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1. 发明申请

US20120077124A1 RESIST LOWER LAYER FILM-FORMING COMPOSITION, POLYMER, RESIST LOWER LAYER FILM, PATTERN-FORMING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE 有权
标题翻译：耐下层膜成膜组合物，聚合物，耐下层膜，图案形成方法和生产半导体器件的方法
公开(公告)号：US20120077124A1
公开(公告)日：2012-03-29
申请号：US13248198
申请日：2011-09-29
申请人： Kazuo Nakahara , Tomoki Nagai
发明人： Kazuo Nakahara , Tomoki Nagai
IPC分类号： G03F7/20 , G03F7/004 , C08F224/00 , H01L21/311
CPC分类号： C08F224/00 , G03F7/091 , G03F7/094 , G03F7/2041
摘要： A resist lower layer film-forming composition includes (A) a polymer that includes a cyclic carbonate structure. The polymer (A) includes a structural unit (I) shown by the following formula (1).
摘要翻译：抗蚀剂下层成膜组合物包含（A）包含环状碳酸酯结构的聚合物。聚合物（A）包括由下式（1）表示的结构单元（I）。

2. 发明授权

US08647810B2 Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device 有权
标题翻译：抗下层成膜组合物，聚合物，抗蚀剂下层膜，图案形成方法和半导体器件的制造方法
公开(公告)号：US08647810B2
公开(公告)日：2014-02-11
申请号：US13248198
申请日：2011-09-29
申请人： Kazuo Nakahara , Tomoki Nagai
发明人： Kazuo Nakahara , Tomoki Nagai
IPC分类号： G03F7/00 , G03F7/11 , G03F7/40 , C08F24/00 , C08F34/02
CPC分类号： C08F224/00 , G03F7/091 , G03F7/094 , G03F7/2041
摘要： A resist lower layer film-forming composition includes (A) a polymer that includes a cyclic carbonate structure. The polymer (A) includes a structural unit (I) shown by the following formula (1).
摘要翻译：抗蚀剂下层成膜组合物包含（A）包含环状碳酸酯结构的聚合物。聚合物（A）包括由下式（1）表示的结构单元（I）。

3. 发明授权

US09040221B2 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，抗蚀剂图案形成方法，聚合物和化合物
公开(公告)号：US09040221B2
公开(公告)日：2015-05-26
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , C08F220/26 , G03F7/038 , G03F7/039 , G03F7/20 , C07C69/653 , C07C69/753 , C07D307/93 , C08F24/00 , C08F220/24
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

4. 发明授权

US08722306B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

5. 发明申请

US20130122426A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
标题翻译：辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物
公开(公告)号：US20130122426A1
公开(公告)日：2013-05-16
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , G03F7/20 , C07C69/753 , C08F24/00 , C07C69/653 , C07D307/93
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

6. 发明申请

US20100178608A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

7. 发明申请

US20100040977A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100040977A1
公开(公告)日：2010-02-18
申请号：US12514212
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
摘要翻译：辐射敏感性树脂组合物包括包含下式（1）所示的重复单元和溶剂的树脂。辐射敏感性树脂组合物作为辐射敏感性酸产生剂具有优异的性能，包括仅在很小程度上对环境和人体有不利影响的树脂，并且可以形成具有高分辨率并形成优异的抗蚀剂图案。其中R1表示氢原子等，M +表示特定的阳离子，n表示1〜5的整数。

8. 发明申请

US20090318652A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION 有权
标题翻译：新型化合物，聚合物和树脂组合物
公开(公告)号：US20090318652A1
公开(公告)日：2009-12-24
申请号：US12097414
申请日：2006-12-13
申请人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
发明人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
IPC分类号： C08F28/02 , C07C69/533
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397
摘要： A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein R1 represents a methyl group or a hydrogen atom, R2, R3 and R4 individually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X− represents a counter ion of S+.
摘要翻译：对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂如感光度，分辨率和图案形状的基本性能优异，特别是表现出高分辨率性能，优异的DOF和LER，以及对提供了用于液浸光刻的液体介质。还提供了可用于组合物中的聚合物，可用于合成聚合物的新化合物，以及该组合物的制备方法。通过使用由下式（1）表示的新化合物，其中R 1表示甲基或氢原子，可以得到对液体介质具有优异抗性的辐射敏感性树脂组合物，R2，R3和R4分别表示取代或未取代的碳原子数1〜10的一价有机基团，n表示0〜3的整数，A表示亚甲基，碳原子数2〜10的直链或支链亚烷基或亚芳基，X表示 S +的反离子。

9. 发明授权

US07258962B2 Positive-tone radiation-sensitive resin composition 有权
标题翻译：正色辐射敏感树脂组合物
公开(公告)号：US07258962B2
公开(公告)日：2007-08-21
申请号：US11117344
申请日：2005-04-29
申请人： Tomoki Nagai , Takayuki Tsuji
发明人： Tomoki Nagai , Takayuki Tsuji
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/115 , Y10S430/121 , Y10S430/127
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali when the acid-dissociable group dissociates is disclosed. wherein R1 and R2 are individually halogen atom, methyl, cyano, or nitro group, X is a C1-20 organic group, and h and i are 0-4. The resin composition is useful as a chemically amplified positive-tone resist excelling in focal depth allowance, sensitivity, resolution, pattern profile, and PED stability.
摘要翻译： 1.一种正色射线敏感性树脂组合物，其含有：（A）下述式（1）表示的咔唑衍生物，（B）含有磺酰亚胺化合物和碘鎓盐化合物作为必要成分的光酸产生剂，（C）公开了酸解离基团的树脂，其不溶于或几乎不溶于碱，但在酸解离基解离时变得可溶于碱。其中R 1和R 2各自为卤素原子，甲基，氰基或硝基，X为C 1-20官能团，而h和i为0-4。该树脂组合物可用作具有优异的焦深度余量，灵敏度，分辨率，图案分布和PED稳定性的化学放大正色调抗蚀剂。

10. 发明申请

US20050244747A1 Positive-tone radiation-sensitive resin composition 有权
标题翻译：正色辐射敏感树脂组合物
公开(公告)号：US20050244747A1
公开(公告)日：2005-11-03
申请号：US11117344
申请日：2005-04-29
申请人： Tomoki Nagai , Takayuki Tsuji
发明人： Tomoki Nagai , Takayuki Tsuji
IPC分类号： G03F7/004 , G03C1/492 , G03F7/039 , G03F7/20 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106 , Y10S430/115 , Y10S430/121 , Y10S430/127
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali when the acid-dissociable group dissociates is disclosed. wherein R1 and R2 are individually halogen atom, methyl, cyano, or nitro group, X is a C1-20 organic group, and h and i are 0-4. The resin composition is useful as a chemically amplified positive-tone resist excelling in focal depth allowance, sensitivity, resolution, pattern profile, and PED stability.
摘要翻译： 1.一种正色射线敏感性树脂组合物，其含有：（A）下述式（1）表示的咔唑衍生物，（B）含有磺酰亚胺化合物和碘鎓盐化合物作为必要成分的光酸产生剂，（C）公开了酸解离基团的树脂，其不溶于或几乎不溶于碱，但在酸解离基解离时变得可溶于碱。其中R 1和R 2各自为卤素原子，甲基，氰基或硝基，X为C 1-20官能团，而h和i为0-4。该树脂组合物可用作具有优异的焦深度余量，灵敏度，分辨率，图案分布和PED稳定性的化学放大正色调抗蚀剂。

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