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1. 发明授权

US6029679A Semiconductor cleaning and production methods using a film repulsing fine particle contaminants 失效
标题翻译：半导体清洗和生产方法使用薄膜排斥微粒污染物
公开(公告)号：US6029679A
公开(公告)日：2000-02-29
申请号：US708325
申请日：1996-09-05
申请人： Katsuhiro Ota , Haruo Itoh , Akio Saito , Katsuhiko Itoh , Michimasa Funabashi
发明人： Katsuhiro Ota , Haruo Itoh , Akio Saito , Katsuhiko Itoh , Michimasa Funabashi
IPC分类号： B08B6/00 , B08B17/02 , C25F1/00 , C25F3/30 , C25F5/00
CPC分类号： B08B6/00 , B08B17/02
摘要： By employing a cleaning method wherein a substrate such as Si wafer is covered with a film having electrostatic repulsive force or a substance capable of controlling a zeta potential so as to prevent or remarkably reduce adhesion of fine particles present in a cleaning solution or etching solution, electronic parts can be produced in higher yield and lower cost.
摘要翻译：通过采用其中诸如Si晶片的衬底被具有静电排斥力的膜或能够控制ζ电位的物质覆盖以便防止或显着降低存在于清洁溶液或蚀刻溶液中的微粒的粘附的清洁方法，可以以更高的产量和更低的成本生产电子部件。

2. 发明授权

US5747387A Removal method of organic matter and system for the same 失效
标题翻译：有机物和系统的去除方法相同
公开(公告)号：US5747387A
公开(公告)日：1998-05-05
申请号：US519399
申请日：1995-08-25
申请人： Koutarou Koizumi , Sukeyoshi Tsunekawa , Kazuhiko Kawai , Maki Shimoda , Katsuhiko Itoh , Haruo Itoh , Akio Saito
发明人： Koutarou Koizumi , Sukeyoshi Tsunekawa , Kazuhiko Kawai , Maki Shimoda , Katsuhiko Itoh , Haruo Itoh , Akio Saito
IPC分类号： G03F7/42 , H01L21/027 , H01L21/302 , H01L21/304 , H01L21/306 , H01L21/3065 , H01L21/311 , H01L21/00
CPC分类号： H01L21/02043 , G03F7/42 , H01L21/31138 , Y10S438/906
摘要： According to the present invention, the surface of the sample is cleaned with water immediately after ashing of the resist the quality of which has been changed through ion implantation by ozone-containing gas, or ozone-containing gas and ultraviolet ray, or the sample is cleaned with water without being exposed to the atmosphere after ashing, thereby allowing the number of residues to be reduced to 1/100, decreasing the load in cleaning process by solution, cutting down the semiconductor device production cost and improving the semiconductor device productivity.
摘要翻译：根据本发明，在通过含臭氧气体或含臭氧气体和紫外线的离子注入改变了质量的抗蚀剂灰化后，样品的表面立即被清洗，或者样品是在灰化后不用暴露于大气中，用水清洗，从而使残留物数减少到+ E，fra 1/100 + EE，减少溶液清洗过程中的负荷，减少半导体器件的生产成本，改善半导体器件的生产率。

3. 发明授权

US06758872B2 Polishing slurry 失效
标题翻译：抛光浆
公开(公告)号：US06758872B2
公开(公告)日：2004-07-06
申请号：US09797940
申请日：2001-03-05
申请人： Katsuhiro Ota , Akio Saito
发明人： Katsuhiro Ota , Akio Saito
IPC分类号： C09G102
CPC分类号： H01L21/31053 , B24B37/044 , C09G1/02 , C09K3/1463 , C09K3/1472
摘要： A polishing slurry prepared by dispersing in a dispersion medium, abrasive grains comprised of a material having a solubility in the dispersion medium at 25° C., of 0.001 g/100 g or higher is used to effectively remove any abrasive grains standing adherent to the surfaces of objects to be polished or the interiors of polishing apparatus after polishing.
摘要翻译：通过分散在分散介质中制备的抛光浆料，使用由在分散介质中在25℃下具有溶解度的材料构成的磨料颗粒为0.001g / 100g或更高的磨料，以有效地除去任何粘附于待研磨物体的表面或抛光后的抛光装置的内部。

4. 发明授权

US06656021B2 Process for fabricating a semiconductor device 失效
公开(公告)号：US06656021B2
公开(公告)日：2003-12-02
申请号：US09940880
申请日：2001-08-29
申请人： Katsuhiro Ota , Akio Saito
发明人： Katsuhiro Ota , Akio Saito
IPC分类号： B24B100
CPC分类号： H01L21/31053 , B24B37/044 , C09G1/02 , C09K3/1463 , C09K3/1472
摘要： A polishing slurry prepared by dispersing in a dispersion medium, abrasive grains comprised of a material having a solubility in the dispersion medium at 25° C., of 0.001 g/100 g or higher is used to effectively remove any abrasive grains standing adherent to the surfaces of objects to be polished or the interiors of polishing apparatus after polishing.

5. 发明授权

US06656022B2 Method for polishing a semiconductor substrate member 失效
公开(公告)号：US06656022B2
公开(公告)日：2003-12-02
申请号：US09940881
申请日：2001-08-29
申请人： Katsuhiro Ota , Akio Saito
发明人： Katsuhiro Ota , Akio Saito
IPC分类号： B24B100
CPC分类号： H01L21/31053 , B24B37/044 , C09G1/02 , C09K3/1463 , C09K3/1472
摘要： A polishing slurry prepared by dispersing in a dispersion medium, abrasive grains comprised of a material having a solubility in the dispersion medium at 25° C., of 0.001 g/100 g or higher is used to effectively remove any abrasive grains standing adherent to the surfaces of objects to be polished or the interiors of polishing apparatus after polishing.

6. 发明授权

US5409544A Method of controlling adhesion of fine particles to an object in liquid 失效
标题翻译：控制细粒子与液体中物体的粘附的方法
公开(公告)号：US5409544A
公开(公告)日：1995-04-25
申请号：US117652
申请日：1993-09-08
申请人： Katsuhiro Ota , Akio Saito , Yoichi Takahara , Hitoshi Oka
发明人： Katsuhiro Ota , Akio Saito , Yoichi Takahara , Hitoshi Oka
IPC分类号： B08B3/12 , H01L21/306 , B08B9/00
CPC分类号： H01L21/02052 , B08B3/12 , Y10S134/902 , Y10S148/017
摘要： A method of controlling the adhesion of fine particles to an object in a solution characterized in that the adhesion of fine particles in the solution is prevented or reduced by adding into the solution a material, which is capable of controlling the zeta potential (surface potential) of the fine particles, in the amount of 10.sup.-7 to 25% by volume.
摘要翻译：一种控制溶液中微粒附着到物体上的方法，其特征在于通过向该溶液中加入能够控制ζ电位（表面电位）的材料来防止或减少溶液中细颗粒的粘附，的细颗粒，其量为10-7至25体积％。

7. 发明授权

US5979475A Specimen holding method and fluid treatment method of specimen surface and systems therefor 失效
标题翻译：试样表面及其系统的试样保持方法和流体处理方法
公开(公告)号：US5979475A
公开(公告)日：1999-11-09
申请号：US430429
申请日：1995-04-28
申请人： Takao Satoh , Haruo Itoh , Hitoshi Oka , Yoichi Takahara , Akio Saito
发明人： Takao Satoh , Haruo Itoh , Hitoshi Oka , Yoichi Takahara , Akio Saito
IPC分类号： H01L21/00 , H01L21/683 , B08B3/02
CPC分类号： H01L21/67017 , H01L21/6838
摘要： A highly clean fluid treatment system having a small system volume is provided by using a Bernoulli holder to accomplish stable holding of a specimen in a simple configuration. A holder having a specimen hold face formed almost the same as a specimen or having a Bernoulli effect producing region and a region surrounding the Bernoulli region made of a specific combination of materials is used and fluid supply sources are connected to the holder for supplying one or more fluids containing a treatment agent of a specimen. Since a force for inhibiting a position shift occurs on the end face of the specimen 10, stable specimen holding is enabled. The space between the specimen and the holder where treatment is executed is narrow and fluid always flows from the treatment space to the outside. Therefore, the fluid treatment system of a small volume producing high treatment efficiency and minimizing the chances of recontamination of the specimen can be provided.
摘要翻译：通过使用伯努利支架提供具有小系统体积的高度清洁的流体处理系统，以简单的配置实现样品的稳定保持。使用具有与样本几乎相同或具有伯努利效应产生区域和由特定材料组合的伯努利区域周围的区域的样本保持面的保持器，并且流体供应源连接到保持器，用于供应一个或含有样品处理剂的更多液体。由于在试样10的端面发生用于抑制位移的力，因此能够进行稳定的试样保持。试样与执行处理的保持器之间的空间狭窄，液体总是从处理空间流向外部。因此，可以提供小体积的流体处理系统，其产生高的处理效率并最小化试样的再污染机会。

8. 发明授权

US08733907B2 Liquid discharge head and method for manufacturing liquid discharge head 有权
标题翻译：液体排出头及液体排出头的制造方法
公开(公告)号：US08733907B2
公开(公告)日：2014-05-27
申请号：US13701187
申请日：2011-05-16
申请人： Akio Saito , Hiromitsu Morita
发明人： Akio Saito , Hiromitsu Morita
IPC分类号： B41J2/045
CPC分类号： B41J2/14201 , B41J2/14209 , B41J2/1429 , B41J2/1607 , B41J2/1615 , B41J2/1632 , B41J2/1634 , B41J2002/14491 , Y10T29/49401
摘要： A liquid discharge head includes piezoelectric members including: a pressure chamber applying a pressure for discharging liquid to liquid; a first electrode provided on an inner surface side of the pressure chamber; and a second electrode provided outside the pressure chamber, the piezoelectric members being arranged in a first direction intersecting with an ink flow direction and in a second direction crossing the ink flow direction and the first direction so that the flow directions of the liquid flowing through the pressure chamber of the piezoelectric members are arranged along one another. The head includes first common wiring lines connected to the first electrodes arranged in the first direction; and second common wiring lines connected to the second electrodes 23 arranged in the second direction. The first common wiring lines are arranged in the second direction and the second common wiring lines are arranged in the first direction.
摘要翻译：液体排出头包括压电部件，包括：压力室，其施加用于将液体排出液体的压力; 设置在所述压力室的内表面侧的第一电极; 以及设置在所述压力室外部的第二电极，所述压电部件沿与油墨流动方向交叉的第一方向和与所述油墨流动方向和所述第一方向交叉的第二方向布置，使得流过所述油墨流动方向的液体的流动方向压电部件的压力室彼此配置。头包括连接到沿第一方向布置的第一电极的第一公共布线; 以及连接到沿第二方向布置的第二电极23的第二公共布线。第一公共布线沿第二方向布置，第二公共布线布置在第一方向上。

9. 发明授权

US07875253B2 Decomposing system for polyisocyanate residues, and start-up method for the same 有权
标题翻译：多异氰酸酯残留分解体系及其启动方法
公开(公告)号：US07875253B2
公开(公告)日：2011-01-25
申请号：US11988678
申请日：2006-07-12
申请人： Tadashi Yoshida , Yasumichi Ooto , Akio Saito
发明人： Tadashi Yoshida , Yasumichi Ooto , Akio Saito
IPC分类号： B01J8/00 , B01J8/08 , C07C211/00
CPC分类号： C08J11/14 , C08J2375/00 , Y02W30/704 , Y10S422/901
摘要： An object of the invention is to provide a decomposing system for polyisocyanate residues that is capable of suppressing reaction of polyisocyanate residues with high temperature and high pressure water to allow smooth start-up of the operation, and a start-up method for the decomposing system for the polyisocyanate residues. The decomposing system is used for hydrolyzing the polyisocyanate residues to polyamine using high temperature and high pressure water, comprising a hydrolyzer, a water feed pipe connected to the hydrolyzer, a residual feed pipe connected to the water feed pipe, a solvent feed line for filling an organic solvent in a solvent filling portion of the residual feed pipe, and a solvent draining line. Upon start-up of the operation, the organic solvent is previously filled in the solvent filling portion via the solvent feed line and the solvent draining line, first, and then, the high temperature and high pressure water is fed from the water feed pipe to the hydrolyzer. Then, the organic solvent is fed from the residual feed pipe to the water feed pipe, first, and then, the polyisocyanate residues are fed thereto.
摘要翻译：本发明的目的是提供一种能够抑制多异氰酸酯残留物与高温高压水反应以使操作顺利启动的多异氰酸酯残留分解系统，以及分解系统的启动方法对于多异氰酸酯残基。分解系统用于使用高温高压水将多异氰酸酯残基水解成多胺，包括水解器，连接到水解器的给水管，连接到给水管的残余进料管，用于填充的溶剂进料管剩余进料管的溶剂填充部分中的有机溶剂和溶剂排出管线。在操作开始时，首先通过溶剂供给管线和溶剂排出管路先将有机溶剂填充到溶剂填充部分中，然后将高温高压水从供水管供给到水解产物。然后，将有机溶剂从剩余进料管供给到给水管，首先，向其中供给多异氰酸酯残渣。

10. 发明授权

US07861266B2 Information processing apparatus and method, and television signal receiving apparatus and method 有权
标题翻译：信息处理装置和方法以及电视信号接收装置和方法
公开(公告)号：US07861266B2
公开(公告)日：2010-12-28
申请号：US11840434
申请日：2007-08-17
申请人： Akio Saito
发明人： Akio Saito
IPC分类号： G06F13/00
CPC分类号： H04N21/482 , H04N5/44543 , H04N21/4316 , H04N21/4345 , H04N21/4858 , H04N21/488
摘要： An information processing apparatus has: an input unit for inputting image data and program information data, the program information data indicating information on a program including the image data; a display unit for displaying an image corresponding to the image data input from the input unit; and a control unit responsive to a change in a program including images displayed by the display unit for controlling the display unit to display the changed program and the images on the same screen.
摘要翻译：一种信息处理设备具有：输入单元，用于输入图像数据和节目信息数据，节目信息数据指示关于包括图像数据的节目的信息; 显示单元，用于显示与从输入单元输入的图像数据相对应的图像; 以及控制单元，其响应于包括由所述显示单元显示的图像的程序的改变，用于控制所述显示单元以将所述改变的程序和所述图像显示在同一屏幕上。

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