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1. 发明授权

US06989513B2 Heat-generating element, heat-generating substrates, heat-generating substrate manufacturing method, microswitch, and flow sensor 失效
标题翻译：发热元件，发热基板，发热基板的制造方法，微动开关和流量传感器
公开(公告)号：US06989513B2
公开(公告)日：2006-01-24
申请号：US10465842
申请日：2003-06-20
申请人： Katsuji Arakawa , Masahiro Fujii , Hiroshi Koeda
发明人： Katsuji Arakawa , Masahiro Fujii , Hiroshi Koeda
IPC分类号： H05B3/10
CPC分类号： H05B3/148
摘要： A stable and durable heat-generating element and substrate, a method of efficient and highly precise manufacture of same, and equipment utilizing same are obtained. Employing as material a silicon substrate into at least a portion of which boron or another impurity is diffused to impart conductivity, a heater portion, in which are provided one or a plurality of slits the corner portions of which are removed or are rounded, is fabricated integrally on the silicon substrate by etching processes. Simultaneously with this, a depression portion provided below to control the heating state of the heater portion is formed integrally.
摘要翻译：获得稳定且耐用的发热元件和基板，其高效且高精度制造的方法以及利用其的设备。将作为材料的硅衬底作为其至少一部分硼或另一杂质扩散以赋予导电性的材料，加热器部分设置有一个或多个切口，其角部被去除或被倒圆形，通过蚀刻工艺一体地在硅衬底上。与此同时，下面设置的用于控制加热器部分的加热状态的凹部形成为一体。

2. 发明授权

US07147795B2 Method for surface treatment 失效
标题翻译：表面处理方法
公开(公告)号：US07147795B2
公开(公告)日：2006-12-12
申请号：US10953879
申请日：2004-09-29
申请人： Hiroshi Koeda , Katsuji Arakawa , Kazufumi Oya
发明人： Hiroshi Koeda , Katsuji Arakawa , Kazufumi Oya
IPC分类号： B44C1/22
CPC分类号： H01L21/6838 , Y10T29/49822 , Y10T29/53274 , Y10T29/53683
摘要： A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface treatment apparatus 1 are conveyed to the inside of a decompression chamber to decompress a plurality of concave portions 32 (enclosed spaces); a second step in which the surface treatment apparatus 1 and the substrate 10 are brought out from the inside of the decompression chamber to environment under atmospheric pressure in a state where the substrate 10 is being attracted to the surface treatment apparatus 1 with the use of a difference between negative pressure inside the concave portions 32 and atmospheric pressure; and a third step in which the surface treatment is carried out to a back surface 101 of the substrate 10 with the substrate 10 being attracted by the surface treatment apparatus 1.
摘要翻译：表面处理方法包括：第一步骤，其中表面处理装置1和基板10处于基板10的前表面102面向表面处理装置1的状态，被输送到减压室的内部以减压多个凹部32（封闭空间）; 在基板10被吸引到表面处理装置1的状态下，使用表面处理装置1和基板10从压缩室的内部脱离到大气压环境的第二步骤凹部32内的负压与大气压的差; 以及第三步骤，其中基板10被表面处理装置1吸引而进行到基板10的背面101的表面处理。

3. 发明授权

US06375310B1 Ink jet head, manufacturing method therefor, and ink jet recording apparatus 有权
标题翻译：喷墨头，其制造方法和喷墨记录装置
公开(公告)号：US06375310B1
公开(公告)日：2002-04-23
申请号：US09180650
申请日：1998-11-12
申请人： Katsuji Arakawa , Hiroshi Koeda
发明人： Katsuji Arakawa , Hiroshi Koeda
IPC分类号： B41J204
CPC分类号： B41J2/1623 , B41J2/14233 , B41J2/14314 , B41J2/161 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1646 , B41J2002/14362 , B41J2002/14379 , B41J2202/19
摘要： An ink jet head in which a multi-nozzle structure is attained, and highly accurate alignment of ink jet head chips is realized, a method for manufacturing the ink jet head, and a recording apparatus on which the ink jet head is mounted. Guide protrusions (141) for alignment of ink jet head chips (41) are formed in an ink jet head chip bonded surface (134) of a nozzle plate (133), the ink jet head chips (41) are aligned by inserting the guide protrusions (141) of the nozzle plate (133) into guide grooves (51) of nozzle surfaces (42) of the ink jet head chips (41), and the nozzle plate (133) and the respective ink jet head chips (41) are bonded with each other by a bonding agent.
摘要翻译：实现多喷嘴结构的喷墨头，实现喷墨头芯片的高精度对准，喷墨头的制造方法和安装有喷墨头的记录装置。在喷嘴板（133）的喷墨头芯片接合表面（134）中形成用于喷墨头芯片（41）对准的导向突起（141），喷墨头芯片（41）通过插入导向件喷嘴板（133）的突出部（141）进入喷墨头芯片（41）的喷嘴表面（42）的引导槽（51）和喷嘴板（133）和各个喷墨头芯片（41）通过粘合剂彼此粘合。

4. 发明申请

US20050095811A1 Method for surface treatment 失效
标题翻译：表面处理方法
公开(公告)号：US20050095811A1
公开(公告)日：2005-05-05
申请号：US10953879
申请日：2004-09-29
申请人： Hiroshi Koeda , Katsuji Arakawa , Kazufumi Oya
发明人： Hiroshi Koeda , Katsuji Arakawa , Kazufumi Oya
IPC分类号： C23F1/08 , H01L21/02 , H01L21/306 , H01L21/683 , B23P19/04 , H01L21/30 , H01L21/46
CPC分类号： H01L21/6838 , Y10T29/49822 , Y10T29/53274 , Y10T29/53683
摘要： A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface treatment apparatus 1 are conveyed to the inside of a decompression chamber to decompress a plurality of concave portions 32 (enclosed spaces); a second step in which the surface treatment apparatus 1 and the substrate 10 are brought out from the inside of the decompression chamber to environment under atmospheric pressure in a state where the substrate 10 is being attracted to the surface treatment apparatus 1 with the use of a difference between negative pressure inside the concave portions 32 and atmospheric pressure; and a third step in which the surface treatment is carried out to a back surface 101 of the substrate 10 with the substrate 10 being attracted by the surface treatment apparatus 1.
摘要翻译：表面处理方法包括：第一步骤，其中表面处理装置1和基板10处于基板10的前表面102面向表面处理装置1的状态，被输送到减压室的内部以减压多个凹部32（封闭空间）; 在基板10被吸引到表面处理装置1的状态下，使用表面处理装置1和基板10从压缩室的内部脱离到大气压环境的第二步骤凹部32内的负压与大气压的差; 以及第三步骤，其中基板10被表面处理装置1吸引而进行到基板10的背面101的表面处理。

5. 发明申请

US20050115679A1 Surface treatment apparatus 审中-公开
标题翻译：表面处理装置
公开(公告)号：US20050115679A1
公开(公告)日：2005-06-02
申请号：US10953871
申请日：2004-09-29
申请人： Ryuichi Kurosawa , Fumio Takagi , Hiroshi Koeda , Kazufumi Oya , Katsuji Arakawa
发明人： Ryuichi Kurosawa , Fumio Takagi , Hiroshi Koeda , Kazufumi Oya , Katsuji Arakawa
IPC分类号： H01L21/02 , C23F1/08 , H01L21/306 , H01L21/683 , C23F1/00
CPC分类号： H01L21/6838 , C23F1/08
摘要： A surface treatment apparatus 1 is constructed to hold a substrate 10 when surface treatment is carried out to a back surface 101 of the substrate 10. The surface treatment apparatus 1 includes at least one enclosed space each defined by a concave portion 32 and a front surface 102 of the substrate 10; and an O-ring 2 (contact portion) adapted to hermetically contact with the front surface 102 of the substrate 10 to produce negative pressure in cooperation with the O-ring 2 and the front surface 102 of the substrate 10. The surface treatment apparatus 1 is constructed so that the substrate 10 is attracted onto the surface treatment apparatus 1 using a difference between the negative pressure and atmospheric pressure by decompressing the enclosed space in a decompression chamber and then bringing out the substrate 10 from the inside of the decompression chamber to environment under atmospheric pressure.
摘要翻译：当对基板10的背面101进行表面处理时，表面处理装置1被构造成保持基板10。表面处理装置1包括由凹部32和基板10的前表面102限定的至少一个封闭空间; 以及适于与基板10的前表面102气密接触以产生与O形环2和基板10的前表面102协作的负压的O形环2（接触部分）。表面处理装置1被构造成使得通过减压减压室中的封闭空间将衬底10从负压和大气压之间的差异吸引到表面处理装置1上，然后从衬底10的内部引出衬底10 减压室在大气压下环境。

6. 发明申请

US20060232655A1 Electrostatic actuator, liquid-jet head, liquid-jet apparatus, device including electrostatic actuator, method for manufacturing liquid-jet head 审中-公开
标题翻译：静电致动器，液体喷射头，液体喷射装置，包括静电致动器的装置，液体喷射头的制造方法
公开(公告)号：US20060232655A1
公开(公告)日：2006-10-19
申请号：US11404026
申请日：2006-04-13
申请人： Masahiro Fujii , Katsuji Arakawa
发明人： Masahiro Fujii , Katsuji Arakawa
IPC分类号： B41J2/39
CPC分类号： B41J2/16 , B41J2/14314 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1642 , B41J2/1646
摘要： An electrostatic actuator includes a silicon diaphragm, an opposing electrode opposing the diaphragm with intervention of a gap therebetween, and an insulating layer formed on a surface of the diaphragm, opposing the opposing electrode. A voltage is applied between the diaphragm and the opposing electrode. The insulating layer has a laminated structure including a dielectric layer formed of a material having a higher relative dielectric constant than silicon oxide, on the diaphragm, and a surface layer exhibiting higher reduction in surface charge density than that of the dielectric layer, formed on the dielectric layer.
摘要翻译：静电致动器包括硅隔膜，与隔膜相对的对置电极和介于其间的介质，以及形成在隔膜表面上的与相对电极相对的绝缘层。在隔膜和相对电极之间施加电压。绝缘层具有层叠结构，该层压结构包括由隔膜上具有比氧化硅更高的相对介电常数的材料形成的电介质层，以及形成在电介质层上的表面电荷密度降低的表面电荷密度的表面层电介质层。

7. 发明授权

US07581824B2 Electrostatic actuator, droplet discharge head and method for manufacturing the droplet discharge head, droplet discharge apparatus, and device 失效
标题翻译：静电致动器，液滴喷射头和液滴喷射头的制造方法，液滴喷射装置和装置
公开(公告)号：US07581824B2
公开(公告)日：2009-09-01
申请号：US11295818
申请日：2005-12-07
申请人： Masahiro Fujii , Katsuji Arakawa
发明人： Masahiro Fujii , Katsuji Arakawa
IPC分类号： B41J2/045
CPC分类号： B41J2/14274 , B41J2/1612 , B41J2/1623 , B41J2/1626
摘要： To provide an electrostatic actuator that generates high pressure under a given voltage and includes an insulating film exhibiting excellent insulation resistance, a droplet discharge head that includes the electrostatic actuator and a method for manufacturing the droplet discharge head, a droplet discharge apparatus that includes the droplet discharge head and has excellent printing performance, and a device that includes the electrostatic actuator and has excellent driving performance. A diaphragm 12, a counter electrode 17 opposite to the diaphragm 12 with a gap interposed therebetween, and an insulating film 16 on a surface of the diaphragm 12 opposite to the counter electrode 17 are included. The insulating film 16 includes at least a dielectric film 16a formed of a substance having a higher relative dielectric constant than silicon oxide.
摘要翻译：为了提供在给定电压下产生高压的静电致动器，并且包括具有优异的绝缘电阻的绝缘膜，包括静电致动器的液滴喷射头和用于制造液滴喷射头的方法，包括液滴的液滴喷射装置排出头，具有优异的印刷性能，以及包括静电致动器并且具有优异的驱动性能的装置。膜片12，与隔膜12相对的间隔相对的对置电极17以及与对置电极17相对的隔膜12的表面上的绝缘膜16。绝缘膜16至少包括由具有比氧化硅更高的相对介电常数的物质形成的电介质膜16a。

8. 发明申请

US20060125879A1 Electrostatic actuator, droplet discharge head and method for manufacturing the droplet discharge head, droplet discharge apparatus, and device 失效
标题翻译：静电致动器，液滴喷射头和液滴喷射头的制造方法，液滴喷射装置和装置
公开(公告)号：US20060125879A1
公开(公告)日：2006-06-15
申请号：US11295818
申请日：2005-12-07
申请人： Masahiro Fujii , Katsuji Arakawa
发明人： Masahiro Fujii , Katsuji Arakawa
IPC分类号： B41J2/04
CPC分类号： B41J2/14274 , B41J2/1612 , B41J2/1623 , B41J2/1626
摘要： To provide an electrostatic actuator that generates high pressure under a given voltage and includes an insulating film exhibiting excellent insulation resistance, a droplet discharge head that includes the electrostatic actuator and a method for manufacturing the droplet discharge head, a droplet discharge apparatus that includes the droplet discharge head and has excellent printing performance, and a device that includes the electrostatic actuator and has excellent driving performance. A diaphragm 12, a counter electrode 17 opposite to the diaphragm 12 with a gap interposed therebetween, and an insulating film 16 on a surface of the diaphragm 12 opposite to the counter electrode 17 are included. The insulating film 16 includes at least a dielectric film 16a formed of a substance having a higher relative dielectric constant than silicon oxide.
摘要翻译：为了提供在给定电压下产生高压的静电致动器，并且包括具有优异的绝缘电阻的绝缘膜，包括静电致动器的液滴喷射头和用于制造液滴喷射头的方法，包括液滴的液滴喷射装置排出头，具有优异的印刷性能，以及包括静电致动器并且具有优异的驱动性能的装置。膜片12，与隔膜12相对的间隔相对的对置电极17以及与对置电极17相反的隔膜12的表面上的绝缘膜16。绝缘膜16至少包括由具有比氧化硅更高的相对介电常数的物质形成的电介质膜16a。

9. 发明授权

US08746846B2 Nozzle plate, discharge head, method for producing the nozzle plate, method for producing the discharge head, and discharge device 有权
标题翻译：喷嘴板，排出头，喷嘴板的制造方法，排出头的制造方法以及排出装置
公开(公告)号：US08746846B2
公开(公告)日：2014-06-10
申请号：US12963119
申请日：2010-12-08
申请人： Katsuji Arakawa
发明人： Katsuji Arakawa
IPC分类号： B41J2/135 , B32B38/10 , B32B38/00
CPC分类号： B41J2/14314 , B41J2/16 , B41J2/1606 , B41J2/162 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1642 , B41J2/1646
摘要： A nozzle plate includes: a nozzle plate main body made of metal, the nozzle plate main body having nozzle rows formed of nozzles arranged in parallel and penetrating the nozzle plate main body in a thickness direction, wherein at the outer edge of the nozzles on a droplet discharge surface of the nozzle plate main body, a water-repellent film is provided, and primer treatment is performed on at least part of the periphery of the droplet discharge surface of the nozzle plate main body, the periphery outside the water-repellent film.
摘要翻译：喷嘴板包括：由金属制成的喷嘴板主体，喷嘴板主体具有由平行布置并沿着厚度方向贯穿喷嘴板主体的喷嘴形成的喷嘴列，其中在喷嘴板主体的外边缘处喷嘴板主体的液滴喷出面，设有防水膜，并且在喷嘴板主体的液滴喷出面的周围的至少一部分，防水膜外侧进行底漆处理。

10. 发明授权

US07536785B2 Method for manufacturing a droplet ejection head 有权
标题翻译：液滴喷射头的制造方法
公开(公告)号：US07536785B2
公开(公告)日：2009-05-26
申请号：US11295758
申请日：2005-12-07
申请人： Katsuji Arakawa , Yasutaka Matsumoto
发明人： Katsuji Arakawa , Yasutaka Matsumoto
IPC分类号： B21D53/00
CPC分类号： B41J2/1634 , B41J2/16 , B41J2/1623 , B41J2/1628 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2002/043 , Y10T29/42 , Y10T29/49401 , Y10T156/1056
摘要： A method for manufacturing a droplet ejection head includes a step of forming recessed sections for forming nozzles by etching half way through a first face of a silicon substrate, a step of bonding a first support substrate to the first face of the silicon substrate, a step of reducing the thickness of the silicon substrate by processing a second face of the silicon substrate that is opposite to the first face thereof, and making the recessed sections through holes, and a step of removing the first support substrate from the silicon substrate after the reduction of the thickness of the silicon substrate.
摘要翻译：一种液滴喷射头的制造方法，其特征在于，包括以下步骤：通过在硅基板的第一面上半蚀刻，形成喷嘴的凹部，将第一支撑基板接合到硅基板的第一面的工序; 通过处理与其第一面相反的硅衬底的第二面，并且使凹部穿过孔来减小硅衬底的厚度，以及在还原之后从硅衬底去除第一支撑衬底的步骤的硅衬底的厚度。

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