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    • 5. 发明授权
    • Process for the preparation of magnetic recording medium
    • 制备磁记录介质的方法
    • US4189508A
    • 1980-02-19
    • US943123
    • 1978-09-18
    • Katsuyoshi ChibaYoshiki KatoTeruo TsunodaHajime FukkeTeruaki KobayashiHeigo IshiharaWaichi NagashiroMunehisa Mitsuya
    • Katsuyoshi ChibaYoshiki KatoTeruo TsunodaHajime FukkeTeruaki KobayashiHeigo IshiharaWaichi NagashiroMunehisa Mitsuya
    • G11B5/02G11B5/845H01F10/02
    • G11B5/845G11B5/02
    • A process for the preparation of a magnetic recording medium comprising;applying a magnetic coating material composed of dispersing a ferromagnetic fine powder in a high molecular binder onto the surfaces of a nonmagnetic support member to form a coating thereon;arraying one or more sets of magnet pairs on the sides of front and back surfaces of said support member, each of said magnet pairs being deviated by a predetermined distance in the moving direction of said support member such that said magnet pairs will not face to each other; andapplying a magnetic field in such a manner that the magnetic field applied to said coating by the magnet pairs arrayed on the side of the front surface of said support member is greater than the magnetic field applied to said coating by the magnet pairs arrayed on the side of the back surface of said support member, thereby satisfying the requirements ofDo.ltoreq.a,b wherein Do represents a distance between the surface of said support member and said magnet pairs, a an average distance between the magnets constituting said magnet pairs arrayed on the side of the front surface of said support member, and b an average distance between the magnets constituting said magnet pairs arrayed on the side of the back surface of said support member.
    • 一种制备磁记录介质的方法,包括: 将由铁磁性细粉末分散在高分子粘合剂中的磁性涂料施加到非磁性支撑构件的表面上以在其上形成涂层; 在所述支撑构件的前表面和后表面的侧面上排列一组或多组磁体对,每个所述磁体对在所述支撑构件的移动方向上偏离预定距离,使得所述磁体对将不面对每个 其他; 并施加磁场,使得排列在所述支撑构件的前表面侧上的磁体对施加到所述涂层的磁场大于通过排列在所述支撑构件的前面的磁体对施加到所述涂层的磁场 从而满足Do a的要求,其中Do表示所述支撑构件的表面与所述磁体对之间的距离,构成所述磁体对的磁体之间的平均距离 排列在所述支撑构件的前表面的侧面上,b是构成所述磁体对的磁体之间的平均距离,排列在所述支撑构件的后表面侧。