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    • 4. 发明授权
    • Method of fabricating a thin film transistor array
    • 制造薄膜晶体管阵列的方法
    • US4654117A
    • 1987-03-31
    • US839673
    • 1986-03-14
    • Shigeo AokiJunichi TamamuraYasuhiro Ukai
    • Shigeo AokiJunichi TamamuraYasuhiro Ukai
    • G09G3/36G02F1/133G02F1/1335G02F1/136G02F1/1362G02F1/1368G09F9/30H01L21/306B44C1/22C03C15/00C23F1/02
    • G02F1/1362G02F1/133514G02F1/1368G02F1/13454Y10S438/949
    • An array of thin film transistors is fabricated by forming a plurality of spaced closely adjacent metallic source and drain electrodes on an array area of a transparent substrate, forming semiconductor layers on the substrate between each adjacent pair of source and drain electrodes in overlapping relation to the edges of each such pair, covering the semiconductor layers with a gate insulation film that extends over substantially all of said array area, forming a transparent gate electrode layer over the gate insulation film, covering the transparent gate electrode layer with a photosensitive resin layer which is then exposed to light through the transparent substrate and transparent gate electrode layer with the metallic source and drain electrodes acting as masks, developing the photosensitive resin layer to remove portions thereof other than the exposed portions, and etching the transparent gate electrode with the remaining portions of the resin layer serving as masks thereby to form the gate electrodes of the thin film transistors in the array.
    • 通过在透明衬底的阵列区域上形成多个间隔紧密的金属源极和漏电极来制造薄膜晶体管阵列,在每个相邻的一对源电极和漏电极之间的衬底上形成半导体层,以与 每个这样的对的边缘覆盖半导体层,栅极绝缘膜在基本上所有的阵列区域上延伸,在栅极绝缘膜上形成透明栅电极层,用感光树脂层覆盖透明栅电极层,该感光树脂层是 然后通过透明基板和透明栅极电极层暴露于金属源极和漏极用作掩模,将感光性树脂层除去除了暴露部分之外的部分,并且将其余部分蚀刻到透明栅电极 树脂层用作掩模 m阵列中的薄膜晶体管的栅电极。
    • 6. 发明授权
    • Automatic profiling machine
    • 自动轮廓机
    • US4031669A
    • 1977-06-28
    • US631550
    • 1975-11-13
    • Sakae KoideShigeo Aoki
    • Sakae KoideShigeo Aoki
    • B24B21/16B23Q33/00B23Q35/123B24B17/00B24B19/14
    • B23Q35/123B24B17/00Y10T409/300896Y10T409/303136
    • A model and a workpiece are rotated synchronously, and a stylus is disposed for relative movement toward or away from the model in a direction perpendicular to the axis of rotation thereof for contact therewith. The amount of displacement of the stylus from its neutral point which occurs while it contacts the model is detected by a tracer head and is divided into a pair of components lying in a plane perpendicular to the axis of rotation of the model which are along the direction of said relative movement and along a direction orthogonal thereto. The distance between the center of rotation of the model and the center of the stylus is also detected, and is utilized together with the two orthogonal components of the displacement, the radius of the stylus, a reference displacement of the stylus as well as an established speed therefor in order to control the speed of rotation of the model and the speed of said relative movement between the stylus and the model so that the speed with which the point of contact between the stylus and the model moves along the contour of the model becomes equal to a preselected value. A workpiece and a tool therefor are disposed in a similar relationship as the relationship between the model and the stylus, and are driven in synchronism with the model and the stylus for profiling the workpiece. Where the tool contacts the workpiece over a certain width as with an abrasive belt, the contact segment of the stylus is angularly moved so as to follow the curved surface of the model, thereby detecting an angle of skew of the curved surface so that the angle of skew of the tool coincides with the detected angle.
    • 模型和工件同步旋转,并且设置触针用于在垂直于其旋转轴线的方向上相对于模型相对移动或远离模型以与其接触。 触针与其在接触模型时发生的中性点的位移量由示踪器头部检测,并且被分成位于垂直于模型的旋转轴线的平面中的一对部件,该对部件沿着方向 的所述相对运动并且沿着与其正交的方向。 模型的旋转中心与触控笔的中心之间的距离也被检测到,并且与位移的两个正交分量,触针的半径,触笔的参考位移以及已建立的 为了控制模型的旋转速度和触控笔和模型之间的所述相对运动的速度,使得触针和模型之间的接触点沿着模型的轮廓移动的速度变为 等于预选值。 工件及其工具以与模型和触针之间的关系相似的关系设置,并且与用于对工件进行成形的模型和触针同步地驱动。 如果工具在与研磨带一样的宽度上接触工件,则触针的接触段被成角度地移动以便跟随模型的弯曲表面,从而检测弯曲表面的歪斜角度,使得角度 歪斜的工具与检测到的角度一致。