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    • 5. 发明授权
    • Recording medium storing program for determining exposure parameter, exposure method, and method of manufacturing device
    • 用于确定曝光参数的记录介质存储程序,曝光方法和制造装置的方法
    • US08334968B2
    • 2012-12-18
    • US12480660
    • 2009-06-08
    • Kouichirou TsujitaKoji Mikami
    • Kouichirou TsujitaKoji Mikami
    • G03B27/52
    • G03F7/70991G03F7/70083G03F7/70458G03F7/705G03F7/70525
    • An exposure method comprises setting an exposure condition using a value of an exposure parameter when plural types of patterns are transferred onto a substrate. The method of determining a value of an exposure parameter comprises calculating an optical image, formed on an image plane upon illuminating a pattern on an object plane, for each of combinations of plural values of an exposure parameter and plural values of at least one of an exposure amount and a defocus amount, calculating, for each of the plural values of the exposure parameter, a deviation between a contour of a target optical image and a calculated contour of the optical image, in each of the plural types of patterns, and determining a value of the exposure parameter, at which a maximum value of the deviations among the plural types of patterns is minimum, as a value of the exposure parameter when exposing the substrate.
    • 曝光方法包括当将多种图案转印到基底上时,使用曝光参数的值来设置曝光条件。 确定曝光参数的值的方法包括:对于曝光参数的多个值的组合中的每一个,计算在对物体平面上照射图案时在图像平面上形成的光学图像,以及至少一个 曝光量和散焦量,对于所述曝光参数的所述多个值,针对所述多种图案中的每一种,计算目标光学图像的轮廓与所计算的所述光学图像的轮廓之间的偏差,并且确定 作为曝光基板时的曝光参数的值,多个图案中的偏差的最大值最小的曝光参数的值。
    • 6. 发明授权
    • Method of transferring pattern of reticle, computer readable storage medium, and method of manufacturing device
    • 传送标线图形,计算机可读存储介质的方法和制造装置的方法
    • US08049191B2
    • 2011-11-01
    • US12607015
    • 2009-10-27
    • Kouichirou TsujitaKoji MikamiHiroyuki Ishii
    • Kouichirou TsujitaKoji MikamiHiroyuki Ishii
    • G21K5/10
    • G03F7/70141G03F7/705G03F7/70625
    • A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto the substrate using the reticle, and a third illumination condition under which the first pattern is transferred onto a substrate using the reticle, using mathematical models each of which defines the relationship between an illumination condition and a virtual pattern transferred onto a substrate using the illumination condition, determining a fourth illumination condition, obtained by adding the difference between the calculated second illumination condition and third illumination condition to the first illumination condition, as the illumination condition, and transferring the pattern of the reticle onto the substrate by illuminating the reticle using the determined illumination condition.
    • 一种方法包括使用标线设置在基板上形成的目标图案,使用所述掩模版获得第一图案和第一照明条件,计算使用所述掩模版将所述目标图案转印到所述基板上的第二照明条件, 以及第三照明条件,在该第三照明条件下,使用数学模型将第一图案转印到基板上,每个数学模型使用照明条件限定照明条件和转印到基板上的虚拟图案之间的关系,确定第四照明条件 通过将计算出的第二照明条件和第三照明条件之间的差与第一照明条件相加而获得,作为照明条件,并且通过使用确定的照明条件照射标线,将掩模版的图案转印到基板上。
    • 9. 发明授权
    • Exposure method and memory medium storing computer program
    • 曝光方法和存储计算机程序的存储介质
    • US08029954B2
    • 2011-10-04
    • US12499730
    • 2009-07-08
    • Koji MikamiKouichirou TsujitaHiroyuki Ishii
    • Koji MikamiKouichirou TsujitaHiroyuki Ishii
    • G03F9/00G03C5/00
    • G03F7/70258G03F7/70091G03F7/705
    • A method comprises determining an exposure condition by executing a process including computing an image formed on an image plane under the current exposure condition while changing the exposure condition, and evaluating a line width of the computed image, and exposing the substrate under the determined exposure condition, wherein the determining includes, computing a simplified evaluation value of the computed image, changing the exposure condition and executing the process in the changed exposure condition, after evaluating the computed image if the simplified evaluation value satisfies an allowable value, and changing the exposure condition and executing the process in the changed exposure condition without evaluating the computed image if the simplified evaluation value does not satisfy the allowable value.
    • 一种方法包括:通过执行包括在改变曝光条件的同时计算在当前曝光条件下形成在图像平面上的图像并评估计算图像的线宽度并在确定的曝光条件下曝光基板的处理来确定曝光条件 其中,所述确定包括:如果所述简化评估值满足允许值,则在评估所述计算图像之后,计算所计算图像的简化评估值,改变所述曝光条件并执行所述改变的曝光条件中的处理,并且改变所述曝光条件 以及如果所述简化评估值不满足所述允许值,则在不评估所述计算图像的情况下执行所述改变的曝光条件下的处理。