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    • 4. 发明申请
    • SUBSTRATE WITH ANTIREFLECTION FILM
    • 具有抗反射膜的基底
    • US20070279750A1
    • 2007-12-06
    • US11830999
    • 2007-07-31
    • Kazuya YaoitaYoshihito KatayamaYukio Kimura
    • Kazuya YaoitaYoshihito KatayamaYukio Kimura
    • G02B5/28
    • G02B1/115
    • To provide a substrate with an antireflection film having a high visible light transmittance, a low reflectance and a high film resistivity, and having no cracking even when subjected to heat treatment. A substrate with an antireflection film comprising a transparent substrate and an antireflection film having even number layers in total of a coating film made of a high refractive material having a refractive index of at least 1.90 and a coating film made of a low refractive material having a refractive index of at most 1.56 laminated in this order from the transparent substrate side, wherein at least one coating film made of a high refractive material is a single layer film (a) of a titanium oxynitride layer, a laminated film (b) containing a titanium oxide layer and a zirconium oxide layer or a laminated film (c) containing a titanium oxynitride layer and a zirconium oxide layer.
    • 为了提供具有高可见光透射率,低反射率和高膜电阻率的抗反射膜的基板,甚至在经受热处理时也不会发生裂纹。 具有防反射膜的基板包括透明基板和抗折反射膜,其具有由具有至少1.90的折射率的高折射材料制成的涂膜总共具有偶数层,以及由低折射材料制成的涂膜,其具有 折射率为1.56以上的透明基板侧的层叠体,其中,由高折射材料构成的至少一层涂膜为氮氧化钛层的单层膜(a),含有 氧化钛层和氧化锆层或含有氮氧化钛层和氧化锆层的层叠膜(c)。