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1. 发明授权

US07069947B2 Fluid control valve 有权
标题翻译：流体控制阀
公开(公告)号：US07069947B2
公开(公告)日：2006-07-04
申请号：US10785049
申请日：2004-02-25
申请人： Kazuhiko Maeda , Shigeki Niimi , Kazuhiro Matsukawa , Hiroshi Isogai
发明人： Kazuhiko Maeda , Shigeki Niimi , Kazuhiro Matsukawa , Hiroshi Isogai
IPC分类号： E03B3/18
CPC分类号： F16K27/041 , F16K27/048 , Y10T137/794 , Y10T137/7976 , Y10T137/8049 , Y10T137/8085
摘要： A fluid control valve includes a valve body, an annular groove portion formed in an outer periphery of the valve body, a filter provided in the groove portion. The filter includes a plate with a plural of perforations and formed into a cylindrical shape. The filter further includes a snap ring formed from a thin bar bent into a loop. Both ends of the snap ring extending in an axial direction and freely contacting with opposed side surfaces defining the groove portion.
摘要翻译：流体控制阀包括阀体，形成在阀体的外周中的环形槽部，设置在槽部中的过滤器。过滤器包括具有多个穿孔并形成为圆柱形状的板。过滤器还包括由弯曲成环的薄条形成的卡环。卡环的两端在轴向方向上延伸并且自由地与限定凹槽部分的相对侧表面接触。

2. 发明授权

US09851639B2 Photoacid generating polymers containing a urethane linkage for lithography 有权
公开(公告)号：US09851639B2
公开(公告)日：2017-12-26
申请号：US13436881
申请日：2012-03-31
申请人： Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
发明人： Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
IPC分类号： G03F7/004 , C08F228/02 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： G03F7/0397 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/11 , G03F7/2041
摘要： A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L′-C(CF3)2(OH). L′ is a divalent linking group comprising at least one carbon and the starred bond of L′ is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.

3. 发明授权

US09141856B2 Clothing image analysis apparatus, method, and integrated circuit for image event evaluation 有权
标题翻译：服装图像分析装置，图像事件评估方法和集成电路
公开(公告)号：US09141856B2
公开(公告)日：2015-09-22
申请号：US13814813
申请日：2012-07-05
申请人： Kazuhiko Maeda
发明人： Kazuhiko Maeda
IPC分类号： G06K9/00 , G06F17/30
CPC分类号： G06K9/00577 , G06F17/30247 , G06K9/00288 , G06K9/00362
摘要： In an image evaluation apparatus, a clothing recognition unit performs, for each person appearing in each of images included in an image group generated by an image group generation unit, recognition of clothing that the person is wearing. An image event evaluation unit, according to types of clothing recognized by the clothing recognition unit and a frequency of appearance of each type of clothing in the images in the image group, collectively evaluates the images included in the image group.
摘要翻译：在图像评价装置中，服装识别单元对于由图像组生成单元生成的图像组中包含的每个图像中的每个人执行对该人穿着的服装的识别。图像事件评估单元根据由服装识别单元识别的服装的类型和图像组中的图像中的各种服装的出现次数，共同评估包括在图像组中的图像。

4. 发明授权

US08691491B2 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions 有权
标题翻译：含氟化合物及其聚合物可用于抗反射膜材料和抗蚀剂组合物
公开(公告)号：US08691491B2
公开(公告)日：2014-04-08
申请号：US13094281
申请日：2011-04-26
申请人： Shinichi Sumida , Haruhiko Komoriya , Kazuhiko Maeda
发明人： Shinichi Sumida , Haruhiko Komoriya , Kazuhiko Maeda
IPC分类号： G03F7/004
CPC分类号： C08F20/30 , C08F14/18 , C08F20/28 , C08F216/1408 , C08F220/24 , C08F220/30 , C09D125/16 , C09D133/16 , Y10S430/108 , Y10S430/111 , C08F2/00
摘要： A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n≦6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
摘要翻译：由式1表示的含氟化合物，其中R 1为甲基或三氟甲基，R 2和R 3各自独立地为氢原子或含有（a）具有直链，支链或环的烃基的基团形成并具有1-25的碳原子数或（b）芳族烃基，所述基团任选地含有氟原子，氧原子和羰基键中的至少一个，l是0-2的整数， m和n各自独立地为1-5的整数，以满足m + n＆nlE; 6的表达式，并且当R 1，R 2和R 3中的至少一个为多个时，R 1，R 2和 R3可以彼此相同或不同。

5. 发明授权

US08435717B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method 有权
标题翻译：用于光致酸发生剂的组合物，使用其的抗蚀剂组合物和图案形成方法
公开(公告)号：US08435717B2
公开(公告)日：2013-05-07
申请号：US12527362
申请日：2008-02-14
申请人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
发明人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , G03C1/675 , G03C1/73
CPC分类号： C07C69/003 , C07C69/74 , C07C309/12 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
摘要翻译：由下式（1）表示的磺酸鎓盐可用作抗蚀剂组合物的优异的放射敏感酸发生剂。可以通过使用含有该磺酸鎓盐的抗蚀剂组合物形成良好的图案。在式（1）中，R 1表示一价有机基团，Q +表示锍阳离子或碘鎓阳离子。

6. 发明申请

US20120040294A1 Top Coating Composition 有权
标题翻译：顶涂层组成
公开(公告)号：US20120040294A1
公开(公告)日：2012-02-16
申请号：US13264285
申请日：2010-04-20
申请人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
发明人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
IPC分类号： G03F7/20 , C08K5/05 , C09D135/02
CPC分类号： C08F20/22 , G03F7/11 , G03F7/2041
摘要： Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]
摘要翻译：公开了一种形成在抗蚀剂膜上的用于保护抗蚀剂膜的顶部涂料组合物，该顶部涂料组合物是用于光致抗蚀剂的顶部涂料组合物，其特征在于含有具有由以下通式（1）表示的重复单元的含氟聚合物）。该组合物能够控制显影溶液的溶解度并具有高斥水性。 [式中，R1表示氢原子，氟原子，甲基或三氟甲基，R2表示热不稳定保护基，R3表示氟原子或含氟烷基，W表示二价连接基。

7. 发明申请

US20100304303A1 Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent 有权
标题翻译：新型磺酸盐及其衍生物，光酸发生剂和抗光材料和图案形成方法使用光酸发生剂
公开(公告)号：US20100304303A1
公开(公告)日：2010-12-02
申请号：US12740780
申请日：2008-10-31
申请人： Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
发明人： Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
IPC分类号： G03F7/004 , C07C271/24 , G03F7/20
CPC分类号： C07C309/59 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D207/46 , C09D133/14 , C09D133/16 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.
摘要翻译：公开了具有由以下通式（A）表示的结构的氟化磺酸盐或含氟磺酸基化合物。在该式中，n表示1〜10的整数， R表示取代或未取代的C1-C20直链，支链或环状烷基，取代或未取代的C1-C20直链，支链或环状烯基，取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度，不关于人体积累，可产生酸（光酸），并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。

8. 发明授权

US07728103B2 Fluorine-containing polymerizable monomer and polymer compound using same 有权
标题翻译：含氟聚合性单体和使用其的高分子化合物
公开(公告)号：US07728103B2
公开(公告)日：2010-06-01
申请号：US12533024
申请日：2009-07-31
申请人： Hiroshi Saegusa , Satoru Narizuka , Kazuhiko Maeda
发明人： Hiroshi Saegusa , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： C08G63/06
CPC分类号： C07C217/90 , C08G73/1039
摘要： Polymer compounds obtained by polymerization of a fluorine-containing polymerizable monomer represented by the formula [1] in which A represents a single bond, oxygen atom, sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, phenyl, or aliphatic ring; “a” and “b” each independently represent an integer of 0-2, and 1≦a+b≦4. This fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and can be used for advanced polymer material fields.
摘要翻译： A表示单键，氧原子，硫原子，CO，CH 2，SO，SO 2，C（CH 3）2，NHCO，C的式[1]表示的含氟聚合性单体聚合得到的高分子化合物（CF 3）2，苯基或脂族环; “a”和“b”各自独立地表示0-2的整数，1＆nlE; a + b＆nlE; 4。该含氟聚合性单体可以用作有效的可聚合单体，其可以具有防水性，拒油性，低吸水性，耐热性，耐候性，耐腐蚀性，透明性，光敏性，低折射率性，低介电性等，可用于高级聚合物材料领域。

9. 发明申请

US20100035185A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method 有权
标题翻译：光致变色发生剂的组合物，使用其的抗蚀剂组合物和图案形成方法
公开(公告)号：US20100035185A1
公开(公告)日：2010-02-11
申请号：US12527362
申请日：2008-02-14
申请人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
发明人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： G03F7/004 , C07C69/003 , C07C69/74 , C07D207/00 , G03F7/20
CPC分类号： C07C69/003 , C07C69/74 , C07C309/12 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
摘要翻译：由下式（1）表示的磺酸鎓盐可用作抗蚀剂组合物的优异的放射敏感酸发生剂。可以通过使用含有该磺酸鎓盐的抗蚀剂组合物形成良好的图案。在式（1）中，R 1表示一价有机基团，Q +表示锍阳离子或碘鎓阳离子。

10. 发明授权

US07589142B2 Thermoplastic resin composition and moldings thereof 有权
标题翻译：热塑性树脂组合物及其成型品
公开(公告)号：US07589142B2
公开(公告)日：2009-09-15
申请号：US10527604
申请日：2003-09-17
申请人： Kazuhiko Maeda , Toshio Takemoto , Masakazu Fujii , Yasuharu Fukui , Yoshihiro Urata
发明人： Kazuhiko Maeda , Toshio Takemoto , Masakazu Fujii , Yasuharu Fukui , Yoshihiro Urata
IPC分类号： C08L77/00 , C08L35/06 , C08L39/04
CPC分类号： C08L55/02 , C08F210/00 , C08F279/04 , C08L25/08 , C08L25/12 , C08L33/20 , C08L35/06 , C08L51/04 , C08L77/00 , C08L77/02 , C08L77/06 , C08L2205/02 , C08L2205/03 , C08L2205/035 , C08L2666/02 , C08L2666/14 , C08L2666/04 , C08L2666/24
摘要： A polyamide resin/rubber-reinforced styrene-based resin composition, particularly, a polyamide resin/ABS resin composition, excellent in the balance between impact strength and fluidity as well as in the heat resistance, chemical resistance and paintability, as well as a shaped article thereof, are provided. The resin composition comprises 100 parts by weight of a thermoplastic resin comprising (A) from 79.5 to 20 parts by weight of a polyamide resin, (B) from 20 to 79.5 parts by weight of a polymer obtained by grafting an aromatic vinyl-based monomer and a vinyl cyanide-based monomer to a specific rubber-like polymer, (C) from 0.5 to 60 parts by weight of an unsaturated carboxylic acid-modified copolymer obtained by copolymerizing an unsaturated carboxylic acid, an aromatic vinyl-based monomer and a vinyl cyanide-based monomer, and (D) from 0 to 50 parts by weight of a copolymer obtained by copolymerizing an aromatic vinyl-based monomer and a vinyl cyanide-based monomer (with the proviso that the total of (A), (B), (C) and (D) is 100 parts by weight), and if desired, further comprises (E) from 0.05 to 150 parts by weight of an inorganic filler.
摘要翻译：聚酰胺树脂/橡胶增强苯乙烯类树脂组合物，特别是聚酰胺树脂/ ABS树脂组合物，其冲击强度和流动性之间的平衡以及耐热性，耐化学性和可涂饰性以及成形品其制品。树脂组合物包含100重量份的热塑性树脂，其包含（A）79.5-20重量份的聚酰胺树脂，（B）20至79.5重量份通过将芳族乙烯基类单体和氰化乙烯基类单体相对于特定的橡胶状聚合物，（C）0.5〜60重量份通过使不饱和羧酸，芳族乙烯基类单体和乙烯基单体共聚得到的不饱和羧酸改性共聚物氰化物类单体，（D）0〜50重量份通过使芳族乙烯基系单体和乙烯基氰系单体共聚得到的共聚物（前提条件是（A），（B），（C）和（D）为100重量份），如果需要，还包含（E）0.05至150重量份的无机填料。

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