专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120115985A1 PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD 有权
标题翻译：形成水解涂料和水解涂料的方法，以及形成喷墨记录头和喷墨记录头的方法
公开(公告)号：US20120115985A1
公开(公告)日：2012-05-10
申请号：US13281124
申请日：2011-10-25
申请人： Kazunari Ishizuka , Ken Ikegame , Shoji Shiba
发明人： Kazunari Ishizuka , Ken Ikegame , Shoji Shiba
IPC分类号： B41J2/135 , B32B37/14 , C09D163/00 , B32B37/02
CPC分类号： B41J2/1606 , B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1645 , C08G59/32 , C08G59/687 , C09D163/00
摘要： A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.
摘要翻译：一种形成亲水涂层的方法，包括（1）在基材上形成包括其主链中具有酸可切割键的阳离子聚合树脂的涂布树脂层和产生锑酸或酸的酸的光致酸产生剂通过用包括紫外光的活性能量射线照射，酸性强度比锑酸弱; （2）在树脂层上层叠含有光酸产生剂的光致酸发生剂保持层，该光酸发生剂保持层通过用能量射线照射产生酸强度高于锑酸的酸，以及保持光致酸发生剂的保持体在步骤（3）中去除; （3）通过将这些层暴露于能量射线去除保持层并固化树脂层以进行显影; 和（4）通过对树脂层的表面进行热处理使其亲水化而形成亲水性涂层。

2. 发明授权

US08673546B2 Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head 有权
标题翻译：用于形成亲水涂层和亲水涂层的方法，以及用于形成喷墨记录头和喷墨记录头的方法
公开(公告)号：US08673546B2
公开(公告)日：2014-03-18
申请号：US13281124
申请日：2011-10-25
申请人： Kazunari Ishizuka , Ken Ikegame , Shoji Shiba
发明人： Kazunari Ishizuka , Ken Ikegame , Shoji Shiba
IPC分类号： G03F7/00
CPC分类号： B41J2/1606 , B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1645 , C08G59/32 , C08G59/687 , C09D163/00
摘要： A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.
摘要翻译：一种形成亲水涂层的方法，包括（1）在基材上形成包括其主链中具有酸可切割键的阳离子聚合树脂的涂布树脂层和产生锑酸或酸的酸的光致酸产生剂通过用包括紫外光的活性能量射线照射，酸性强度比锑酸弱; （2）在树脂层上层叠含有光酸产生剂的光致酸发生剂保持层，该光酸发生剂保持层通过用能量射线照射产生酸强度高于锑酸的酸，以及保持光致酸发生剂的保持体在步骤（3）中去除; （3）通过将这些层暴露于能量射线去除保持层并固化树脂层以进行显影; 和（4）通过对树脂层的表面进行热处理使其亲水化而形成亲水性涂层。

3. 发明授权

US08753798B2 Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head 有权
标题翻译：用于形成亲水涂层和亲水涂层的方法，以及用于形成喷墨记录头和喷墨记录头的方法
公开(公告)号：US08753798B2
公开(公告)日：2014-06-17
申请号：US13281172
申请日：2011-10-25
申请人： Kazunari Ishizuka , Ken Ikegame
发明人： Kazunari Ishizuka , Ken Ikegame
IPC分类号： G03F7/00
CPC分类号： G03F7/11 , B41J2/1603 , B41J2/1606 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1645 , G03F7/038 , G03F7/095 , G03F7/40
摘要： A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin layer including a second cationic polymerization resin which includes an acid-cleavable linkage in its main chain, and a second photoacid generator which generates methide acid by irradiation with an active energy ray including ultraviolet light; (3) forming a coating by curing the first coating resin layer and the second coating resin layer through exposure of the first coating resin layer and the second coating resin layer to the active energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the coating through heat treatment of the coating.
摘要翻译：一种形成亲水涂层和亲水涂层的方法，所述方法包括以下步骤：（1）在基材上形成包含第一阳离子聚合树脂和第一光致酸发生剂的第一涂料树脂层; （2）在第一涂布树脂层上层叠包含第二阳离子聚合树脂的第二涂料树脂层，所述第二涂料树脂层在其主链中包含酸可断裂键，以及通过用活性能量照射产生甲基化酸的第二光酸产生剂射线包括紫外线; （3）通过将第一涂料树脂层和第二涂料树脂层暴露于活性能量射线来固化第一涂料树脂层和第二涂料树脂层来形成涂料以进行显影; 和（4）通过涂层的热处理使涂层的表面亲水化而形成亲水涂层。

4. 发明申请

US20120115089A1 PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD 有权
标题翻译：形成水解涂料和水解涂料的方法，以及形成喷墨记录头和喷墨记录头的方法
公开(公告)号：US20120115089A1
公开(公告)日：2012-05-10
申请号：US13281172
申请日：2011-10-25
申请人： Kazunari Ishizuka , Ken Ikegame
发明人： Kazunari Ishizuka , Ken Ikegame
IPC分类号： B32B3/00 , G03F7/20
CPC分类号： G03F7/11 , B41J2/1603 , B41J2/1606 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1645 , G03F7/038 , G03F7/095 , G03F7/40
摘要： A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin layer including a second cationic polymerization resin which includes an acid-cleavable linkage in its main chain, and a second photoacid generator which generates methide acid by irradiation with an active energy ray including ultraviolet light; (3) forming a coating by curing the first coating resin layer and the second coating resin layer through exposure of the first coating resin layer and the second coating resin layer to the active energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the coating through heat treatment of the coating.
摘要翻译：一种形成亲水涂层和亲水涂层的方法，所述方法包括以下步骤：（1）在基材上形成包含第一阳离子聚合树脂和第一光致酸发生剂的第一涂料树脂层; （2）在第一涂布树脂层上层叠包含第二阳离子聚合树脂的第二涂料树脂层，所述第二涂料树脂层在其主链中包含酸可断裂键，以及通过用活性能量照射产生甲基化酸的第二光酸产生剂射线包括紫外线; （3）通过将第一涂料树脂层和第二涂料树脂层暴露于活性能量射线来固化第一涂料树脂层和第二涂料树脂层来形成涂料以进行显影; 和（4）通过涂层的热处理使涂层的表面亲水化而形成亲水涂层。

5. 发明授权

US08528209B2 Method for manufacturing discharge port member and method for manufacturing liquid discharge head 有权
标题翻译：排出口构件的制造方法及排液头的制造方法
公开(公告)号：US08528209B2
公开(公告)日：2013-09-10
申请号：US12943776
申请日：2010-11-10
申请人： Ken Ikegame , Hiroaki Mihara
发明人： Ken Ikegame , Hiroaki Mihara
IPC分类号： B21D53/76 , B23P17/00 , B41J2/135 , B41J2/05
CPC分类号： B41J2/162 , B41J2/1404 , B41J2/1623 , B41J2/1625 , B41J2/1631 , B41J2/1639 , B41J2/1642 , B41J2/1643 , B41J2/1646 , B41J2002/14411
摘要： A method for manufacturing a discharge port member used in a liquid discharge head, comprising in the following order, preparing a substrate at least whose surface is conductive, the substrate having, formed on said surface, a first insulating resist for forming a discharge port and a second insulating resist for forming a recessed portion of a wall of a flow path, forming on surface a first plating layer by plating using said first resist and said second resist as a mask, removing said second resist, forming a second plating layer on an exposed portion of said substrate from which said second resist has been removed, said second plating layer being formed by plating using said first resist as a mask, said second plating layer forming said recessed portion of said wall, and removing said first resist to form said discharge port and removing said substrate.
摘要翻译：一种用于制造在液体排出头中使用的排出口构件的方法，包括以下顺序制备至少其表面导电的基底，所述基底在所述表面上形成有用于形成排出口的第一绝缘抗蚀剂，用于形成流路壁的凹陷部分的第二绝缘抗蚀剂，通过使用所述第一抗蚀剂和所述第二抗蚀剂作为掩模通过电镀形成第一镀层，去除所述第二抗蚀剂，在第二镀层上形成第二镀层所述第二镀层通过使用所述第一抗蚀剂作为掩模进行电镀而形成，所述第二镀层形成所述壁的所述凹部，并且除去所述第一抗蚀剂以形成所述第二镀层，排出口并移除所述衬底。

6. 发明申请

US20120306961A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LIQUID DISCHARGE HEAD 有权
标题翻译：负性光敏树脂组合物，图案形成方法和液体排出头
公开(公告)号：US20120306961A1
公开(公告)日：2012-12-06
申请号：US13576906
申请日：2011-01-27
申请人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
发明人： Hyo Takahashi , Ken Ikegame , Masako Shimomura
IPC分类号： B41J2/015 , G03F7/027 , G03F7/20 , G03F7/004
CPC分类号： B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , G03F7/0045 , G03F7/0046 , G03F7/038
摘要： A photosensitive resin composition includes a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid.
摘要翻译：感光性树脂组合物包括阳离子聚合性化合物，具有阴离子部分的光酸产生剂和阳离子部分，以及具有季铵结构和季鏻结构和阴离子部分中的任一种的阳离子部分的盐，其中，盐的阴离子部分与衍生自光致酸产生剂的阴离子部分的第一种酸的阴离子部分交换，形成酸强度低于第一种酸的酸强度的第二种酸。

7. 发明申请

US20120021360A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD 有权
标题翻译：制造液体喷射头的方法
公开(公告)号：US20120021360A1
公开(公告)日：2012-01-26
申请号：US13177765
申请日：2011-07-07
申请人： Ken Ikegame , Isamu Horiuchi
发明人： Ken Ikegame , Isamu Horiuchi
IPC分类号： G03F7/20
CPC分类号： B41J2/1603 , B41J2/1404 , B41J2/1626 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1645 , B41J2002/14475 , B41J2202/11
摘要： A method of manufacturing a liquid ejection head includes: exposing a negative organic resin layer to be a flow path forming member except for regions in which an ejection orifice and a fluid resistance portion are to be formed, respectively, and heating the negative organic resin layer and a flow path pattern to move a portion of the negative organic resin layer which corresponds to the fluid resistance portion toward a substrate; and exposing and developing the region of the negative organic resin layer in which the fluid resistance portion is to be formed.
摘要翻译：制造液体喷射头的方法包括：分别将作为流路形成部件的负有机树脂层暴露于除了要形成喷射孔和流体阻力部分的区域之外，并将负有机树脂层以及将与流体阻力部相对应的负有机树脂层的一部分朝向基板移动的流路图案; 曝光和显影要形成流体阻力部分的负有机树脂层的区域。

8. 发明申请

US20090185001A1 LIQUID EJECTION RECORDING HEAD 有权
标题翻译：液体喷射记录头
公开(公告)号：US20090185001A1
公开(公告)日：2009-07-23
申请号：US12354417
申请日：2009-01-15
申请人： Shigeki Fukui , Ken Ikegame , Shuichi Murakami , Yasushi Iijima , Yasunori Takei
发明人： Shigeki Fukui , Ken Ikegame , Shuichi Murakami , Yasushi Iijima , Yasunori Takei
IPC分类号： B41J2/14
CPC分类号： B41J2/1603 , B41J2/1433 , B41J2/1626 , B41J2002/14387
摘要： A liquid ejection recording head includes a recording element substrate including a plurality of energy generating elements for generating energy for ejecting liquid, and includes a flow passage-forming member, connected to the recording element substrate, comprising a plurality of ejection outlets corresponding to the plurality of energy generating elements and comprising a plurality of flow passages communicating with the ejection outlets. The flow passage-forming member includes a hole array consisting of holes arranged so as to surround the flow passages and includes a communication passage, for establishing communication between adjacent holes, at a position close to the recording element substrate.
摘要翻译：液体喷射记录头包括记录元件基板，该记录元件基板包括用于产生用于喷射液体的能量的多个能量产生元件，并且包括连接到记录元件基板的流路形成元件，包括与多个的能量产生元件，并且包括与喷射出口连通的多个流动通道。流路形成构件包括孔阵列，该孔列由围绕流路布置的孔构成，并且包括连通通道，用于在靠近记录元件基板的位置处建立相邻孔之间的连通。

9. 发明授权

US08975003B2 Photosensitive negative resin composition 有权
标题翻译：感光负性树脂组合物
公开(公告)号：US08975003B2
公开(公告)日：2015-03-10
申请号：US13989449
申请日：2011-12-02
申请人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
发明人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
IPC分类号： G03F7/004 , G03F7/038 , B41J2/16
CPC分类号： G03F7/004 , B41J2/1623 , B41J2/1628 , B41J2/1631 , G03F7/0045 , G03F7/0046 , G03F7/038
摘要： The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).
摘要翻译：本发明提供一种含有（a）含环氧基化合物的感光性负性树脂组合物，（b）含有由（b1）表示的阳离子部分结构的第一鎓盐和由（b2）表示的阴离子部分结构和 c）含有由（c1）表示的阳离子部分结构和由（c2）表示的阴离子部分结构的第二鎓盐。

10. 发明申请

US20130235119A1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION 有权
标题翻译：感光性负面树脂组合物
公开(公告)号：US20130235119A1
公开(公告)日：2013-09-12
申请号：US13989449
申请日：2011-12-02
申请人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
发明人： Hyou Takahashi , Masako Shimomura , Ken Ikegame
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , B41J2/1623 , B41J2/1628 , B41J2/1631 , G03F7/0045 , G03F7/0046 , G03F7/038
摘要： The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).
摘要翻译：本发明提供一种含有（a）含环氧基化合物的感光性负性树脂组合物，（b）含有由（b1）表示的阳离子部分结构的第一鎓盐和由（b2）表示的阴离子部分结构和 c）含有由（c1）表示的阳离子部分结构和由（c2）表示的阴离子部分结构的第二鎓盐。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式