会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • HDP-CVD deposition of low dielectric constant amorphous carbon film
    • 低介电常数无定形碳膜的HDP-CVD沉积
    • US06423384B1
    • 2002-07-23
    • US09339888
    • 1999-06-25
    • Kasra KhazeniEugene TzouZhengquan Tan
    • Kasra KhazeniEugene TzouZhengquan Tan
    • H05H124
    • H01L21/3146C23C16/26H01L21/0276H01L21/0332
    • The present invention generally provides a method for depositing a low dielectric constant amorphous carbon film on a substrate or other workpiece using high density plasma chemical vapor deposition (HDP-CVD) techniques. Specifically, the present invention provides a method for forming an amorphous carbon film having a low dielectric constant of less than about 3.0 and a high thermal stability at a temperature of at least about 400° C. In a preferred embodiment, the film is deposited using methane (CH4) and argon in a HDP-CVD reactor. The amorphous carbon film formed according to the invention is useful for many applications in ultra large scale integration (ULSI) structures and devices, such as for example, an inter-metal dielectric material and an anti-reflective coating useful for patterning sub-micron interconnect features.
    • 本发明通常提供了使用高密度等离子体化学气相沉积(HDP-CVD)技术在衬底或其它工件上沉积低介电常数非晶碳膜的方法。 具体地说,本发明提供一种形成低介电常数小于约3.0的非晶碳膜和在至少约400℃的温度下的高热稳定性的方法。在优选实施例中,使用 甲烷(CH4)和氩气。 根据本发明形成的无定形碳膜可用于超大规模集成(ULSI)结构和器件中的许多应用,例如金属间电介质材料和用于构图亚微米互连的抗反射涂层 特征。
    • 6. 发明申请
    • METHOD AND APPARATUS FOR MEASURING THE FORCE OF STICTION OF A MEMBRANE IN A MEMS DEVICE
    • 用于测量MEMS器件中的膜的力的方法和装置
    • US20080150517A1
    • 2008-06-26
    • US11614795
    • 2006-12-21
    • Kasra Khazeni
    • Kasra Khazeni
    • G01R31/00
    • G02B26/001
    • Disclosed are methods and systems for testing MEMS devices (e.g., interferometric modulators) so as to induce a moveable element to move from a first position to a second position and to detect the movement. The methods include applying an electrical current to the movable element in the presence of a magnetic field, thereby producing a Lorentz force on the movable element. The force required to move the movable element from the first position to the second position can then be estimated based on the magnitudes and geometric relationships of the electrical current and the magnetic field, and the geometry of the movable element. In some embodiments, the first position may be a movable element adhered to another surface (e.g., a layer on a substrate) due to stiction forces. In these embodiments, the stiction forces can be estimated. In other embodiments, the first position may be a relaxed position, where the movable element is spaced a first distance from a substrate, and the second position may be a second distance from the substrate and/or contacting the substrate. In these embodiments, the springiness (e.g., a spring constant) of support structures supporting the movable element can be estimated.
    • 公开了用于测试MEMS器件(例如,干涉式调制器)的方法和系统,以便使可移动元件从第一位置移动到第二位置并检测该移动。 所述方法包括在存在磁场的情况下向可动元件施加电流,由此在可移动元件上产生洛伦兹力。 然后可以基于电流和磁场的大小和几何关系以及可移动元件的几何形状来估计将可移动元件从第一位置移动到第二位置所需的力。 在一些实施例中,第一位置可以是由于粘性力而粘附到另一表面(例如,基底上的层)的可移动元件。 在这些实施例中,可以估计静力。 在其他实施例中,第一位置可以是松弛位置,其中可移动元件与衬底隔开第一距离,并且第二位置可以距离衬底和/或接触衬底的第二距离。 在这些实施例中,可以估计支撑可移动元件的支撑结构的弹性(例如,弹簧常数)。