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1. 发明申请

US20080265788A1 EL LIGHT EMITTING TOUCH SWITCH 有权
标题翻译： EL发光触摸开关
公开(公告)号：US20080265788A1
公开(公告)日：2008-10-30
申请号：US12109143
申请日：2008-04-24
申请人： Kazuto YAMAUCHI , Yasunori MURAYAMA , Sadahiko TANAKA , Keitaro TAKIZAWA , Kouichi YAMANOUE
发明人： Kazuto YAMAUCHI , Yasunori MURAYAMA , Sadahiko TANAKA , Keitaro TAKIZAWA , Kouichi YAMANOUE
IPC分类号： G09G3/00
CPC分类号： H03K17/962 , H03K2217/960795 , Y10S323/904
摘要： A touch switch is composed of an EL light emitting layer configured by stacking a fluorescent layer and an insulation layer between first electrodes and a second electrode, a judgment means for making a judgment on touch manipulation with the first electrode by an operator and an EL driving unit for driving the EL light emitting layer for light emitting, with each of a plurality of first electrodes, each of plurality of fluorescent layers and each of plurality of insulation layers being provided as a set and the second electrode being provided as a single electrode with respect to the plurality of first electrodes, wherein the judgment means makes a judgment on which of the plurality of first electrodes has been touched by an operator on the basis of a high-frequency component inputted from the second electrode through the first electrode each time the touch switch is touched by an operator.
摘要翻译：触摸开关由通过在第一电极和第二电极之间堆叠荧光层和绝缘层而构成的EL发光层构成，用于通过操作者判断与第一电极的触摸操作的判断装置和EL驱动用于驱动用于发光的EL发光层的单元，其中多个第一电极中的每一个，多个荧光层中的每一个以及多个绝缘层中的每一个设置为一组，并且所述第二电极设置为单个电极，相对于多个第一电极，其中判断装置基于从每个第一电极从第二电极输入的高频分量来判断操作者已经接触了多个第一电极中的哪一个，触摸开关被操作者触摸。

2. 发明申请

US20100330371A1 PANEL DEVICE 有权
标题翻译：面板设备
公开(公告)号：US20100330371A1
公开(公告)日：2010-12-30
申请号：US12878087
申请日：2010-09-09
申请人： Kazuto YAMAUCHI , Yasunori Murayama , Sadahiko Tanaka , Keitaro Takizawa , Kouichi Yamanoue
发明人： Kazuto YAMAUCHI , Yasunori Murayama , Sadahiko Tanaka , Keitaro Takizawa , Kouichi Yamanoue
IPC分类号： B32B9/04
CPC分类号： H03K17/962 , H01H2239/006 , H03K2217/960755 , Y10T428/31504
摘要： A panel device includes a panel section, a first conductive layer that is provided in a side of one surface of the panel section, an insulating layer that is stacked on the first conductive layer and a second conductive layer that is stacked on the insulating layer. The first conductive layer and the second conductive layer are formed by coating an electrically conductive solvent-type substance. The insulating layer is formed by coating an insulating curing-acceleration-type substance.
摘要翻译：面板装置包括面板部分，设置在面板部分的一个表面的一侧的第一导电层，堆叠在第一导电层上的绝缘层和堆叠在绝缘层上的第二导电层。第一导电层和第二导电层通过涂覆导电溶剂型物质形成。绝缘层通过涂覆绝缘固化加速型物质形成。

3. 发明申请

US20100328266A1 ELECTROSTATIC CAPACITIVE TOUCH SENSOR DEVICE 有权
标题翻译：静电电容触摸传感器装置
公开(公告)号：US20100328266A1
公开(公告)日：2010-12-30
申请号：US12878462
申请日：2010-09-09
申请人： Kazuto YAMAUCHI , Yasunori Murayama , Sadahiko Tanaka , Keitaro Takizawa , Kouichi Yamanoue
发明人： Kazuto YAMAUCHI , Yasunori Murayama , Sadahiko Tanaka , Keitaro Takizawa , Kouichi Yamanoue
IPC分类号： G06F3/045
CPC分类号： H03K17/962 , H03K2217/960755
摘要： An electrostatic capacitive touch sensor device includes sensing electrode provided at a plurality of positions, a high-frequency signal source that applies a high-frequency signal to the sensing electrode through a predetermined impedance element, a wiring portion that connects the sensing electrode and the impedance element, a shield portion provided to embrace the sensing electrodes and the connecting pattern, and a shield signal source that applies a shield signal to the shield portion and has the same phase and amplitude as the high-frequency signal source.
摘要翻译：静电电容式触摸传感器装置包括设置在多个位置的感测电极，通过预定阻抗元件将高频信号施加到感测电极的高频信号源，连接检测电极的布线部分和阻抗元件，设置成包围感测电极和连接图案的屏蔽部分，以及屏蔽信号源，其向屏蔽部分施加屏蔽信号，并具有与高频信号源相同的相位和幅度。

4. 发明申请

US20100147463A1 CATALYST-AIDED CHEMICAL PROCESSING METHOD AND APPARATUS 审中-公开
标题翻译：催化辅助化学处理方法和装置
公开(公告)号：US20100147463A1
公开(公告)日：2010-06-17
申请号：US12636069
申请日：2009-12-11
申请人： Kazuto YAMAUCHI , Yasuhisa SANO , Hideyuki HARA , Junji MURATA , Keita YAGI
发明人： Kazuto YAMAUCHI , Yasuhisa SANO , Hideyuki HARA , Junji MURATA , Keita YAGI
IPC分类号： C23F1/08
CPC分类号： H01L21/3212 , B01J23/28 , C23C8/40 , C23C18/14 , C25D5/06 , C25D5/22 , C25D21/12 , H01L21/02348 , H01L21/30612 , H01L21/31051 , H01L21/32115 , H01L21/32134
摘要： A catalyst-aided chemical processing method can process hard-to-process materials, especially SiC, GaN, etc. whose importance as electronic device materials is increasing these days, with high processing efficiency and high precision even for a space wavelength range of not less than several tens of μm. The catalyst-aided chemical processing method comprises: putting a workpiece in a processing liquid in which halogen-containing molecules are dissolved; and moving the workpiece and a catalyst composed of molybdenum or a molybdenum compound relative to each other while keeping the catalyst in contact with or close proximity to a surface to be processed of the workpiece, thereby processing the surface of the workpiece.
摘要翻译：催化剂辅助化学处理方法可以处理难加工材料，特别是SiC，GaN等，其电子器件材料的重要性日益增加，即使对于不小于等于的空间波长范围，处理效率高，精度高比几十μm。催化剂辅助化学处理方法包括：将工件放入其中溶解含卤素分子的处理液中; 并且使工件和由钼或钼化合物组成的催化剂相对于彼此移动，同时保持催化剂与待加工的表面接触或接近工件，从而处理工件的表面。

5. 发明申请

US20120276474A1 METHOD OF CLEANING SUBSTRATE 有权
标题翻译：清洗基板的方法
公开(公告)号：US20120276474A1
公开(公告)日：2012-11-01
申请号：US13455740
申请日：2012-04-25
申请人： Kazuto YAMAUCHI , Tsutomu SHOKI , Takeyuki YAMADA
发明人： Kazuto YAMAUCHI , Tsutomu SHOKI , Takeyuki YAMADA
IPC分类号： G03F1/76 , G03F1/50 , B08B5/00 , B08B3/02 , B08B3/08
CPC分类号： H01L21/02052 , B08B3/02 , B24C1/04 , B24C7/0007 , G03F1/82 , H01L21/67051 , H01L21/67057
摘要： The present invention is a method of cleaning a substrate, comprising cleaning at least one surface of a substrate located in a liquid by injecting pressurized cleaning liquid containing bubbles or cleaning particles from a injection nozzle to at least one surface of the substrate.
摘要翻译：本发明是一种清洗基材的方法，包括通过将含有气泡或清洁颗粒的加压清洗液从注射喷嘴注入基材的至少一个表面来清洗位于液体中的基材的至少一个表面。

6. 发明申请

US20120241087A1 CATALYST-AIDED CHEMICAL PROCESSING METHOD 有权
标题翻译：催化辅助化学处理方法
公开(公告)号：US20120241087A1
公开(公告)日：2012-09-27
申请号：US13449622
申请日：2012-04-18
申请人： Kazuto YAMAUCHI , Yasuhisa Sano
发明人： Kazuto YAMAUCHI , Yasuhisa Sano
IPC分类号： C23F1/08
CPC分类号： B81C1/00539 , Y10T428/31678 , Y10T442/20
摘要： A catalyst-aided chemical processing method is a novel processing method having a high processing efficiency and suited for processing in a space wavelength range of not less than several tens of μm. The catalyst-aided chemical processing method comprises: immersing a workpiece in a processing solution in which a halogen-containing molecule is dissolved, said workpiece normally being insoluble in said processing solution; and bringing a platinum, gold or ceramic solid catalyst close to or into contact with a processing surface of the workpiece, thereby processing the workpiece through dissolution in the processing solution of a halogenide produced by chemical reaction between a halogen radical generated at the surface of the catalyst and a surface atom of the workpiece.
摘要翻译：催化剂辅助化学处理方法是一种具有高处理效率并且适于在不小于几十μm的空间波长范围内进行处理的新型加工方法。催化剂辅助化学处理方法包括：将工件浸入其中溶解有含卤素分子的处理溶液中，所述工件通常不溶于所述处理溶液; 并将铂，金或陶瓷固体催化剂与工件的加工表面接近或接触，从而通过溶解在通过在表面上产生的卤素自由基之间的化学反应产生的卤化物的处理溶液中来处理工件催化剂和工件的表面原子。

7. 发明申请

US20100273381A1 CATALYST-AIDED CHEMICAL PROCESSING METHOD 审中-公开
标题翻译：催化辅助化学处理方法
公开(公告)号：US20100273381A1
公开(公告)日：2010-10-28
申请号：US12832194
申请日：2010-07-08
申请人： Kazuto YAMAUCHI , Yasuhisa Sano
发明人： Kazuto YAMAUCHI , Yasuhisa Sano
IPC分类号： B32B5/02 , B32B15/08 , B32B18/00
CPC分类号： B81C1/00539 , Y10T428/31678 , Y10T442/20
摘要： A catalyst-aided chemical processing method is a novel processing method having a high processing efficiency and suited for processing in a space wavelength range of not less than several tens of μm. The catalyst-aided chemical processing method comprises: immersing a workpiece in a processing solution in which a halogen-containing molecule is dissolved, said workpiece normally being insoluble in said processing solution; and bringing a platinum, gold or ceramic solid catalyst close to or into contact with a processing surface of the workpiece, thereby processing the workpiece through dissolution in the processing solution of a halogenide produced by chemical reaction between a halogen radical generated at the surface of the catalyst and a surface atom of the workpiece.
摘要翻译：催化剂辅助化学处理方法是一种具有高处理效率并且适于在不小于几十μm的空间波长范围内进行处理的新型加工方法。催化剂辅助化学处理方法包括：将工件浸入其中溶解有含卤素分子的处理溶液中，所述工件通常不溶于所述处理溶液; 并将铂，金或陶瓷固体催化剂与工件的加工表面接近或接触，从而通过溶解在通过在表面上产生的卤素自由基之间的化学反应产生的卤化物的处理溶液中来处理工件催化剂和工件的表面原子。

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