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1. 发明申请

US20050136358A1 Patterning using wax printing and lift off 有权
标题翻译：图案使用蜡印刷和剥离
公开(公告)号：US20050136358A1
公开(公告)日：2005-06-23
申请号：US10741252
申请日：2003-12-19
申请人： Kateri Paul , William Wong , Steven Ready , Rene Lujan
发明人： Kateri Paul , William Wong , Steven Ready , Rene Lujan
IPC分类号： H01L21/28 , G03F7/00 , H01L21/027 , H01L21/033 , H01L21/306 , H01L21/311 , H01L21/336 , H01L21/768 , H01L29/786
CPC分类号： H01L21/31144 , H01L21/0272 , H01L21/0335 , H01L21/76802
摘要： A method for performing a liftoff operation involves printing a liftoff pattern using low-resolution patterning techniques to form fine feature patterns. The resulting feature size is defined by the spacing between printed patterns rather than the printed pattern size. By controlling the cross-sectional profile of the printed liftoff pattern, mask structures may be formed from the liftoff operation having beneficial etch-mask aperture profiles. For example, a multi-layer printed liftoff pattern can be used to create converging aperture profiles in a patterned layer. The patterned layer can then be used as an etch mask, where the converging aperture profiles result in desirable diverging etched features.
摘要翻译：用于执行提升操作的方法包括使用低分辨率图案化技术打印提升图案以形成精细的特征图案。所得到的特征尺寸由印刷图案之间的间距而不是印刷图案尺寸定义。通过控制印刷的剥离图案的横截面轮廓，可以从具有有利的蚀刻掩模孔径轮廓的提升操作形成掩模结构。例如，可以使用多层印刷提升图案来在图案化层中形成会聚孔径轮廓。然后可以将图案化层用作蚀刻掩模，其中会聚孔径轮廓导致期望的发散蚀刻特征。

2. 发明申请

US20070035597A1 Digital lithography using real time quality control 有权
标题翻译：数字光刻使用实时质量控制
公开(公告)号：US20070035597A1
公开(公告)日：2007-02-15
申请号：US11204648
申请日：2005-08-15
申请人： Steven Ready , William Wong , Scott Limb
发明人： Steven Ready , William Wong , Scott Limb
IPC分类号： G01D11/00
CPC分类号： B41J2/2139 , B81C99/0065 , B81C2201/0184 , B81C2201/0198
摘要： A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.
摘要翻译：一种数字光刻系统，包括用于选择性地喷射相变掩模材料的液滴的液滴源（打印头）和用于捕获（产生）表示喷射液滴形成的打印特征的图像数据的成像系统。该系统还包括数字控制系统，其检测打印特征中的缺陷，例如通过将图像数据与存储的图像数据进行比较。然后，数字控制系统修改打印的特征以校正缺陷，例如通过将打印头移动到缺陷上并使打印头将液滴喷射到缺陷的位置上。在一个实施例中，单打印头二次打印机与多打印头主打印机一起操作以校正缺陷。

3. 发明申请

US20070172774A1 Process for forming a feature by undercutting a printed mask 有权
标题翻译：通过底切印刷掩模形成特征的方法
公开(公告)号：US20070172774A1
公开(公告)日：2007-07-26
申请号：US11336365
申请日：2006-01-20
申请人： Scott Limb , William Wong , Steven Ready , Michael Chabinyc
发明人： Scott Limb , William Wong , Steven Ready , Michael Chabinyc
IPC分类号： G03F7/26
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/2018
摘要： A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be removed and the underlying structure used an etch mask or as a final structure. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.
摘要翻译：打印图案化掩模在光致抗蚀剂或类似材料层的表面上形成数字平版印刷工艺。然后将印刷图案化掩模用作显影或蚀刻掩模，并且底层被发展或过蚀刻以削去印刷图案掩模。可以去除掩模，并且底层结构使用蚀刻掩模或作为最终结构。可以在实现数字光刻在制造过程中的益处的同时获得细微的特征宽度，使印刷图案化掩模特征的最小宽度更窄。

4. 发明申请

US20090185018A9 DIGITAL LITHOGRAPHY USING REAL TIME QUALITY CONTROL 有权
标题翻译：使用实时质量控制的数字刻印
公开(公告)号：US20090185018A9
公开(公告)日：2009-07-23
申请号：US11204648
申请日：2005-08-15
申请人： Steven Ready , William Wong , Scott Limb
发明人： Steven Ready , William Wong , Scott Limb
IPC分类号： G01D11/00
CPC分类号： B41J2/2139 , B81C99/0065 , B81C2201/0184 , B81C2201/0198
摘要： A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.
摘要翻译：一种数字光刻系统，包括用于选择性地喷射相变掩模材料的液滴的液滴源（打印头）和用于捕获（产生）表示喷射液滴形成的打印特征的图像数据的成像系统。该系统还包括数字控制系统，其检测打印特征中的缺陷，例如通过将图像数据与存储的图像数据进行比较。然后，数字控制系统修改打印的特征以校正缺陷，例如通过将打印头移动到缺陷上并使打印头将液滴喷射到缺陷的位置上。在一个实施例中，单打印头二次打印机与多打印头主打印机一起操作以校正缺陷。

5. 发明授权

US07498119B2 Process for forming a feature by undercutting a printed mask 有权
标题翻译：通过底切印刷掩模形成特征的方法
公开(公告)号：US07498119B2
公开(公告)日：2009-03-03
申请号：US11336365
申请日：2006-01-20
申请人： Scott Limb , William Wong , Steven Ready , Michael Chabinyc
发明人： Scott Limb , William Wong , Steven Ready , Michael Chabinyc
IPC分类号： G03F7/20 , G03F7/26 , G03F7/38
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/2018
摘要： A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be removed and the underlying structure used an etch mask or as a final structure. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.
摘要翻译：打印图案化掩模在光致抗蚀剂或类似材料层的表面上形成数字平版印刷工艺。然后将印刷图案化掩模用作显影或蚀刻掩模，并且底层被发展或过蚀刻以削去印刷图案掩模。可以去除掩模，并且底层结构使用蚀刻掩模或作为最终结构。可以在实现数字光刻在制造过程中的益处的同时获得细微的特征宽度，使印刷图案化掩模特征的最小宽度更窄。

6. 发明申请

US20070046705A1 Detecting defective ejector in digital lithography system 失效
标题翻译：在数字光刻系统中检测有缺陷的喷射器
公开(公告)号：US20070046705A1
公开(公告)日：2007-03-01
申请号：US11218416
申请日：2005-09-01
申请人： William Wong , Steven Ready , Ana Arias
发明人： William Wong , Steven Ready , Ana Arias
IPC分类号： B41J29/38
CPC分类号： B41J29/393
摘要： A digital lithography system prints a large-area electronic device by dividing the overall device printing process into a series of discrete feature printing sub-processes, where each feature printing sub-process involves printing both a predetermined portion (feature) of the device in a designated substrate area, and an associated test pattern in a designated test area that is remote from the feature. At the end of each feature printing sub-process, the test pattern is analyzed, e.g., using a camera and associated imaging system, to verify that the test pattern has been successfully printed. A primary ejector is used until an unsuccessfully printed test pattern is detected, at which time a secondary (reserve) ejector replaces the primary ejector and reprints the feature associated with the defective test pattern. When multiple printheads are used in parallel, analysis of the test pattern is used to efficiently identify the location of a defective ejector.
摘要翻译：数字光刻系统通过将整个设备打印过程划分成一系列离散特征打印子过程来打印大面积电子设备，其中每个特征打印子过程涉及将设备的预定部分（特征）打印在一个指定的基板区域以及远离该特征的指定测试区域中的关联测试图案。在每个特征打印子过程结束时，分析测试图案，例如使用相机和相关联的成像系统来验证测试图案是否已被成功打印。使用初级喷射器，直到检测到未成功打印的测试图案，此时次要（预留）喷射器取代主喷射器并重印与缺陷测试图案相关的特征。当并行使用多个打印头时，使用测试图案的分析来有效地识别有缺陷的喷射器的位置。

7. 发明申请

US20060057851A1 Method for fabricating fine features by jet-printing and surface treatment 有权
标题翻译：通过喷墨印刷和表面处理制造精细特征的方法
公开(公告)号：US20060057851A1
公开(公告)日：2006-03-16
申请号：US11251525
申请日：2005-10-14
申请人： William Wong , Steven Ready , Stephen White , Alberto Salleo , Michael Chabinyc
发明人： William Wong , Steven Ready , Stephen White , Alberto Salleo , Michael Chabinyc
IPC分类号： H01L21/311 , H01L21/302
CPC分类号： H01L51/0004 , B82Y30/00 , H01L21/0337 , H01L21/31144 , H01L21/32139 , H01L29/66765 , H01L51/0021 , H01L51/0023 , H01L51/0541
摘要： A method and system for masking a surface to be etched is described. The method includes the operation of heating a phase-change masking material and using a droplet source to eject droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze after upon contact with the thin-film or substrate surface. The thin-film or substrate is then treated to alter the surface characteristics, typically by depositing a self assembled monolayer on the surface. After deposition, the masking material is removed. A material of interest is then deposited over the substrate such that the material adheres only to regions not originally covered by the mask such that the mask acts as a negative resist. Using such techniques, feature sizes of devices smaller than the smallest droplet printed may be fabricated.
摘要翻译：描述用于掩蔽待蚀刻表面的方法和系统。该方法包括加热相变掩模材料和使用液滴源来喷射掩模材料的液滴以沉积在待蚀刻的薄膜或其它基底表面上的操作。控制薄膜或基板表面的温度，使得在与薄膜或基板表面接触之后液滴快速冷冻。然后通常通过在表面上沉积自组装的单层来处理薄膜或基底以改变表面特性。沉积后，去除掩模材料。然后将感兴趣的材料沉积在衬底上，使得材料仅粘附到最初不被掩模覆盖的区域，使得掩模用作负抗蚀剂。使用这样的技术，可以制造小于最小液滴印刷的装置的特征尺寸。

8. 发明申请

US20050142293A1 Method for the printing of homogeneous electronic material with a multi-ejector print head 有权
公开(公告)号：US20050142293A1
公开(公告)日：2005-06-30
申请号：US11019038
申请日：2004-12-20
申请人： Steven Ready , William Wong
发明人： Steven Ready , William Wong
IPC分类号： B41J2/01 , B41J2/005 , B41J2/485 , B41J2/51 , H01L21/027 , H01L21/288 , H01L21/3205 , H01L21/768 , H01L23/544 , H05K3/12 , B05D1/36
CPC分类号： H05K3/125 , H01L21/288 , H01L21/76838 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Printing systems are disclosed that produce homogenous, smooth edged printed patterns (such as integrated circuit (IC) patterns) by separating pattern layouts into discrete design layers having only parallel layout features. By printing each design layer in a printing direction aligned with the parallel layout features, the individual print solution droplets deposited onto the substrate do not dry before adjacent droplets are deposited. Therefore, printed patterns having accurate geometries and consistent electrical properties can be printed.

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