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    • 1. 发明申请
    • Optical element assembly formed of multiple optical elements such as prisms, and image pickup apparatus using the same in image pickup function section
    • 由诸如棱镜的多个光学元件形成的光学元件组件,以及在图像拾取功能部分中使用该光学元件组件的图像拾取装置
    • US20050111106A1
    • 2005-05-26
    • US10978303
    • 2004-10-29
    • Kazuhiro MatsumotoYasuo NakajoHiroyuki AndoTetsuo NagataYuji Imai
    • Kazuhiro MatsumotoYasuo NakajoHiroyuki AndoTetsuo NagataYuji Imai
    • G02B7/18G02B17/08G02B23/14H05K1/00G02B27/10H01R12/00
    • G02B17/086G02B7/1805G02B17/0832G02B23/14
    • An optical element assembly includes a first optical element, a second optical element, and a positioning holder member. The first optical element has engageably shaped portions in a peripheral portion of an effective area on a first injection surface through which the effective luminous flux passes. These engageably shaped portions respectively correspond to one engageably shaped portions formed on one opponent surface of the positioning holder member that opposes the first injection surface. The second optical element has engageably shaped portions in a peripheral portion of an effective area on a second incident surface through which the effective luminous flux passes. These engageably shaped portions respectively correspond to the other engageably shaped portions formed on the other opponent surface of the positioning holder member that opposes the second incident surface. The positioning holder member has in a predetermined portion, an optical diaphragm aperture that permits transmission of light between the one opponent surface and the other opponent surface. An image pickup apparatus includes the optical element assembly, an image pickup device, and an image data producing portion.
    • 光学元件组件包括第一光学元件,第二光学元件和定位保持器元件。 第一光学元件在有效光束通过的第一注入表面的有效区域的周边部分中具有可啮合的成形部分。 这些可啮合形状的部分分别对应于形成在与第一注射表面相对的定位保持器构件的一个对手表面上的一个可接合形状的部分。 第二光学元件在有效光通量通过的第二入射面上的有效区域的周边部分具有可啮合的成形部分。 这些可啮合形状的部分分别对应于形成在与第二入射表面相对的定位保持器构件的另一对置表面上的其它可接合形状的部分。 定位保持器构件具有预定部分,允许光在一个对象表面和另一个对手表面之间传播的光学光阑孔。 图像拾取装置包括光学元件组件,图像拾取装置和图像数据产生部分。
    • 4. 发明申请
    • VIRTUAL SYSTEM CONTROL METHOD AND APPARATUS
    • 虚拟系统控制方法和设备
    • US20100100880A1
    • 2010-04-22
    • US12577274
    • 2009-10-12
    • Soichi ShigetaYuji Imai
    • Soichi ShigetaYuji Imai
    • G06F9/455
    • G06F11/3696H04L12/6418
    • A virtual system control apparatus includes a configuration information storage device that stores configuration information for operational systems of virtual systems; a first virtual machine image storage device that stores virtual machine images for the operational systems of the virtual systems; a configuration change information storage device that stores configuration change information that represents configuration information concerning difference between the operational system and a test system of the virtual system; a second virtual machine image storage device that stores virtual machine images for the virtual machine relating to the difference; and a controller. Thus, by adopting data configuration of the operational system and the test system, it becomes possible to easily and smoothly switch the virtual system between the operational system and the test system.
    • 虚拟系统控制装置包括存储虚拟系统的操作系统的配置信息的配置信息存储装置; 第一虚拟机映像存储设备,其存储用于虚拟系统的操作系统的虚拟机映像; 配置变更信息存储装置,其存储表示与所述操作系统和所述虚拟系统的测试系统之间的差异的配置信息的配置变更信息; 第二虚拟机图像存储装置,其存储与所述差异有关的所述虚拟机的虚拟机图像; 和控制器。 因此,通过采用操作系统和测试系统的数据配置,可以在操作系统和测试系统之间容易且平滑地切换虚拟系统。
    • 5. 发明申请
    • Medium storing web service control program, web service control apparatus, and web service control method
    • 中等存储Web服务控制程序,Web服务控制设备和Web服务控制方法
    • US20080147784A1
    • 2008-06-19
    • US11902632
    • 2007-09-24
    • Yuji Imai
    • Yuji Imai
    • G06F15/16
    • G06F16/957
    • There is provided a medium storing a Web service control program, a Web service control apparatus, and a Web service control method, capable of controlling, based on a request reservation procedure, the amount of Web service requests to be received.A Web service control apparatus comprises: a CM 21 that sets the upper limit of a Web service processing amount for a plurality of servers 23 capable of executing a Web service, and accepts or rejects the Web service reservation based on the upper limit of a Web service request processing amount of the servers 23, state of the servers 23, and Web service reservation request; a grid management server 25 that sets any of the plurality of servers 23 as a node for executing the Web service based on the Web service reservation accepted by the CM 21; and a CK 22 that receives a Web service request and transfers the Web service request to the node, the Web service request complying with the Web service reservation accepted by the CM 21.
    • 提供了一种存储Web服务控制程序,Web服务控制装置和Web服务控制方法的介质,其能够基于请求预约过程来控制要接收的Web服务请求的数量。 Web服务控制装置包括:CM 21,其设定能够执行Web服务的多个服务器23的Web服务处理量的上限,并且基于Web的上限接受或拒绝Web服务预约 服务器23的服务请求处理量,服务器23的状态和Web服务预约请求; 网格管理服务器25,其基于由CM21接受的Web服务预约,将多个服务器23中的任一个设置为用于执行Web服务的节点; 以及CK 22,其接收Web服务请求并将所述Web服务请求传送到所述节点,所述Web服务请求符合CM 21所接受的Web服务预留。
    • 7. 发明授权
    • Electronic image pickup apparatus
    • 电子摄像装置
    • US06897899B1
    • 2005-05-24
    • US09568381
    • 2000-05-10
    • Masataka IdeJunichi ItoYuji Imai
    • Masataka IdeJunichi ItoYuji Imai
    • G02B7/28G02B7/34G03B3/10G03B13/36H04N5/232
    • H04N5/23212G02B7/28
    • An electronic image pickup apparatus comprises a photographic optical system; solid state image pickup devices disposed on a plant where a subject image formed by subject beams which have passed through the photographic optical system is formed; a main mirror disposed between the photographic optical system and the solid state image pickup devices, wherein a part of the main mirror is formed of a half mirror to divide the subject beams which have passed through the photographic optical system into an observing beam and a focus detecting beam; a sub-mirror for reflecting the subject beam which has passed through the part of the main mirror; a focus detecting optical system for forming an image of the subject beam reflected by the sub-mirror on a partial area of the solid image pickup devices; and an electrical circuit for outputting focus detecting information based on image signals of the partial areas of the solid image pickup devices. The structure provides an electronic image pickup apparatus which contributes to the down-sizing of the apparatus and to the reduction of production cost by eliminating an image pickup device which is dedicated for focus detection.
    • 一种电子摄像装置,包括摄影光学系统; 设置在通过摄影光学系统通过被摄体光束形成的被摄体图像的植物上的固态摄像装置; 设置在摄影光学系统和固态摄像装置之间的主镜,其中主镜的一部分由半透明镜形成,以将已经通过摄影光学系统的被摄体光束分成观察光束和焦点 检测光束; 用于反射已经通过主镜的一部分的被摄体光束的副镜; 焦点检测光学系统,用于在固体图像拾取装置的部分区域上形成由副反射镜反射的对象光束的图像; 以及基于固体摄像装置的部分区域的图像信号输出焦点检测信息的电路。 该结构提供了一种电子图像拾取装置,其通过消除专用于焦点检测的图像拾取装置而有助于减小装置的尺寸和降低生产成本。
    • 8. 发明授权
    • Method for evaluating lithography system and method for adjusting substrate-processing apparatus
    • 评估光刻系统的方法和调整基板处理装置的方法
    • US06737207B2
    • 2004-05-18
    • US09839202
    • 2001-04-23
    • Yuji Imai
    • Yuji Imai
    • G03F900
    • G03F7/70683G03F7/708
    • When the ordinary exposure is performed, a wafer, to which a photoresist is applied by a resist coater, is transported onto a wafer stage of a projection exposure apparatus to perform the exposure, followed by development by a developing apparatus. When the characteristic is evaluated, respective shot areas on the wafer applied with the photoresist are exposed with an image of a predetermined evaluating mark in a narrow area in an effective field of a projection optical system of the projection exposure apparatus. The characteristic of the resist coater or the developing apparatus is evaluated by detecting a state of a resist pattern after the development. When the image formation characteristic of the projection exposure apparatus is evaluated, the wafer is exposed with images of a plurality of predetermined evaluating marks in a wide area in the effective field. The respective characteristics of the resist coater, the exposure apparatus, and the developing apparatus for constructing a lithography system can be evaluated respectively independently.
    • 当进行普通曝光时,通过抗蚀剂涂布机将光致抗蚀剂施加到其上的晶片被输送到投影曝光装置的晶片台上以进行曝光,然后通过显影装置进行显影。 当评估特性时,在投影曝光装置的投影光学系统的有效场中,在具有光致抗蚀剂的晶片上的各个照射区域以预定评估标记的图像在狭窄区域中曝光。 通过在显影后检测抗蚀剂图案的状态来评价抗蚀剂涂布机或显影装置的特性。 当投影曝光装置的图像形成特性被评估时,在有效区域中,在广泛区域中以多个预定评估标记的图像曝光晶片。 可以分别独立地评价抗蚀剂涂布机,曝光装置和用于构建光刻系统的显影装置的各自特性。
    • 9. 发明授权
    • Computer having a remote procedure call mechanism or an object request broker mechanism, and data transfer method for the same
    • 计算机具有远程过程调用机制或对象请求代理机制,以及数据传输方法相同
    • US06697878B1
    • 2004-02-24
    • US09225249
    • 1999-01-04
    • Yuji Imai
    • Yuji Imai
    • G06F946
    • G06F9/547
    • A computer having a remote procedure call (RPC) mechanism or an object request broker (ORB) mechanism in a distributed computing environment, is constructed comprising a physical memory, a data readout unit for reading out data stored in the physical memory, and a remote direct memory access (RDMA) unit for transferring the data read out by the data readout unit, directly to a physical memory included in a communicating opposite computer which is connected to the particular computer itself through a network, thereby to shorten a delay which is expended on the data transfer between the computers.
    • 在分布式计算环境中具有远程过程调用(RPC)机制或对象请求代理(ORB)机制的计算机被构造为包括物理存储器,用于读出存储在物理存储器中的数据的数据读出单元和远程 直接存储器访问(RDMA)单元,用于将由数据读出单元读出的数据直接传送到包含在与通过网络连接到特定计算机本身的通信相对的计算机中的物理存储器,从而缩短花费的延迟 在计算机之间的数据传输。
    • 10. 再颁专利
    • Projection exposure method and apparatus capable of performing focus detection with high accuracy
    • 能够高精度地执行焦点检测的投影曝光方法和装置
    • USRE37359E1
    • 2001-09-11
    • US09326220
    • 1999-06-03
    • Shinji WakamotoYuji Imai
    • Shinji WakamotoYuji Imai
    • G01N2186
    • G03F9/7026G03F9/7015
    • A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicular to the optical axis, a position detection system for outputting a detection signal corresponding to a deviation of the projection optical system in the optical-axis direction between an imaging plane of the projection optical system and the surface of the photosensitive substrate by projecting a beam of light assuming a predetermined shape on the photosensitive substrate and, at the same time, photoelectrically detecting the reflected light from the photosensitive substrate, a fiducial member provided on the stage and having a fiducial pattern assuming a predetermined shape, and a device for detecting an irradiation position of the light beam within a plane perpendicular to the optical axis of the projection optical system on the basis of variations in intensity of a detection signal outputted from the position detection system when the fiducial pattern and the light beam are relatively moved in the predetermined direction perpendicular to the optical axis of the projection optical system.
    • 投影曝光装置包括:投影光学系统,用于将感光基板上的掩模图案投影;用于保持感光基板的平台,该投影光学系统可在投影光学系统的光轴方向上沿垂直于光学方向的方向移动 轴位置检测系统,用于通过投射光束来输出与投影光学系统在投影光学系统的成像平面和感光基板的表面之间的光轴方向上的偏差相对应的检测信号, 并且同时对来自感光基片的反射光进行光电检测,设置在舞台上的具有假定为预定形状的基准图案的基准部件,以及用于检测感光基片的照射位置的装置 光束垂直于专业光轴的平面内 基于当基准图案和光束在垂直于投影光学系统的光轴的预定方向上相对移动时从位置检测系统输出的检测信号的强度变化的基础光学系统。