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    • 1. 发明授权
    • Electrostatic chuck
    • 静电吸盘
    • US06643115B2
    • 2003-11-04
    • US10090438
    • 2002-02-27
    • Katsushi SakaueShoji KosakaIchio KiyofujiJunji OheMasaki TerazonoYasushi MigitaNaohito HigashiHitoshi Atari
    • Katsushi SakaueShoji KosakaIchio KiyofujiJunji OheMasaki TerazonoYasushi MigitaNaohito HigashiHitoshi Atari
    • H02N1300
    • H02N13/00H01L21/6831Y10T279/23
    • Disclosed is an electrostatic chuck comprising a ceramic dielectric layer having a surface for placing thereon a work that is to be held, and an electrode provided on a surface opposite to the surface of the ceramic dielectric layer for placing the work thereon, wherein: the placing surface of the ceramic dielectric layer is sectionalized into an outer peripheral region and a central region by gas injection grooves extending in a circumferential manner; the surface roughness Ra(o) of the outer peripheral region of the placing surface and the surface roughness Ra(i) ot the central region satisfy the following conditions: 0.6≦Ra(i)≦1.5 &mgr;m Ra(o)≦0.7 &mgr;m Ra(i)≧Ra(o)  and the outer peripheral region of the placing surface is higher than the inner peripheral region by not less than 0.6 &mgr;m. The electrostatic chuck holds the substrate with a large adsorptive force, maintains evenness in the heat distribution of the substrate, enables the substrate to be quickly separated away from the chuck, and permits the gas to leak little.
    • 公开了一种静电卡盘,其包括具有用于放置待保持的工件的表面的陶瓷电介质层和设置在与陶瓷电介质层的与陶瓷电介质层的表面相反的表面上的电极,用于将工件放置在其上,其中:放置 陶瓷电介质层的表面通过沿周向延伸的气体注入槽分成外周区域和中心区域;放置表面的外周区域的表面粗糙度Ra(o)和表面粗糙度Ra(i )满足以下条件:载置面的外周区域比内周区域高0.6μm以上。 静电吸盘以大的吸附力保持基板,保持基板的热分布均匀性,能够将基板快速地从夹头分离,并允许气体泄漏很少。