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    • 8. 发明申请
    • THIN-FILM TRANSISTOR, THIN-FILM TRANSISTOR PRODUCING METHOD, AND DISPLAY APPARATUS
    • 薄膜晶体管,薄膜晶体管生产方法和显示装置
    • US20090021661A1
    • 2009-01-22
    • US12234127
    • 2008-09-19
    • Shinzo Tsuboi
    • Shinzo Tsuboi
    • G02F1/136H01L21/336H01L29/04
    • H01L29/78621H01L29/04H01L29/66757
    • A thin-film transistor includes a semiconductor thin film provided on an insulating surface of a support substrate, a gate insulator provided on the semiconductor thin film, and a gate electrode layer formed on the semiconductor thin film with the gate insulator interposed therebetween. The semiconductor thin film includes a channel region disposed below the gate electrode layer, and source and drain regions disposed on both sides of the channel region. The source region has an impurity concentration profile in which an impurity concentration is lowered from an interface with the gate insulator toward an interface with the support substrate in a thickness direction of the semiconductor thin film. The impurity concentration near the support substrate is lower than the impurity concentration near the gate insulator by a factor of 100 or more in the impurity concentration profile of the source region.
    • 薄膜晶体管包括设置在支撑基板的绝缘表面上的半导体薄膜,设置在半导体薄膜上的栅极绝缘体和形成在半导体薄膜上的栅电极层,栅极绝缘体插入其间。 半导体薄膜包括设置在栅电极层下方的沟道区,以及设置在沟道区两侧的源区和漏区。 源区具有杂质浓度分布,其中杂质浓度从栅极绝缘体的界面朝向与半导体薄膜的厚度方向的支撑基板的界面降低。 在源极区域的杂质浓度分布图中,支撑基板附近的杂质浓度低于栅极绝缘体附近的杂质浓度为100倍以上。