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    • 4. 发明授权
    • Plasma processing device and exhaust ring
    • 等离子处理装置和排气环
    • US06878234B2
    • 2005-04-12
    • US10416235
    • 2001-11-02
    • Masahiro OgasawaraKazuya Kato
    • Masahiro OgasawaraKazuya Kato
    • H05H1/46B01J19/08C23C16/00C23C16/509H01J37/32H01L21/00H01L21/205H01L21/302H01L21/3065C23F1/00C23C16/455H01L21/306
    • H01J37/32834H01J37/3244H01L21/67069
    • A plasma processing apparatus having an evacuation ring with high plasma resistance and capable of minimizing abnormal discharge is provided. A processing chamber 100 includes a ceiling unit 110 at which an upper electrode 112 is provided and a container unit 120 having a lower electrode 122 provided to face opposite the upper electrode 112, on which a substrate can be placed. An evacuation ring 126 is provided around the lower electrode 122 so as to divide the space in the processing chamber 100 into a plasma processing space 102 and an evacuation space 104. At the evacuation ring 126, through holes 126a and blind holes 126b which are fewer than the through holes 126a and open toward the plasma processing space 102 are formed. An insulation coating constituted of Y2O3 is applied onto the surface of the evacuation ring 126 towards the plasma processing space 102.
    • 提供了一种具有高等离子体电阻并能够使异常放电最小化的排气环的等离子体处理装置。 处理室100包括设置有上电极112的天花板单元110和具有设置成与上电极112相对设置的下电极122的容器单元120,可以放置基板。 在下部电极122周围设置有排气环126,以将处理室100中的空间分成等离子体处理空间102和排气空间104.在排气环126处,通气孔126a和盲孔126b较少 形成贯通孔126a并朝向等离子体处理空间102开口。 将由Y 2 O 3构成的绝缘涂层施加到排气环126的表面上朝向等离子体处理空间102。
    • 5. 发明申请
    • Plasma processing apparatus and evacuation ring
    • 等离子处理装置和疏散环
    • US20050126488A1
    • 2005-06-16
    • US11047595
    • 2005-02-02
    • Masahiro OgasawaraKazuya Kato
    • Masahiro OgasawaraKazuya Kato
    • H05H1/46B01J19/08C23C16/00C23C16/509H01J37/32H01L21/00H01L21/205H01L21/302H01L21/3065
    • H01J37/32834H01J37/3244H01L21/67069
    • A plasma processing apparatus having an evacuation ring with high plasma resistance and capable of minimizing abnormal discharge is provided. A processing chamber 100 includes a ceiling unit 110 at which an upper electrode 112 is provided and a container unit 120 having a lower electrode 122 provided to face opposite the upper electrode 112, on which a substrate can be placed. An evacuation ring 126 is provided around the lower electrode 122 so as to divide the space in the processing chamber 100 into a plasma processing space 102 and an evacuation space 104. At the evacuation ring 126, through holes 126a and blind holes 126b which are fewer than the through holes 126a and open toward the plasma processing space 102 are formed. An insulation coating constituted of Y2O3 is applied onto the surface of the evacuation ring 126 towards the plasma processing space 102.
    • 提供了一种具有高等离子体电阻并能够使异常放电最小化的排气环的等离子体处理装置。 处理室100包括设置有上电极112的天花板单元110和具有设置成与上电极112相对设置的下电极122的容器单元120,可以放置基板。 在下电极122周围设置有排气环126,以将处理室100中的空间分成等离子体处理空间102和抽空空间104。 在排气环126处形成通孔126a和盲孔126b,盲孔126b比通孔126a少并且朝向等离子体处理空间102开口。 由排气环126的表面向等离子体处理空间102施加由Y 2 O 3 3构成的绝缘涂层。
    • 6. 发明授权
    • Plasma processing apparatus and evacuation ring
    • 等离子处理装置和疏散环
    • US07255773B2
    • 2007-08-14
    • US11047595
    • 2005-02-02
    • Masahiro OgasawaraKazuya Kato
    • Masahiro OgasawaraKazuya Kato
    • H01L21/3065C23C16/00C23C16/455
    • H01J37/32834H01J37/3244H01L21/67069
    • A plasma processing apparatus having an evacuation ring with high plasma resistance and capable of minimizing abnormal discharge is provided. A processing chamber 100 includes a ceiling unit 110 at which an upper electrode 112 is provided and a container unit 120 having a lower electrode 122 provided to face opposite the upper electrode 112, on which a substrate can be placed. An evacuation ring 126 is provided around the lower electrode 122 so as to divide the space in the processing chamber 100 into a plasma processing space 102 and an evacuation space 104. At the evacuation ring 126, through holes 126a and blind holes 126b which are fewer than the through holes 126a and open toward the plasma processing space 102 are formed. An insulation coating constituted of Y2O3 is applied onto the surface of the evacuation ring 126 towards the plasma processing space 102.
    • 提供了一种具有高等离子体电阻并能够使异常放电最小化的排气环的等离子体处理装置。 处理室100包括设置有上电极112的天花板单元110和具有设置成与上电极112相对设置的下电极122的容器单元120,可以放置基板。 在下电极122周围设置有排气环126,以将处理室100中的空间分成等离子体处理空间102和抽空空间104。 在排气环126处形成通孔126a和盲孔126b,盲孔126b比通孔126a少并且朝向等离子体处理空间102开口。 由排气环126的表面向等离子体处理空间102施加由Y 2 O 3 3构成的绝缘涂层。
    • 7. 发明申请
    • Wireless Power Transmission System
    • 无线传输系统
    • US20130234533A1
    • 2013-09-12
    • US13871067
    • 2013-04-26
    • Kazuya KatoKazuaki Higashibata
    • Kazuya KatoKazuaki Higashibata
    • H04B5/00
    • H04B5/0037H01G5/04H02J7/0044H02J7/025H02J17/00H02J50/12H02J50/90
    • A wireless power transmission system that includes a power transmission apparatus including a passive electrode and an active electrode and a power reception apparatus including passive electrodes and active electrode. When the power reception apparatus is longitudinally placed on the power transmission apparatus, the active electrodes are opposed to each other to cause electric power to be transmitted from the power transmission apparatus to the power reception apparatus. A facing area between the active electrodes in lateral placement of the power reception apparatus on the power transmission apparatus is made substantially equal to a facing area between the active electrodes in the longitudinal placement of the power reception apparatus on the power transmission apparatus.
    • 一种无线电力传输系统,其包括包括无源电极和有源电极的电力传输装置和包括无源电极和有源电极的电力接收装置。 当电力接收装置纵向放置在电力传输装置上时,有源电极彼此相对,从而将电力从电力传输装置传送到电力接收装置。 功率接收装置在动力传递装置上的侧向放置的有源电极之间的面对区域在动力传递装置的受电装置的纵向放置中基本上等于有源电极之间的相对面积。