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    • 1. 发明申请
    • DRY FRACTIONATION METHOD FOR OIL OR FAT
    • 用于油或脂肪的干燥分馏方法
    • US20130274495A1
    • 2013-10-17
    • US13995680
    • 2011-12-19
    • Kenji MuraiKazuhisa OgawaShin Yoneda
    • Kenji MuraiKazuhisa OgawaShin Yoneda
    • C11B7/00
    • C11B7/0083A23D9/007C11B3/008C11B7/0075
    • The purpose of the present invention is to provide a method, whereby, in the dry fractionation of an oil or fat, a decrease in solid-liquid ,separation efficiency, said decrease being caused by the engulfment of a filtrate fraction into a crystal fraction after crystallization and press filtration, can be prevented and thus the crystal slurry can be efficiently separated after the crystallization. A method for the dry fractionation of an oil or fat, said method comprising, before or after crystallization, adding a definite amount of a filtration aid followed by mixing and then press-filtering the thus obtained crystal slurry. Thus, the crystal slurry can be easily separated into a crystal fraction with little engulfment of a liquid fraction and the liquid fraction.
    • 本发明的目的是提供一种方法,其中在油或脂肪的干馏分中,固液分离效率降低,所述降低是由滤液组分吞入结晶部分后引起的, 可以防止结晶和压制过滤,从而可以在结晶后有效地分离晶体浆料。 一种油或脂肪的干馏分离方法,所述方法包括在结晶之前或之后,加入一定量的助滤剂,然后混合,然后对由此得到的晶体浆料进行压滤。 因此,可以容易地将晶体浆料分离成几乎没有液体馏分和液体馏分的流失的结晶部分。
    • 2. 发明授权
    • Mask pattern generating method
    • 掩模图案生成方法
    • US07541117B2
    • 2009-06-02
    • US11735778
    • 2007-04-16
    • Kazuhisa OgawaSatomi NakamuraKohichi Nakayama
    • Kazuhisa OgawaSatomi NakamuraKohichi Nakayama
    • G03C5/00G03F9/00
    • H01L21/32139G03F1/30G03F1/70H01L21/0274
    • Disclosed herein is a mask pattern generating method for generating a mask pattern to be formed in a Levenson phase shift mask used in a light exposure process for exposing a photoresist film formed on a fabricated film to be patterned into a conductive layer to light when the conductive layer is patterned by photolithography, the conductive layer including a gate electrode formed in an active region extending in a first direction in a wafer in such a manner as to extend in a second direction orthogonal to the first direction, the mask pattern generating method including: a phase shifter arranging step; a shifter pattern image obtaining step; a trim pattern image obtaining step; and a phase shifter elongating step.
    • 本文公开了一种掩模图案生成方法,用于产生将在用于将形成在待图案化的制造膜上的形成在其上的光致抗蚀剂膜暴露于导电层中的莱文森相移掩模中形成的掩模图案,以在导电 层通过光刻法图案化,所述导电层包括形成在沿晶片的第一方向延伸的有源区域中的栅电极,其方式为在与第一方向正交的第二方向上延伸,掩模图案生成方法包括: 移相器布置步骤; 移位图案图像获取步骤; 修剪图案图像获取步骤; 和移相器伸长步骤。
    • 3. 发明授权
    • Dry fractionation method for oil or fat
    • 油或脂肪的干分馏方法
    • US08772518B2
    • 2014-07-08
    • US13995680
    • 2011-12-19
    • Kenji MuraiKazuhisa OgawaShin Yoneda
    • Kenji MuraiKazuhisa OgawaShin Yoneda
    • C07C51/43C11B13/04
    • C11B7/0083A23D9/007C11B3/008C11B7/0075
    • The purpose of the present invention is to provide a method, whereby, in the dry fractionation of an oil or fat, a decrease in solid-liquid separation efficiency, said decrease being caused by the engulfment of a filtrate fraction into a crystal fraction after crystallization and press filtration, can be prevented and thus the crystal slurry can be efficiently separated after the crystallization. A method for the dry fractionation of an oil or fat, said method comprising, before or after crystallization, adding a definite amount of a filtration aid followed by mixing and then press-filtering the thus obtained crystal slurry. Thus, the crystal slurry can be easily separated into a crystal fraction with little engulfment of a liquid fraction and the liquid fraction.
    • 本发明的目的是提供一种方法,其中在油或脂肪的干分级中,固液分离效率的降低,所述减少是由于滤液部分在结晶之后被吸收到结晶部分中而引起的 并且可以防止压滤,从而可以在结晶后有效地分离晶体浆料。 一种油或脂肪的干馏分离方法,所述方法包括在结晶之前或之后,加入一定量的助滤剂,然后混合,然后对由此得到的晶体浆料进行压滤。 因此,可以容易地将晶体浆料分离成几乎没有液体馏分和液体馏分的流失的结晶部分。
    • 4. 发明申请
    • TEST CIRCUIT, INTEGRATED CIRCUIT, AND TEST CIRCUIT LAYOUT METHOD
    • 测试电路,集成电路和测试电路布局方法
    • US20130009314A1
    • 2013-01-10
    • US13536639
    • 2012-06-28
    • Kazuhisa Ogawa
    • Kazuhisa Ogawa
    • G01R31/3187G06F17/50H01L23/498
    • H01L22/34G06F17/5068H01L2924/0002H01L2924/00
    • A test circuit includes a substrate, a wiring section having a plurality of pieces of wiring, and a device-under-test section formed on the substrate, and having a device-under-test main body and a plurality of connecting electrodes for establishing connection between the main body and the plurality of pieces of wiring, an extending direction of a straight line connecting a position of a center of rotation in a plane of pattern formation of the main body and each electrodes being inclined at a predetermined angle to an extending direction of the pieces of wiring, and the connecting electrodes being arranged at positions such that connection relation between the electrodes and the plurality of pieces of wiring is maintained even when the main body and the electrodes are rotated about the position of the center of rotation by 90 degrees relative to the wiring section in the plane of the pattern formation.
    • 测试电路包括基板,具有多条布线的布线部分和形成在基板上的被测器件部分,并且具有被测器件主体和多个用于建立连接的连接电极 在主体和多条布线之间,连接主体的图案形成平面中的旋转中心的位置的直线的延伸方向和每个电极相对于延伸方向以预定角度倾斜 并且连接电极被布置在即使当主体和电极围绕旋转中心的位置旋转90°时也保持电极和多条布线之间的连接关系的位置 相对于图案形成的平面中的布线部分的度数。
    • 5. 发明授权
    • Breather device for engine
    • 发动机呼吸器
    • US08181635B2
    • 2012-05-22
    • US12470594
    • 2009-05-22
    • Kazuhisa OgawaHiroaki Hasebe
    • Kazuhisa OgawaHiroaki Hasebe
    • F02B25/06F02B25/00F02B33/00F01M1/02F01M13/00F01M9/10F01M1/04
    • F01M13/04F01M13/022F01M2013/0461F01M2013/0488
    • In a breather device for engine, in which an inlet of a breather chamber communicates with a crank chamber through a reed valve, the reed valve being formed of: a fixed stopper plate arranged so as to be opposed to a valve seat formed on an end face of the inlet facing the breather chamber; and an elastic valve plate fixed at one end thereof to the stopper plate and capable of bending elastically to change its position from a closed position in which the elastic valve plate closes the inlet by seating on the valve seat to an opening limit position in which the elastic valve plate opens the inlet and abuts against the stopper plate, the stopper plate is provided at a center part thereof with an oil discharge hole through which oil present between the elastic valve plate and the stopper plate is pushed out when the elastic valve plate is pushed toward the opening limit position in which the elastic valve plate abuts against the stopper plate by pressure in the crank chamber. Accordingly, it is possible to prevent the elastic valve plate from sticking to the stopper plate even if oil mist adheres to the elastic valve plate or the stopper plate of the reed valve.
    • 在用于发动机的通气装置中,其中通气室的入口通过簧片阀与曲轴室连通,所述簧片阀由以下部件形成:固定止动板,其布置成与形成在端部上的阀座相对 面向通气室的入口面; 以及弹性阀板,其一端固定在止动板上,并且能够弹性地弯曲以使其位置从关闭位置改变,在关闭位置,弹性阀板通过将阀座安置在开启极限位置而关闭入口,其中, 弹性阀板打开入口并抵靠止动板,止动板在其中心部分设置有排油孔,当弹性阀板是弹性阀板时,弹性阀板和止动板之间存在的油被推出 推动到弹性阀板通过曲柄室中的压力与止动板抵接的开启极限位置。 因此,即使油雾粘附到簧片阀的弹性阀板或止动板上,也可以防止弹性阀板粘到止动板上。
    • 7. 发明申请
    • MASK PATTERN GENERATING METHOD
    • 掩模图形生成方法
    • US20070283313A1
    • 2007-12-06
    • US11735778
    • 2007-04-16
    • Kazuhisa OgawaSatomi NakamuraKohichi Nakayama
    • Kazuhisa OgawaSatomi NakamuraKohichi Nakayama
    • G06F17/50
    • H01L21/32139G03F1/30G03F1/70H01L21/0274
    • Disclosed herein is a mask pattern generating method for generating a mask pattern to be formed in a Levenson phase shift mask used in a light exposure process for exposing a photoresist film formed on a fabricated film to be patterned into a conductive layer to light when the conductive layer is patterned by photolithography, the conductive layer including a gate electrode formed in an active region extending in a first direction in a wafer in such a manner as to extend in a second direction orthogonal to the first direction, the mask pattern generating method including: a phase shifter arranging step; a shifter pattern image obtaining step; a trim pattern image obtaining step; and a phase shifter elongating step.
    • 本文公开了一种掩模图案生成方法,用于产生将在用于将形成在待图案化的制造膜上的形成在其上的光致抗蚀剂膜暴露于导电层中的莱文森相移掩模中形成的掩模图案,以在导电 层通过光刻法图案化,所述导电层包括形成在沿晶片的第一方向延伸的有源区域中的栅电极,其方式为在与第一方向正交的第二方向上延伸,掩模图案生成方法包括: 移相器布置步骤; 移位图案图像获取步骤; 修剪图案图像获取步骤; 和移相器伸长步骤。
    • 8. 发明申请
    • Exposure pattern forming method and exposure pattern
    • 曝光图案形成方法和曝光图案
    • US20050204330A1
    • 2005-09-15
    • US11068922
    • 2005-03-02
    • Kazuhisa OgawaHidetoshi Ohnuma
    • Kazuhisa OgawaHidetoshi Ohnuma
    • G03F1/00G03F1/36G03F1/68G03F1/70G03F7/20G06F17/50H01L21/027
    • G03F1/36G03F7/70441
    • Disclosed is an exposure pattern forming method of forming an exposure pattern by correcting each pattern portion constituting a design pattern by a correction amount, which amount is previously prepared so as to correspond to both a line width of the pattern portion and a space width of a space portion adjacent to the pattern portion, characterized by including the steps of: subjecting the design pattern to graphic form arithmetic operation, to extract each pattern portion for each target line width, and to extract space portion for each target space width; and subjecting each pattern portion extracted for each target line width and the space portion extracted for each target space width to graphic form arithmetic operation based on the corresponding one of the correction amounts, to thereby correct the pattern portion having each target line width for each target space width.
    • 公开了一种通过将构成设计图案的每个图案部分校正修正量来形成曝光图案的曝光图案形成方法,所述校正量预先准备好以对应于图案部分的线宽和空间宽度 空间部分,其特征在于包括以下步骤:对设计图案进行图形算术运算,提取每个目标线宽度的每个图案部分,并为每个目标空间宽度提取空间部分; 对每个目标线宽度提取的每个图案部分和针对每个目标空间宽度提取的空间部分基于相应的一个校正量进行图形形成算术运算,从而校正每个目标的每个目标线宽度的图案部分 空间宽度。
    • 9. 发明申请
    • Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method
    • 曝光掩模图案形成方法,曝光掩模图案和半导体器件制造方法
    • US20050147893A1
    • 2005-07-07
    • US10503363
    • 2003-02-07
    • Kazuhisa OgawaKazuyoshi Kawahara
    • Kazuhisa OgawaKazuyoshi Kawahara
    • G03F1/24G03F1/36G03F1/68G03C5/00G03F9/00
    • G03F1/20G03F1/36
    • A method of forming an exposure mask pattern providing edge division points P at edges of a design pattern 1 by predetermined intervals and correcting edge positions for each divided edge portion, wherein, for the design pattern 1, rectangular patterns 10 and 11 are formed having as long sides a pair of facing sides forming the design pattern 1. At that time, the rectangular patterns 10 and 11 are formed at portions having intervals W1 and W2 of the long sides in the design pattern 1 within a predetermined interval W0. Next, at each of the rectangular patterns 10 and 11, new edge division points P (P1) are given at the long sides at predetermined intervals t from the start points P0 using as the start points P0 two vertexes sharing a short side. Due to this, the exposure mask pattern used for lithography can be simplified and the precision of formation of a transfer pattern can be improved.
    • 一种形成曝光掩模图案的方法,其在设计图案1的边缘处以预定间隔提供边缘分割点P,并且为每个分割边缘部分修正边缘位置,其中,对于设计图案1,矩形图案10和11形成为具有 长边形成设计图案1的一对相对侧。此时,矩形图案10和11在设计图案1中的长边的间隔W 1和W 2的预定间隔W 0内形成。 接下来,在矩形图案10和11中的每一个处,从起始点P 0 。 由此,可以简化用于光刻的曝光掩模图案,并且可以提高形成转印图案的精度。
    • 10. 发明授权
    • Test circuit, integrated circuit, and test circuit layout method
    • 测试电路,集成电路和测试电路布局方法
    • US08954916B2
    • 2015-02-10
    • US13536639
    • 2012-06-28
    • Kazuhisa Ogawa
    • Kazuhisa Ogawa
    • G06F17/50H01L21/66
    • H01L22/34G06F17/5068H01L2924/0002H01L2924/00
    • A test circuit includes a substrate, a wiring section having a plurality of pieces of wiring, and a device-under-test section formed on the substrate, and having a device-under-test main body and a plurality of connecting electrodes for establishing connection between the main body and the plurality of pieces of wiring, an extending direction of a straight line connecting a position of a center of rotation in a plane of pattern formation of the main body and each electrodes being inclined at a predetermined angle to an extending direction of the pieces of wiring, and the connecting electrodes being arranged at positions such that connection relation between the electrodes and the plurality of pieces of wiring is maintained even when the main body and the electrodes are rotated about the position of the center of rotation by 90 degrees relative to the wiring section in the plane of the pattern formation.
    • 测试电路包括基板,具有多条布线的布线部分和形成在基板上的被测器件部分,并且具有被测器件主体和多个用于建立连接的连接电极 在主体和多条布线之间,连接主体的图案形成平面中的旋转中心的位置的直线的延伸方向和每个电极相对于延伸方向以预定角度倾斜 并且连接电极被布置在即使当主体和电极围绕旋转中心的位置旋转90°时也保持电极和多条布线之间的连接关系的位置 相对于图案形成的平面中的布线部分的度数。