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    • 3. 发明申请
    • Anti-reflection film producing method and apparatus
    • 防反射膜的制造方法和装置
    • US20070253062A1
    • 2007-11-01
    • US11790165
    • 2007-04-24
    • Kazuhiro ShimodaHirokazu NishimuraMakoto Satoh
    • Kazuhiro ShimodaHirokazu NishimuraMakoto Satoh
    • G02B1/10
    • G02B1/111
    • Anti-reflection film includes a transparent support, at least one optical functional layer overlaid on the support, and a low refractive index layer, overlaid on the optical functional layer, and having a lower refractive index than the optical functional layer. An anti-reflection film producing apparatus to produce this includes a coater for coating a surface of the optical functional layer with liquid for forming the low refractive index layer, to form a coating layer. A dryer promotes drying of the coating layer. A heater hardens the coating layer from the dryer at a first temperature level, and then hardens the coating layer at a second temperature level higher than the first temperature level, to form the low refractive index layer. Preferably, a difference between the first and second temperature levels is 1-50 deg. C. Also, ultraviolet rays are applied to the low refractive index layer after the hardening of the heater.
    • 防反射膜包括透明支撑体,覆盖在支撑体上的至少一个光学功能层和覆盖在光学功能层上并具有比光学功能层低的折射率的低折射率层。 制造该防反射膜的制造装置包括用于用形成低折射率层的液体涂覆光学功能层的表面的涂布机,以形成涂层。 干燥器促进涂层的干燥。 加热器在第一温度水平下从干燥器硬化涂层,然后在高于第一温度水平的第二温度水平下硬化涂层,以形成低折射率层。 优选地,第一和第二温度水平之间的差为1-50度。 此外,在加热器硬化之后,将紫外线施加到低折射率层。
    • 4. 发明授权
    • Anti-reflection film producing method and apparatus
    • 防反射膜的制造方法和装置
    • US07722921B2
    • 2010-05-25
    • US11790165
    • 2007-04-24
    • Kazuhiro ShimodaHirokazu NishimuraMakoto Satoh
    • Kazuhiro ShimodaHirokazu NishimuraMakoto Satoh
    • B05D3/02
    • G02B1/111
    • Anti-reflection film includes a transparent support, at least one optical functional layer overlaid on the support, and a low refractive index layer, overlaid on the optical functional layer, and having a lower refractive index than the optical functional layer. An anti-reflection film producing apparatus to produce this includes a coater for coating a surface of the optical functional layer with liquid for forming the low refractive index layer, to form a coating layer. A dryer promotes drying of the coating layer. A heater hardens the coating layer from the dryer at a first temperature level, and then hardens the coating layer at a second temperature level higher than the first temperature level, to form the low refractive index layer. Preferably, a difference between the first and second temperature levels is 1-50 deg. C. Also, ultraviolet rays are applied to the low refractive index layer after the hardening of the heater.
    • 防反射膜包括透明支撑体,覆盖在支撑体上的至少一个光学功能层和覆盖在光学功能层上并具有比光学功能层低的折射率的低折射率层。 制造该防反射膜的制造装置包括用于用形成低折射率层的液体涂覆光学功能层的表面的涂布机,以形成涂层。 干燥器促进涂层的干燥。 加热器在第一温度水平下从干燥器硬化涂层,然后在高于第一温度水平的第二温度水平下硬化涂层,以形成低折射率层。 优选地,第一和第二温度水平之间的差为1-50度。 此外,在加热器硬化之后,将紫外线施加到低折射率层。
    • 8. 发明申请
    • METHOD FOR PRODUCING SEAMLESS TUBE/PIPE
    • 生产无缝管/管的方法
    • US20130255342A1
    • 2013-10-03
    • US13991635
    • 2011-12-06
    • Kenichi SaitouKazuhiro ShimodaTomio Yamakawa
    • Kenichi SaitouKazuhiro ShimodaTomio Yamakawa
    • B21B21/02
    • B21B21/02B21B19/04B21B25/00B21B2261/08B21B2261/10
    • By using a piercing mill that includes a pusher on the entrance side, a plug on the exit side along a pass line, and a plurality of angled rolls as being provided around the plug so as face to each other, in the case where the maximum diameter of an unsound region consisting of center segregation and porosity in a cross section of a billet is d [mm], piercing-rolling is performed under the condition that the plug nose rolling reduction ratio (TDF) expressed by Formula (1) satisfies Formula (2). TDF=(Bd−D1)/Bd  (1) TDF≦−0.50×(d/Bd)+0.06  (6) In Formulae (1) and (2), Bd is the billet diameter [mm], and D1 is the opening [mm] between the angled rolls at the plug nose position. Thereby, when piercing-rolling is performed, the occurrence of an inner surface flaw attributable to the center segregation and porosity in the billet can be prevented reliably.
    • 通过使用包括在入口侧的推动器的穿孔机,沿着通行线的出口侧的塞子和在插头周围设置成彼此面对的多个成角度的辊,在最大值 在坯料的横截面中由中心偏析和孔隙率组成的不固定区域的直径为d [mm],在由式(1)表示的塞子前端滚动压下率(TDF)满足公式的条件下进行穿孔轧制 (2)。 TDF =(Bd-D1)/ Bd(1)TDF@-0.50×(d / Bd)+0.06(6)在公式(1)和(2)中,Bd是坯料直径[mm],D1是 在插头前端位置的成角度的卷轴之间打开[mm]。 因此,当进行穿孔轧制时,可以可靠地防止由于中心偏析引起的内表面缺陷的发生和坯料中的孔隙率的发生。
    • 9. 发明授权
    • Pusher device for piercing and rolling and method of manufacturing seamless pipe or tube using the same
    • 用于穿孔和推轧的推进装置及使用其制造无缝管或管的方法
    • US08020421B2
    • 2011-09-20
    • US12685869
    • 2010-01-12
    • Tomio YamakawaKazuhiro Shimoda
    • Tomio YamakawaKazuhiro Shimoda
    • B21B19/04
    • B21B19/04B21B23/00B21B39/06B21B2261/08B21B2261/10
    • A pusher device 4 includes a cylinder device 30 and a pusher mandrel 34. The cylinder device 30 includes a cylinder shaft 32. The pusher mandrel 34 is attached to the tip end of the cylinder shaft 32. The tip end of the pusher mandrel 34 is abutted against the rear end of a billet 20. The cross sectional area Sp of the pusher mandrel 34 and the cross sectional area Sb of the billet 20 satisfy Expression (1). The length Lp of the pusher mandrel 34 and the cross sectional area Sp of the pusher mandrel 34 satisfy Expression (2). The moving distance Lc of the tip end of the cylinder shaft 32 during piercing and rolling and the outer diameter Dc of the cylinder shaft 32 satisfy Expression (3). Therefore, the pusher device 4 can restrain the wall thickness deviation of the tip end part of a produced hollow shell. 0.3≦Sp/Sb  (1) Lp/Sp≦1.2  (2) Lc/Dc≦45  (3)
    • 推动装置4包括气缸装置30和推动心轴34.气缸装置30包括气缸轴32.推动心轴34附接到气缸轴32的末端。推动心轴34的尖端是 抵靠坯料20的后端。挤压心轴34的截面面积Sp和坯料20的横截面积Sb满足式(1)。 推动心轴34的长度Lp和推动心轴34的横截面面积Sp满足式(2)。 穿孔轧制时的圆筒轴32的前端的移动距离Lc和圆筒轴32的外径Dc满足式(3)。 因此,推动装置4能够抑制制造的中空壳的前端部的壁厚偏差。 0.3≦̸ Sp / Sb(1)Lp / Sp≦̸ 1.2(2)Lc / Dc≦̸ 45(3)