plate by etching process. These individual pattern data required for etching are first prepared and then subjected to logical operation to prepare data representative of a synthetic pattern which is to be finally drawn on a photosensitive plate. Then, all the necessary patterns, including the frame pattern, register mark pattern, hole pattern, etc., are formed by continuous and collective exposure process by use of the synthetic pattern data, thereby eliminating the need for the step of aligning the individual patterns by a manual operation, which has heretofore been essential for multiple exposure, and thus solving not only the conventional problems in terms of both quality and process but also the problem attributable to the positioning accuracy of a photolithographic apparatus in which control is effected by a laser interferometric measuring device in an environment other than a vacuum.
摘要翻译：在制造用于蚀刻以形成荫罩的主工作图案板和工作图案板的方法中，需要各种蚀刻图案，例如，用于通过电子束的预定孔的图案，用于精确对准一对正面和反向工作图案板，以及通过蚀刻工艺从金属板切割要成为荫罩的部分的框架图案。首先准备蚀刻所需的这些单独的图案数据，然后进行逻辑运算，以准备表示最终在感光板上绘制的合成图案的数据。然后，通过使用合成图案数据通过连续和集体曝光处理形成包括帧图案，对准标记图案，孔图案等所有必要的图案，从而不需要对各个图案进行对准的步骤通过迄今为止对于多次曝光是至关重要的手动操作，因此不仅解决了质量和工艺方面的常规问题，而且解决了由激光器进行控制的光刻设备的定位精度干涉测量装置在真空以外的环境中。

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