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    • 2. 发明授权
    • In-situ preparation of polyaspartic ester mixtures
    • 聚天冬氨酸酯混合物的原位制备
    • US06790925B2
    • 2004-09-14
    • US10310313
    • 2002-12-05
    • Karsten DanielmeierCatherine M. BritschRolf GertzmannMichele E. VargoTerrell D. WaytEdward P. SquillerRichard R. Roesler
    • Karsten DanielmeierCatherine M. BritschRolf GertzmannMichele E. VargoTerrell D. WaytEdward P. SquillerRichard R. Roesler
    • C08G1850
    • C08G73/1092
    • The present invention relates to polyaspartate mixtures containing a) 5 to 50 equiv. %, based on the total equivalents of aspartate groups, of a polyoxypropylene polyaspartate corresponding to the formula wherein X1 represents the residue obtained by removing the amino groups from a polyoxypropylene polyamine having a functionality of n, R1 and R2 are identical or different and represent organic groups which are inert to isocyanate groups at a temperature of 100° C. or less, R3 and R4 are identical or different and represent hydrogen or organic groups which are inert towards isocyanate groups at a temperature of 100° C. or less and n is 2 to 4, and b) 50 to 95 equiv. %, based on the total equivalents of aspartate groups, of a polyether polyaspartate corresponding to the formula I wherein X1 represents the residue obtained by removing the amino groups from a polyether polyamine having a functionality of n and a number average molecular weight of less than 5000, wherein the amino groups are attached to primary carbon atoms and the ether groups are separated by at least two carbon atoms. The present invention also relates to a process for preparing these polyaspartate mixtures and to the polyureas prepared by reacting the polyaspartate mixtures and optionally other isocyanate-reactive compounds with polyisocyanates.
    • 本发明涉及含有a)5至50当量的聚天冬氨酸盐混合物 基于天冬氨酸酯基团的总当量的%,对应于方解石的聚氧丙烯聚天冬氨酸酯X1代表通过从具有官能度n的聚氧丙烯多胺除去氨基而获得的残基,R 1和R 2相同或不同,并且表示有机基团 其在100℃或更低的温度下对异氰酸酯基团是惰性的,R3和R4相同或不同,并且表示在100℃或更低的温度下对异氰酸酯基团呈惰性的氢或有机基团,n为2 至4,和b)50至95当量 %,基于天冬氨酸酯基团的总当量,对应于式I的聚醚聚天冬氨酸,其中X1表示通过从官能度为n且数均分子量小于5000的聚醚多胺除去氨基而获得的残基 ,其中所述氨基连接到伯碳原子上,并且所述醚基团被至少两个碳原子分开。 本发明还涉及制备这些聚天冬氨酸酯混合物的方法和通过使聚天冬氨酸盐混合物和任选的其它异氰酸酯反应性化合物与多异氰酸酯反应制备的聚脲。
    • 5. 发明授权
    • Polyaspartate resins with good hardness and flexibility
    • 聚天冬氨酸树脂具有良好的硬度和柔韧性
    • US06774207B2
    • 2004-08-10
    • US10256179
    • 2002-09-26
    • Karsten DanielmeierCatherine M. BritschRolf GertzmannMichele E. VargoTerrell Dean WaytEdward P. SquillerRichard R. Roesler
    • Karsten DanielmeierCatherine M. BritschRolf GertzmannMichele E. VargoTerrell Dean WaytEdward P. SquillerRichard R. Roesler
    • C08G7300
    • C08G18/792C07C229/24C08G18/3821C09D175/04
    • The present invention relates to polyaspartate mixtures containing a) 5 to 70 equiv. %, based on the total equivalents of aspartate groups, of a cyclic polyaspartate corresponding to the formula wherein X1 represents the residue obtained by removing the amino groups from a cyclic polyamine having a functionality of n, R1 and R2 are identical or different and represent organic groups which are inert to isocyanate groups at a temperature of 100° C. or less, R3 and R4 are identical or different and represent hydrogen or organic groups which are inert towards isocyanate groups at a temperature of 100° C. or less and n is 2 to 4, and b) 30 to 95 equiv. %, based on the total equivalents of aspartate groups, of a polyether polyaspartate corresponding to the formula I wherein X1 represents the residue obtained by removing the amino groups from a polyether polyamine having a functionality of n and a number average molecular weight of less than 600, wherein the amino groups are attached to primary carbon atoms and the ether groups are separated by at least two carbon atoms. The present invention also relates to a process for preparing these polyaspartate mixtures and to the polyureas prepared by reacting the polyaspartate mixtures and optionally other isocyanate-reactive compounds with polyisocyanates.
    • 本发明涉及含有a)5至70当量的聚天冬氨酸盐混合物 基于天冬氨酸酯基团的总当量%,对应于方解石的环状聚天冬氨酸X1表示通过从具有官能度n的环状多胺除去氨基而获得的残基,R 1和R 2相同或不同,表示有机基团 其在100℃或更低的温度下对异氰酸酯基团是惰性的,R3和R4相同或不同,并且表示在100℃或更低的温度下对异氰酸酯基团呈惰性的氢或有机基团,n为2 至4,和b)30至95当量 %,基于天冬氨酸酯基团的总当量,对应于式I的聚醚聚天冬氨酸,其中X1表示通过从官能度为n且数均分子量小于600的聚醚多胺除去氨基而获得的残基 其中氨基连接到伯碳原子上,醚基被至少两个碳原子分开。本发明还涉及一种制备这些聚天冬氨酸酯混合物的方法,以及通过使聚天冬氨酸盐混合物和任选的其它物质反应制备的聚脲 异氰酸酯反应性化合物与多异氰酸酯。
    • 9. 发明授权
    • Compounds containing urea and alkoxysilane groups
    • 含有脲和烷氧基硅烷基的化合物
    • US5908948A
    • 1999-06-01
    • US814561
    • 1997-03-11
    • Richard R. RoeslerEdward P. SquillerPhilip E. YeskeStanley F. Siranovich
    • Richard R. RoeslerEdward P. SquillerPhilip E. YeskeStanley F. Siranovich
    • C07F7/10C07F7/18C08G18/28C08G77/26
    • C08G18/289C07F7/1836
    • The present invention relates to compounds containing alkoxysilane and urea groups corresponding to the formula ##STR1## wherein X represents identical or different organic groups which are inert to isocyanate groups below 100.degree. C., provided that at least one of these groups is an alkoxy group,Z represents COOR.sub.1 or an aromatic ring,R represents the residue obtained by removing the isocyanate groups from an organic monomeric polyisocyanate or a polyisocyanate adduct,R.sub.1 and R.sub.2 are identical or different and represent organic groups which are inert to isocyanate groups at a temperature of 100.degree. C. or less,R.sub.3 and R.sub.4 are identical or different and represent hydrogen or organic groups which are inert to isocyanate groups at a temperature of 100.degree. C. or less andn is an integer from 1 to 8.The present invention also relates to the use of these compounds for the preparation of coatings, sealants and adhesives.
    • 本发明涉及对应于下式的含有烷氧基硅烷和脲基的化合物:其中X表示相对或不同的对异氰酸酯基团低于100℃的惰性的有机基团,条件是这些基团中的至少一个为烷氧基,Z表示 COOR1或芳环,R表示通过从有机单体多异氰酸酯或多异氰酸酯加成物中除去异氰酸酯基而获得的残基,R1和R2相同或不同,表示在100℃下对异氰酸酯基惰性的有机基团 R3和R4相同或不同,表示在100℃以下的温度下为异氰酸酯基团为惰性的氢或有机基团,n为1〜8的整数。本发明还涉及 使用这些化合物来制备涂料,密封剂和粘合剂。