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1. 发明授权

US06255478B1 Nucleic acid extraction method 失效
标题翻译：核酸提取法
公开(公告)号：US06255478B1
公开(公告)日：2001-07-03
申请号：US09476379
申请日：2000-01-03
申请人： Shigeru Komai , Katsuya Daimon , Yutaka Takarada
发明人： Shigeru Komai , Katsuya Daimon , Yutaka Takarada
IPC分类号： C07H2100
CPC分类号： B01L3/502 , B01L3/5082 , B01L2200/026 , B01L2300/042 , B01L2300/046 , B01L2300/049 , B01L2400/0487 , B01L2400/0622 , B01L2400/0644 , C12N15/1013 , G01N1/405 , G01N35/0098 , G01N2035/0436 , Y10S435/82
摘要： This invention provides an apparatus for extracting nucleic acids from nucleic acid-containing samples, particularly biological samples, and more particularly to a nucleic acid extraction apparatus well suited for the nucleic acid extraction method utilizing a nucleic acid-binding magnetic carrier. The nucleic acid extraction apparatus of the invention comprises (1) a group of extraction vessels each comprising a reactor tube in which a sample, a reagent solution, and a magnetic carrier are admixed and reacted, a drain cup for pooling an unwanted component solution, and a nucleic acid recovery tube all as secured to a support, (2) a distribution means for introducing a solution into each of the extraction vessels, (3) a stirring means for mixing the solution and magnetic carrier in the reactor tube, (4) a holding means for holding the magnetic carrier stationary within the vessel, (5) a discharging means for discharging the solution from the reactor tube while the magnetic carrier is held stationary, (6) a heating means for heating the solution and magnetic carrier in the reactor tube, and (7) a transfer means for serially transferring the vessels to the given positions where the distribution means, stirring means, holding means, discharging means and heating means are respectively disposed.
摘要翻译：本发明提供了一种用于从含核酸的样品，特别是生物样品中提取核酸的装置，更具体地说，涉及一种利用核酸结合磁性载体的核酸提取方法。本发明的核酸提取装置包括（1）一组提取容器，每个提取容器均包含反应器管，其中将样品，试剂溶液和磁性载体混合并反应，用于汇集不想要的组分溶液的排水杯，（2）用于将溶液引入每个提取容器的分配装置，（3）用于将溶液和磁性载体混合在反应器管中的搅拌装置，（4））用于将磁性载体固定在容器内的保持装置，（5）一个放电装置，用于在磁性载体保持静止时将溶液从反应器管排出;（6）加热装置，用于将溶液和磁性载体加热反应器管和（7）用于将容器串联地转移到分配装置，搅拌装置，保持装置，排出装置和加热装置相应的给定位置的传送装置被处置。

2. 发明授权

US06582922B1 Method of extracting nucleic acids using particulate carrier 失效
标题翻译：使用颗粒载体提取核酸的方法
公开(公告)号：US06582922B1
公开(公告)日：2003-06-24
申请号：US10067208
申请日：2002-02-07
申请人： Katsuya Daimon , Shigeru Komai , Yutaka Takarada
发明人： Katsuya Daimon , Shigeru Komai , Yutaka Takarada
IPC分类号： C12Q168
CPC分类号： C12N15/1006 , C12N15/1013 , C12Q1/6806 , C12Q2565/137
摘要： The present invention provides a method of extracting and isolating nucleic acids from a material containing nucleic acids using a nucleic acid-binding particulate carrier. More specifically, the present invention provides a nucleic acid extraction method using a particulate carrier having a particle diameter of 0.5 to 15.0 &mgr;m, a pore diameter of 50 to 500 nm and a pore volume of 200 to 5000 mm3/g. According to the method of the invention, nucleic acids can be efficiently extracted from a biological material, in particular a material containing a large amount of contaminants, such as a clinical sample.
摘要翻译：本发明提供了使用核酸结合颗粒载体从含有核酸的材料中提取和分离核酸的方法。更具体地说，本发明提供使用粒径为0.5〜15.0μm，孔径为50〜500nm，孔体积为200〜5000mm 3 / g的粒状载体的核酸提取方法。根据本发明的方法，可以从生物材料，特别是含有大量污染物的材料（例如临床样品）中有效地提取核酸。

3. 发明授权

US06281008B1 Nucleic acid extraction apparatus 失效
标题翻译：核酸提取装置
公开(公告)号：US06281008B1
公开(公告)日：2001-08-28
申请号：US09241242
申请日：1999-02-01
申请人： Shigeru Komai , Katsuya Daimon , Yutaka Takarada
发明人： Shigeru Komai , Katsuya Daimon , Yutaka Takarada
IPC分类号： C12M300
CPC分类号： B01L3/502 , B01L3/5082 , B01L2200/026 , B01L2300/042 , B01L2300/046 , B01L2300/049 , B01L2400/0487 , B01L2400/0622 , B01L2400/0644 , C12N15/1013 , G01N1/405 , G01N35/0098 , G01N2035/0436 , Y10S435/82
摘要： This invention provides an apparatus for extracting nucleic acids from nucleic acid-containing samples. The nucleic acid extraction apparatus of the invention comprises (1) a group of extraction vessels each comprising a reactor tube in which a sample, a reagent solution, and a magnetic carrier are admixed and reacted, a drain cup for pooling an unwanted component solution, and a nucleic acid recovery tube all as secured to a support, (2) a distribution means for introducing a solution into each of the extraction vessels, (3) a stirring means for mixing the solution and magnetic carrier in the reactor tube, (4) a holding means for holding the magnetic carrier stationary within the vessel, (5) a discharging means for discharging the solution from the reactor tube while the magnetic carrier is held stationary, (6) a heating means for heating the solution and magnetic carrier in the reactor tube, and (7) a transfer means for serially transferring the vessels to the given positions.
摘要翻译：本发明提供了一种从含核酸样品中提取核酸的装置。本发明的核酸提取装置包括（1）一组提取容器，每个提取容器均包含反应器管，其中将样品，试剂溶液和磁性载体混合并反应，用于汇集不需要的组分溶液的排水杯，（2）用于将溶液引入每个提取容器的分配装置，（3）用于将溶液和磁性载体混合在反应器管中的搅拌装置，（4））用于将磁性载体固定在容器内的保持装置，（5）一个放电装置，用于在磁性载体保持静止时将溶液从反应器管排出;（6）加热装置，用于将溶液和磁性载体加热反应器管，和（7）用于将容器串联转移到给定位置的转移装置。

4. 发明授权

US07488236B2 Polishing pad and method of producing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US07488236B2
公开(公告)日：2009-02-10
申请号：US11466909
申请日：2006-08-24
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
IPC分类号： B24B7/22
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
摘要翻译：本发明提供了抛光垫，通过该抛光垫，诸如透镜，反射镜等的光学材料或需要高度表面平坦度的材料，如在硅树脂晶片，玻璃基板或用于硬盘的铝基板的抛光中，或通常的金属抛光，可平坦化，抛光效率高。本发明还提供一种平面化特性优异的半导体晶片用抛光垫，无磨损，可以低成本地制造。提供了没有脱扣误差的抛光垫，从而不会损坏晶片，也不会降低工作效率。提供了平面性良好，晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。提供了可以使平面性改善和划痕减少兼容的抛光垫。

5. 发明授权

US5218555A Method for judging a color difference using rules fuzzy inference and apparatus therefor 失效
标题翻译：使用规则模糊推理来判断色差的方法及其装置
公开(公告)号：US5218555A
公开(公告)日：1993-06-08
申请号：US618564
申请日：1990-11-27
申请人： Shigeru Komai , Takayuki Horino , Yozo Yamada
发明人： Shigeru Komai , Takayuki Horino , Yozo Yamada
IPC分类号： B41F33/00 , G01J3/46 , G01J3/50 , G01N33/36
CPC分类号： G01J3/50 , B41F33/0036 , G01N33/36 , G01J2003/466 , G01J3/462 , Y10S706/90
摘要： Method for judging a color difference between a color of an object and a reference color and apparatus therefor in which it is judged at first if the color difference exists within a predetermined range in which it is difficult to determine whether or not the color difference is definite and, if it exists within the predetermined range, the color difference is judged whether it is substantial or nealigible according to rules according to Fuzzy inference.
摘要翻译：用于判断对象的颜色与基准颜色之间的色差的方法及其设备，其中首先判断色差是否存在于难以确定色差是否确定的预定范围内并且如果存在于预定范围内，则根据模糊推理判断色差是否实质或不合适。

6. 发明授权

US08318825B2 Polishing pad and method of producing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08318825B2
公开(公告)日：2012-11-27
申请号：US11466878
申请日：2006-08-24
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
IPC分类号： C08G18/28
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
摘要翻译：本发明提供了抛光垫，通过该抛光垫，诸如透镜，反射镜等的光学材料或需要高度表面平坦度的材料，如在硅树脂晶片，玻璃基板或用于硬盘的铝基板的抛光中，或通常的金属抛光，可平坦化，抛光效率高。本发明还提供一种平面化特性优异的半导体晶片用抛光垫，无磨损，可以低成本地制造。提供了没有脱扣误差的抛光垫，从而不会损坏晶片，也不会降低工作效率。提供了平面性良好，晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。提供了可以使平面性改善和划痕减少兼容的抛光垫。

7. 发明授权

US07192340B2 Polishing pad, method of producing the same, and cushion layer for polishing pad 有权
标题翻译：抛光垫，其制造方法和抛光垫用缓冲层
公开(公告)号：US07192340B2
公开(公告)日：2007-03-20
申请号：US10432410
申请日：2001-11-28
申请人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
发明人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
摘要： The polishing pad of this invention is a polishing pad effecting stable planarizing processing, at high polishing rate, materials requiring surface flatness at high level, such as a silicon wafer for semiconductor devices, a magnetic disk, an optical lens etc. This invention provides a polishing pad which can be subjected to surface processing to form a sheet or grooves, is excellent in thickness accuracy, attains a high polishing rate, achieves a uniform polishing rate, and also provides a polishing pad which is free of quality variations resulting from an individual variation, easily enables a change the surface patterns, enables fine surface pattern, is compatible with various materials to be polished, is free of burrs upon forming the pattern. This invention provides a polishing pad which can have abrasive grains mixed at very high density without using slurry, and generates few scratches by preventing aggregation of abrasive grains dispersed therein. The polishing pad of this invention has a polishing layer formed from a curing composition to be cured with energy rays, the polishing layer being formed surface pattern thereon by photolithography. The polishing pad of this invention comprises a polishing layer resin having abrasive grains dispersed therein, the resin containing ionic groups in the range of 20 to 1500 eq/ton.
摘要翻译：本发明的研磨垫是在高抛光速度下进行稳定的平坦化处理的抛光垫，例如需要高水平的表面平坦度的材料，例如半导体器件的硅晶片，磁盘，光学透镜等。本发明提供了一种可进行表面处理以形成片材或沟槽的抛光垫具有优异的厚度精度，达到高抛光速率，达到均匀的抛光速率，并且还提供一种抛光垫，该抛光垫没有由个体产生的质量变化变化，容易使表面图案发生变化，使精细表面图案与各种待抛光材料兼容，在形成图案时无毛刺。本发明提供一种抛光垫，其可以在不使用浆料的情况下具有以非常高的密度混合的磨料颗粒，并且通过防止分散在其中的磨料颗粒的聚集而产生少量划痕。本发明的抛光垫具有由能量射线固化的固化组合物形成的抛光层，该抛光层通过光刻形成在其上的表面图案。本发明的抛光垫包括其中分散有磨粒的抛光层树脂，含有离子基团的树脂在20至1500eq / ton的范围内。

8. 发明申请

US20060148393A1 Polishing pad and cushion layer for polishing pad 有权
标题翻译：抛光垫和抛光垫垫层
公开(公告)号：US20060148393A1
公开(公告)日：2006-07-06
申请号：US11366981
申请日：2006-03-02
申请人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
发明人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
摘要： A polishing pad includes a polishing layer having abrasive grains dispersed in a resin and is characterized in that the resin is a resin containing ionic groups in the range of 20 to 1500 eq/ton.
摘要翻译：抛光垫包括具有分散在树脂中的磨粒的抛光层，其特征在于该树脂是含有20至1500eq / ton范围内的离子基团的树脂。

9. 发明授权

US07329170B2 Method of producing polishing pad 有权
标题翻译：抛光垫的生产方法
公开(公告)号：US07329170B2
公开(公告)日：2008-02-12
申请号：US11366238
申请日：2006-03-02
申请人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
发明人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
IPC分类号： B24B1/00
CPC分类号： B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
摘要： A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.
摘要翻译：一种制造具有抛光层的抛光垫的方法的特征在于，抛光层通过光刻法制造，包括：由至少含有引发剂和能量射线反应性化合物的固化组合物形成片状模制品，以使其固化能量射线将片材模制物暴露于能量射线以引起其修饰，以改变片材模制品在溶剂中的溶解度; 并且在用能量射线照射之后显影片材成型体，用溶剂部分地除去固化组合物，从而在至少一个表面上形成凹凸图案。

10. 发明申请

US20060148392A1 Method of producing polishing pad 有权
标题翻译：抛光垫的生产方法
公开(公告)号：US20060148392A1
公开(公告)日：2006-07-06
申请号：US11366238
申请日：2006-03-02
申请人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
发明人： Koichi Ono , Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Shigeru Komai , Masayuki Tsutsumi
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24B37/22 , B24D3/28 , B24D11/001 , B24D11/008
摘要： A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.
摘要翻译：一种制造具有抛光层的抛光垫的方法的特征在于，抛光层通过光刻法制造，包括：由至少含有引发剂和能量射线反应性化合物的固化组合物形成片状模制品，以使其固化能量射线将片材模制物暴露于能量射线以引起其修饰，以改变片材模制品在溶剂中的溶解度; 并且在用能量射线照射之后显影片材成型体，用溶剂部分地除去固化组合物，从而在至少一个表面上形成凹凸图案。

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