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1. 发明申请

US20100142362A1 HIGH DENSITY OPTICAL DISK AND REPRODUCTION/TRACKING CONTROL METHOD 审中-公开
标题翻译：高密度光盘和复制/跟踪控制方法
公开(公告)号：US20100142362A1
公开(公告)日：2010-06-10
申请号：US12088216
申请日：2006-09-25
申请人： Kazuma Kurihara , Yuzo Yamakawa , Takashi Nakano , Junji Tominaga
发明人： Kazuma Kurihara , Yuzo Yamakawa , Takashi Nakano , Junji Tominaga
IPC分类号： G11B7/24 , G11B20/00
CPC分类号： G11B7/24079 , G11B7/0901 , G11B7/24085
摘要： When a method for increasing density by providing a tracking guide such as a land/groove and introducing a plurality of strings of super-resolution pits into one track thereof is applied to a reproduction-dedicated optical disk, there are problems in that the production cost is increased, the structure is complicated, and the space which can be used for a recording pits is narrowed because of the land/groove structure.In the invention, a concept of group tracking is applied. One track is formed by a plurality of pit strings having a size not greater than the optical resolution limit in the radial direction and a size not less than or not greater than the optical resolution limit or only not greater than the optical resolution limit in the tangential direction. Reproduction of the super-resolution pit itself is performed by using a non-linear phenomenon generated locally, but, in tracking, a plurality of strings of pits are considered to be one track, and detection of the movement of a laser light for read out is realized by the method used for an existing optical disk by using a reflected light or a transmitted light from the optical disk.
摘要翻译：当通过提供诸如平台/凹槽的跟踪引导件和将多个超分辨率凹坑串引入其一个轨道中的密度增加的方法被应用于再现专用光盘时，存在生产成本增加，结构复杂，可以用于记录坑的空间由于槽脊/槽结构而变窄。在本发明中，应用了组跟踪的概念。一个轨迹由具有不大于径向的光学分辨率极限的尺寸的多个凹坑串形成，并且尺寸不小于或不大于光学分辨率极限，或者不大于切向中的光学分辨率极限方向。通过使用局部产生的非线性现象来实现超分辨率凹坑本身的再现，但是在跟踪中，多个凹坑串被认为是一个轨道，并且检测用于读出的激光的移动通过使用来自光盘的反射光或透射光通过用于现有光盘的方法来实现。

2. 发明申请

US20100167015A1 ETCHING RESIST 有权
标题翻译：蚀刻抵抗力
公开(公告)号：US20100167015A1
公开(公告)日：2010-07-01
申请号：US12638349
申请日：2009-12-15
申请人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
发明人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
IPC分类号： B32B3/00 , C23F1/08 , C23F1/00 , C01B21/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G02B3/0012 , Y10T428/24479
摘要： An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor.
摘要翻译：含有金属氮氧化物的抗蚀剂。本发明的抗蚀剂可以适用于例如在微型透镜片，光漫射片，非反射片，封装用片等的光学部件的表面加工用的成型体的制造中光半导体元件，光波导，光盘或光传感器。

3. 发明申请

US20100091639A1 OPTICAL RECORDING MEDIUM FOR PERFORMING SUPER RESOLUTION REPRODUCTION AND OPTICAL RECORDING AND REPRODUCTION METHOD THEREOF 审中-公开
标题翻译：用于执行超分辨率再现和光学记录的光学记录介质及其再现方法
公开(公告)号：US20100091639A1
公开(公告)日：2010-04-15
申请号：US12516492
申请日：2008-07-16
申请人： Takayuki Shima , Takashi Nakano , Kazuma Kurihara , Junji Tominaga
发明人： Takayuki Shima , Takashi Nakano , Kazuma Kurihara , Junji Tominaga
IPC分类号： G11B7/24
CPC分类号： G11B7/00718 , G11B7/252 , G11B7/259 , G11B2007/2571 , G11B2007/25713
摘要： The invention performs super resolution reproduction with a recording layer and a signal reproducing functional layer laminated on a grooved substrate. A length of a mark recorded in a Mark Position method is only one length that is less than the resolution limit in an optical system to be used, and recording marks are formed both on a land and in a groove of the grooved substrate.
摘要翻译：本发明通过层叠在带槽基板上的记录层和信号再现功能层执行超分辨率再现。在Mark Position方法中记录的标记的长度只是在要使用的光学系统中小于分辨率极限的一个长度，并且在凹槽基板的陆地和凹槽中形成记录标记。

4. 发明授权

US08734964B2 Etching resist 有权
标题翻译：蚀刻抗蚀剂
公开(公告)号：US08734964B2
公开(公告)日：2014-05-27
申请号：US12638349
申请日：2009-12-15
申请人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
发明人： Kazuma Kurihara , Takashi Nakano , Takayuki Shima , Junji Tominaga , Kazuya Fujioka , Ichiro Suehiro
IPC分类号： B32B3/00 , C23F1/08 , C23F1/00 , C01B21/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G02B3/0012 , Y10T428/24479
摘要： An etching resist has a first heat-generating layer, a second heat-generating layer, and a metal compound layer including a metallic oxynitride layer containing a metallic oxynitride. The first heat-generating layer, the metallic oxynitride layer, and the second heat-generating layer are directly or indirectly laminated such that the metallic oxynitride layer is positioned between the first heat-generating layer and the second heat-generating layer.
摘要翻译：蚀刻抗蚀剂具有第一发热层，第二发热层和包含含有金属氮氧化物的金属氮氧化物层的金属化合物层。第一发热层，金属氧氮化物层和第二发热层直接或间接层压，使得金属氧氮化物层位于第一发热层和第二发热层之间。

5. 发明申请

US20120300305A1 MOLD FOR OPTICAL DEVICE WITH ANTI-REFLECTION STRUCTURE, METHOD FOR PRODUCING THE SAME, AND OPTICAL DEVICE 审中-公开
标题翻译：具有抗反射结构的光学装置的模具，其制造方法和光学装置
公开(公告)号：US20120300305A1
公开(公告)日：2012-11-29
申请号：US13540364
申请日：2012-07-02
申请人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
发明人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
IPC分类号： G02B5/00
CPC分类号： G02B1/118 , B29C33/42 , B29C45/00 , Y10T428/24355
摘要： A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semisperical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple island like microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要翻译：一种用于通过简单操作生产用于在基底表面上具有纳米级微观不平坦面的抗反射结构的光学装置的模具的方法。通过包括在基底上形成一个或多个蚀刻转移层的方法，制备在基底表面上具有微观不平坦平面（抗反射结构裸片平面）的光学器件用成型模具。在蚀刻转印层上形成用于形成半精细微粒的薄膜; 通过使用任何热反应，光反应和气体反应或这些反应的组合，使薄膜发生聚集，分解或成核，从而形成多个半球状的岛状微粒; 并且使用多岛状微粒作为保护掩模，通过反应性气体进行蚀刻转移层和底层的顺序蚀刻，从而在基底的微观表面上形成圆锥形图案。

6. 发明申请

US20100055397A1 MOLD FOR OPTICAL DEVICE WITH ANTI-REFLECTION STRUCTURE, METHOD FOR PRODUCING THE SAME, AND OPTICAL DEVICE 有权
标题翻译：具有抗反射结构的光学装置的模具，其制造方法和光学装置
公开(公告)号：US20100055397A1
公开(公告)日：2010-03-04
申请号：US12515188
申请日：2007-10-02
申请人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
发明人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
IPC分类号： B29D11/00 , B29C33/42
CPC分类号： G02B1/118 , B29C33/42 , B29C45/00 , Y10T428/24355
摘要： A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semispherical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical island-like microparticles; and using the multiple islandlike microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要翻译：一种用于通过简单操作生产用于在基底表面上具有纳米级微观不平坦面的抗反射结构的光学装置的模具的方法。通过包括在基底上形成一个或多个蚀刻转移层的方法，制备在基底表面上具有微观不平坦平面（抗反射结构裸片平面）的光学器件用成型模具。在蚀刻转印层上形成用于形成半球形微粒的薄膜; 通过使用热反应，光反应和气体反应中的任何一种或这些反应的组合使薄膜发生聚集，分解或成核，从而形成多个半球状的岛状微粒; 并使用多岛状微粒作为保护掩模，通过反应性气体进行蚀刻转移层和底层的顺序蚀刻，从而在基底的微观表面上形成圆锥形图案。

7. 发明授权

US08226837B2 Mold for optical device with anti-reflection structure, method for producing the same, and optical device 有权
标题翻译：具有防反射结构的光学装置用模具及其制造方法以及光学装置
公开(公告)号：US08226837B2
公开(公告)日：2012-07-24
申请号：US12515188
申请日：2007-10-02
申请人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
发明人： Kazuma Kurihara , Takayuki Shima , Junji Tominaga
IPC分类号： B29D11/00
CPC分类号： G02B1/118 , B29C33/42 , B29C45/00 , Y10T428/24355
摘要： A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semispherical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple islandlike microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum.
摘要翻译：一种用于通过简单操作生产用于在基底表面上具有纳米级微观不平坦面的抗反射结构的光学装置的模具的方法。通过包括在基底上形成一个或多个蚀刻转移层的方法，制备在基底表面上具有微观不平坦平面（抗反射结构裸片平面）的光学器件用成型模具。在蚀刻转印层上形成用于形成半球形微粒的薄膜; 通过使用任何热反应，光反应和气体反应或这些反应的组合，使薄膜发生聚集，分解或成核，从而形成多个半球状的岛状微粒; 并使用多岛状微粒作为保护掩模，通过反应性气体进行蚀刻转移层和底层的顺序蚀刻，从而在基底的微观表面上形成圆锥形图案。

8. 发明授权

US08097323B2 Optical recording medium 失效
标题翻译：光记录介质
公开(公告)号：US08097323B2
公开(公告)日：2012-01-17
申请号：US12441609
申请日：2007-08-17
申请人： Takayuki Shima , Yuzo Yamakawa , James Paul Fons , Junji Tominaga
发明人： Takayuki Shima , Yuzo Yamakawa , James Paul Fons , Junji Tominaga
IPC分类号： B32B3/02
CPC分类号： G11B7/252 , G11B7/24 , G11B7/2534 , G11B7/259 , G11B2007/24306 , G11B2007/2432 , G11B2007/25706 , Y10T428/21
摘要： An object of the invention is to write-once record and reproduce, or only reproduce, a mark smaller than the resolution limit; obtain a high level of reproduction performance (CNR and the like); and realize a high level of reproduction durability. In the invention, between a signal reproducing functional layer composed of Sb or Te and a protecting layer there is introduced a thermally stable diffusion preventing layer, and thereby reactions between the signal reproducing functional layer and the protecting layer due to increased temperature can be prevented or suppressed while increasing reproduction durability.
摘要翻译：本发明的目的是一次记录和再现或仅复制小于分辨率限制的标记; 获得高水平的再现性能（CNR等）; 并实现高水平的再现耐久性。在本发明中，在由Sb或Te组成的信号再现功能层与保护层之间引入热稳定的扩散防止层，从而可以防止信号再现功能层与保护层因温度升高而发生反应，抑制同时增加再现耐久性。

9. 发明申请

US20090269542A1 OPTICAL RECORDING MEDIUM 失效
标题翻译：光学记录介质
公开(公告)号：US20090269542A1
公开(公告)日：2009-10-29
申请号：US12441609
申请日：2007-08-17
申请人： Takayuki Shima , Yuzo Yamakawa , James Paul Fons , Junji Tominaga
发明人： Takayuki Shima , Yuzo Yamakawa , James Paul Fons , Junji Tominaga
IPC分类号： B32B3/02
CPC分类号： G11B7/252 , G11B7/24 , G11B7/2534 , G11B7/259 , G11B2007/24306 , G11B2007/2432 , G11B2007/25706 , Y10T428/21
摘要： An object of the invention is to write-once record and reproduce, or only reproduce, a mark smaller than the resolution limit; obtain a high level of reproduction performance (CNR and the like); and realize a high level of reproduction durability. In the invention, between a signal reproducing functional layer composed of Sb or Te and a protecting layer there is introduced a thermally stable diffusion preventing layer, and thereby reactions between the signal reproducing functional layer and the protecting layer due to increased temperature can be prevented or suppressed while increasing reproduction durability.
摘要翻译：本发明的目的是一次记录和再现或仅复制小于分辨率限制的标记; 获得高水平的再现性能（CNR等）; 并实现高水平的再现耐久性。在本发明中，在由Sb或Te组成的信号再现功能层与保护层之间引入热稳定的扩散防止层，从而可以防止信号再现功能层与保护层因温度升高而发生反应，抑制同时增加再现耐久性。

10. 发明授权

US06498776B1 Near field light emitting element and optical head 失效
标题翻译：近场发光元件和光头
公开(公告)号：US06498776B1
公开(公告)日：2002-12-24
申请号：US09494180
申请日：2000-01-31
申请人： Takashi Nakano , Junji Tominaga , Nobufumi Atoda , Akira Sato , Takuji Hatano
发明人： Takashi Nakano , Junji Tominaga , Nobufumi Atoda , Akira Sato , Takuji Hatano
IPC分类号： G11B7135
CPC分类号： G01Q60/22 , G11B7/1387
摘要： A near field light emitting element has a first film made of e.g. Al, an intermediate film made of e.g. SiN and a second film made of e.g. Al on an emergent surface of a solid immersion lens made of a high-refractive material. A first hole is made in the first film, and a second hole is made in the second film. The second hole is smaller in area than the first hole.
摘要翻译：近场发光元件具有由例如玻璃制成的第一膜。 Al，例如由中间膜制成的中间膜。 SiN和由例如硅胶制成的第二膜。 Al在由高折射材料制成的固体浸没透镜的紧急表面上。在第一膜中形成第一孔，在第二膜中形成第二孔。第二个孔的面积小于第一个孔。

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