会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Semiconductor device testing apparatus and testing method thereof
    • 半导体器件测试装置及其测试方法
    • US6037794A
    • 2000-03-14
    • US129699
    • 1998-08-05
    • Shigehisa YamamotoKatsuya Shiga
    • Shigehisa YamamotoKatsuya Shiga
    • G01R31/28G01R31/3185H01L21/66G01R31/02
    • G01R31/318505G01R31/2886G01R31/318511G01R31/2856
    • An object is to obtain a semiconductor device testing apparatus that can improve the contact characteristic between probe needles and power-supply terminals and signal terminals while ensuring efficiency of product utilization of a tested wafer. Provided on a probe wafer (4) are bumps (5) formed in the same positions in mirror symmetry as the positions of pads (3) formed in individual chips (2) on a tested wafer (1), a common interconnection (6) for interconnecting bumps (5) to be supplied with the same power supplies and signals, and terminals (7) connected to the common interconnection (6) to supply power supplies and signals to the common interconnection (6) from the outside. The bumps (5) come in contact with the pads (3) in the chips (2) when the probe wafer (4) and the tested wafer (1) are put together. The common interconnection (6) supplies the power supplies and signals for a burn-in test to the pads (3) in the chips (2).
    • 本发明的目的是获得能够提高探针和电源端子与信号端子之间的接触特性的半导体器件测试装置,同时确保测试晶片的产品利用效率。 提供在探针晶片(4)上的凸起(5)是与形成在测试晶片(1)上的各个芯片(2)中的焊盘(3)的位置成反射对称的相同位置的凸块(5),公共互连(6) 用于互连凸起(5)以提供相同的电源和信号;以及连接到公共互连(6)的端子(7),以从外部向公共互连(6)提供电源和信号。 当探针晶片(4)和测试晶片(1)放在一起时,凸块(5)与芯片(2)中的焊盘(3)接触。 公共互连(6)为芯片(2)中的焊盘(3)提供用于老化测试的电源和信号。
    • 9. 发明授权
    • Method of verifying semiconductor integrated circuit reliability and cell library database
    • 半导体集成电路可靠性和单元库数据库的验证方法
    • US06470479B1
    • 2002-10-22
    • US09548738
    • 2000-04-13
    • Shigehisa Yamamoto
    • Shigehisa Yamamoto
    • G06F1750
    • G06F17/5022
    • A method of verifying semiconductor integrated circuit reliability allows reliability verification of a large-scale semiconductor integrated circuit without any omission. Step S12 is to obtain a sum total (Cio) of inner-cell input/output load capacities in a selected cell on the basis of input and output load capacities registered in a cell library database (1A), and step S13 is to obtain wiring capacitance (Cic) between cells. In step S14, the sum total (Cio) of inner-cell input/output load capacities and the wiring capacitance (Cic) between cells are added to obtain output-terminal load capacity (COUT). On the basis of the output-terminal load capacity (COUT), a failure rate (FOUT) of an intercellular interconnect line is obtained in step S15, and a failure rate (Fcell) of inner-cell interconnect lines is obtained in step S16 from an equation registered in the cell library database (1A). Then, those failure rates (Fcell, FOUT) are added to obtain a total failure rate (Ftotal) in step S17.
    • 一种验证半导体集成电路可靠性的方法允许大规模半导体集成电路的可靠性验证而没有任何遗漏。 步骤S12是根据注册在单元库数据库(1A)中的输入和输出负载能力来获得所选单元中的内单元输入/输出负载能力的总和(Cio),步骤S13是获得布线 电容(Cic)。 在步骤S14中,添加内部单元输入输出负载能力的总和(Cio)和单元之间的布线电容(Cic)以获得输出端子负载能力(COUT)。 在输出端负载能力(COUT)的基础上,在步骤S15中获得细胞间互连线的故障率(FOUT),在步骤S16中获得内单元互连线的故障率(Fcell) 注册在细胞库数据库(1A)中的方程式。 然后,在步骤S17中,添加故障率(Fcell,FOUT)以获得总故障率(F total)。
    • 10. 发明授权
    • Burn-in method and burn-in device
    • 老化方法和老化设备
    • US06372528B1
    • 2002-04-16
    • US09813801
    • 2001-03-22
    • Shigehisa Yamamoto
    • Shigehisa Yamamoto
    • G01R3126
    • G11C29/006G01R31/2855
    • To provide a burn-in method and device capable of accelerating burn-in also in a peripheral circuit portion and a logic circuit portion as well as a memory cell array portion. A high temperature stress is applied to a wafer to be an evaluation object (Step SP11). Next, a low temperature stress and an electric stress are applied to the wafer (Step SP12). Then, it is decided whether a predetermined stress is applied to the wafer or not (Step SP13). If a result of the decision at the Step SP13 is “YES”, it is decided whether a defective portion is generated in each chip of the wafer or not (Step SP14). Referring to a chip decided to have a failure generated thereon as a result of the decision at the Step SP14, it is decided whether repair is executed for the defective portion or not (Step SP15). If a result of the decision at the Step SP15 is “YES”, the repair is executed for the defective portion (Step SP16).
    • 提供一种能够在外围电路部分和逻辑电路部分以及存储单元阵列部分中加速老化的老化方法和装置。 将作为评价对象的晶片施加高温应力(步骤SP11)。 接下来,向晶片施加低温应力和电应力(步骤SP12)。 然后,判定是否对晶片施加规定的应力(步骤SP13)。 如果步骤SP13的判断结果为“是”,则判定是否在晶片的每个芯片中产生缺陷部(步骤SP14)。 参考在步骤SP14中作出决定而决定其上产生故障的芯片,判定是否对缺陷部分执行修理(步骤SP15)。 如果步骤SP15的判定结果为“是”,则对缺陷部执行修理(步骤SP16)。