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1. 发明授权

US07977768B2 Semiconductor devices and methods of manufacture thereof 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US07977768B2
公开(公告)日：2011-07-12
申请号：US12060626
申请日：2008-04-01
申请人： Karl-Heinz Mueller , Holger Arnim Poehle
发明人： Karl-Heinz Mueller , Holger Arnim Poehle
IPC分类号： H01L21/761
CPC分类号： H01L21/743
摘要： Semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device includes a workpiece having a buried layer disposed beneath a top portion thereof. A trench is disposed in the workpiece extending at least through the buried layer. At least one sinker contact is disposed in the top portion of the workpiece. The at least one sinker contact is proximate sidewalls of at least a portion of the trench and is adjacent the buried layer. An insulating material is disposed on the sidewalls of the trench. A conductive material is disposed within the trench and is coupled to a lower portion of the workpiece.
摘要翻译：公开了半导体器件及其制造方法。在一个实施例中，半导体器件包括具有设置在其顶部下方的掩埋层的工件。沟槽设置在至少延伸穿过掩埋层的工件中。至少一个沉降片触点设置在工件的顶部。所述至少一个沉降片接触件邻近所述沟槽的至少一部分的侧壁并且与所述掩埋层相邻。绝缘材料设置在沟槽的侧壁上。导电材料设置在沟槽内并联接到工件的下部。

2. 发明申请

US20110195565A1 Semiconductor Devices and Methods of Manufacture Thereof 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20110195565A1
公开(公告)日：2011-08-11
申请号：US13091612
申请日：2011-04-21
申请人： Karl-Heinz Mueller , Holger Arnim Poehle
发明人： Karl-Heinz Mueller , Holger Arnim Poehle
IPC分类号： H01L21/3205
CPC分类号： H01L21/743
摘要： Semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device includes a workpiece having a buried layer disposed beneath a top portion thereof. A trench is disposed in the workpiece extending at least through the buried layer. At least one sinker contact is disposed in the top portion of the workpiece. The at least one sinker contact is proximate sidewalls of at least a portion of the trench and is adjacent the buried layer. An insulating material is disposed on the sidewalls of the trench. A conductive material is disposed within the trench and is coupled to a lower portion of the workpiece.
摘要翻译：公开了半导体器件及其制造方法。在一个实施例中，半导体器件包括具有设置在其顶部下方的掩埋层的工件。沟槽设置在至少延伸穿过掩埋层的工件中。至少一个沉降片触点设置在工件的顶部。所述至少一个沉降片接触件邻近所述沟槽的至少一部分的侧壁并且与所述掩埋层相邻。绝缘材料设置在沟槽的侧壁上。导电材料设置在沟槽内并联接到工件的下部。

3. 发明授权

US08603918B2 Semiconductor devices and methods of manufacture thereof 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US08603918B2
公开(公告)日：2013-12-10
申请号：US13091612
申请日：2011-04-21
申请人： Karl-Heinz Mueller , Holger Arnim Poehle
发明人： Karl-Heinz Mueller , Holger Arnim Poehle
IPC分类号： H01L21/311
CPC分类号： H01L21/743
摘要： Semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device includes a workpiece having a buried layer disposed beneath a top portion thereof. A trench is disposed in the workpiece extending at least through the buried layer. At least one sinker contact is disposed in the top portion of the workpiece. The at least one sinker contact is proximate sidewalls of at least a portion of the trench and is adjacent the buried layer. An insulating material is disposed on the sidewalls of the trench. A conductive material is disposed within the trench and is coupled to a lower portion of the workpiece.
摘要翻译：公开了半导体器件及其制造方法。在一个实施例中，半导体器件包括具有设置在其顶部下方的掩埋层的工件。沟槽设置在至少延伸穿过掩埋层的工件中。至少一个沉降片触点设置在工件的顶部。所述至少一个沉降片接触件邻近所述沟槽的至少一部分的侧壁并且与所述掩埋层相邻。绝缘材料设置在沟槽的侧壁上。导电材料设置在沟槽内并联接到工件的下部。

4. 发明申请

US20090243041A1 Semiconductor Devices and Methods of Manufacture Thereof 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20090243041A1
公开(公告)日：2009-10-01
申请号：US12060626
申请日：2008-04-01
申请人： Karl-Heinz Mueller , Holger Arnim Poehle
发明人： Karl-Heinz Mueller , Holger Arnim Poehle
IPC分类号： H01L29/00 , H01L21/44
CPC分类号： H01L21/743
摘要： Semiconductor devices and methods of manufacture thereof are disclosed. In one embodiment, a semiconductor device includes a workpiece having a buried layer disposed beneath a top portion thereof. A trench is disposed in the workpiece extending at least through the buried layer. At least one sinker contact is disposed in the top portion of the workpiece. The at least one sinker contact is proximate sidewalls of at least a portion of the trench and is adjacent the buried layer. An insulating material is disposed on the sidewalls of the trench. A conductive material is disposed within the trench and is coupled to a lower portion of the workpiece.
摘要翻译：公开了半导体器件及其制造方法。在一个实施例中，半导体器件包括具有设置在其顶部下方的掩埋层的工件。沟槽设置在至少延伸穿过掩埋层的工件中。至少一个沉降片触点设置在工件的顶部。所述至少一个沉降片接触件邻近所述沟槽的至少一部分的侧壁并且与所述掩埋层相邻。绝缘材料设置在沟槽的侧壁上。导电材料设置在沟槽内并联接到工件的下部。

5. 发明申请

US20060251995A1 Method for the production of an anti-reflecting surface on optical integrated circuits 有权
标题翻译：在光学集成电路上制造抗反射表面的方法
公开(公告)号：US20060251995A1
公开(公告)日：2006-11-09
申请号：US11408618
申请日：2006-04-21
申请人： Holger Wille , Gernot Langguth , Karl-Heinz Mueller
发明人： Holger Wille , Gernot Langguth , Karl-Heinz Mueller
IPC分类号： G03C5/00
CPC分类号： H01L31/1804 , H01L31/02363 , Y02E10/547 , Y02P70/521
摘要： A photodetector is formed in a semiconductor body. A hard mask grating is photolithographically formed on a surface of the semiconductor body. The semiconductor body is etched using the hard mask grating as a mask. The etching is performed down to a predetermined depth. An implantation is performed such that an anode or cathode of the photodector that has been interrupted during the etching is re-formed.
摘要翻译：光电检测器形成在半导体本体中。在半导体本体的表面上光刻地形成硬掩模光栅。使用硬掩模光栅作为掩模蚀刻半导体本体。蚀刻到达预定深度。进行注入，使得在蚀刻期间被中断的光电检测器的阳极或阴极被重新形成。

6. 发明授权

US07012517B2 Damage control system for ships 失效
标题翻译：船舶损伤控制系统
公开(公告)号：US07012517B2
公开(公告)日：2006-03-14
申请号：US10448224
申请日：2003-05-30
申请人： Karl-Heinz Mueller , Matthias Schulze
发明人： Karl-Heinz Mueller , Matthias Schulze
IPC分类号： G08B25/00
CPC分类号： G01C21/22 , A62C37/50 , B63B43/00
摘要： A damage control system for monitoring, suppressing and eliminating leakage damage, fire damage and/or ABC contamination after collisions, running aground, the effects of weapons, etc., has an automation and monitoring system for system failures, voltage outages and equipment failures and has an operating station at which a perspective layout of the ship, which represents the rooms of the ship, can be displayed.To obtain a picture of the situation more rapidly after a collision, running aground or the effects of weapons, an alarm unit is installed in each room or in each of a group of rooms of the ship allocated together, these alarms cooperating with the damage control system, so that when deployed, the display of the corresponding room and/or group of rooms allocated together undergoes a color change in the perspective layout of the ship.
摘要翻译：一个用于监测，抑制和消除碰撞后的火灾损害和/或ABC污染物，运行中的武器等的损坏控制系统，具有系统故障，电压中断和设备故障的自动化和监控系统，具有可以显示代表船的房间的船的透视布局的操作台。为了在碰撞后立即获得情况的图片，搁置或武器的影响，在每个房间或分配在一起的船舶的一组房间中安装了一个报警单元，这些报警与损坏控制系统，使得当部署时，分配在一起的相应房间和/或房间组的显示在船的透视布局中发生颜色变化。

7. 发明授权

US5445694A Method for the production of a heated composite glass sheet with metal wires arranged in the thermoplastic intermediate layer 失效
标题翻译：用于生产热塑复合玻璃板的方法，所述复合玻璃板布置在热塑性中间层中
公开(公告)号：US5445694A
公开(公告)日：1995-08-29
申请号：US202488
申请日：1994-02-28
申请人： Manfred Gillner , Karl-Heinz Mueller , Siegfried Pikhard , Juergen Engels , Gerd Sauer , Bernhard Reul , Klaus Henn , Helmut Maeuser , Stefan Immerschitt , Dieter Neumann
发明人： Manfred Gillner , Karl-Heinz Mueller , Siegfried Pikhard , Juergen Engels , Gerd Sauer , Bernhard Reul , Klaus Henn , Helmut Maeuser , Stefan Immerschitt , Dieter Neumann
IPC分类号： B23K26/36 , B26F3/06 , B32B17/10 , C03C27/12 , H05B3/86 , B32B31/12 , B32B17/00 , H05B6/40 , H05K3/02
CPC分类号： H05B3/86 , B23K26/362 , B26F3/06 , B32B17/10036 , B32B17/10385 , H05B2203/017 , Y10T156/108
摘要： An electrically heated composite glass sheet including heating element wires deposited and fixed in place on the thermoplastic film connecting the individual glass sheets together so as to extend from the one film edge as far as the opposite film edge. The heating wires are connected in parallel with buses, which are arranged at a predetermined distance from the edge of the film. Directly adjacent to the buses, the sections of the wires which are arranged between the buses and the edge of the film are severed by moving two electrodes, which are connected with a power supply, into contact with the wires. The electric current heats the wires between the electrodes to their fusion temperature and thereby severs the wires.
摘要翻译：一种电加热复合玻璃板，其包括将热塑性膜上淀积和固定的加热元件丝，将各个玻璃板连接在一起，以便从一个膜边缘延伸到相对的膜边缘。加热线与总线并联连接，总线布置在离膜边缘预定的距离处。直接与总线相邻，通过将与电源连接的两个电极与电线接触来切断布置在总线和膜边缘之间的电线部分。电流将电极之间的电线加热到它们的融合温度，从而切断电线。

8. 发明申请

US20090082055A1 Cordless telephone system 审中-公开
标题翻译：无绳电话系统
公开(公告)号：US20090082055A1
公开(公告)日：2009-03-26
申请号：US11903306
申请日：2007-09-21
申请人： Karl-Heinz Mueller
发明人： Karl-Heinz Mueller
IPC分类号： H04Q7/20
CPC分类号： H04M1/72502 , H04M1/73 , H04W52/245 , H04W52/287 , H04W52/325
摘要： A cordless telephone system consisting of a fixed station and at least one mobile station, both of which switch over to standby operation after a telephone conversation has been terminated, and correspond with one another at fixed intervals. Each mobile station is registered in the fixed station and can be addressed by the fixed station, and both the fixed and the mobile station each have a receiver circuit and a transmission circuit. The transmission power of the transmission amplifier can be set, at least in the fixed station, as a function of the number of connected mobile stations.
摘要翻译：由固定台和至少一个移动台组成的无绳电话系统，两者在电话通话终止之后切换到待机操作，并以固定的间隔彼此对应。每个移动台被登记在固定站中，并且可以由固定站寻址，固定和移动站都具有接收机电路和传输电路。传输放大器的传输功率可以至少在固定站中根据连接的移动站的数量来设置。

9. 发明申请

US20070271856A1 WORKSPACE DIVIDING SYSTEM WITH INTEGRATED VIEWING PORTAL 审中-公开
标题翻译：具有集成式查看门户的工作空间分拣系统
公开(公告)号：US20070271856A1
公开(公告)日：2007-11-29
申请号：US11696373
申请日：2007-04-04
申请人： James Ludwig , John Hamilton , Karl-Heinz Mueller , Brett Kincaid
发明人： James Ludwig , John Hamilton , Karl-Heinz Mueller , Brett Kincaid
IPC分类号： A47F10/00
CPC分类号： E04B2/7416 , A47B83/00 , E04B2002/7483
摘要： A system for dividing a workspace includes a wall designed to divide the workspace into a workspace and an area outside of the workspace. The wall includes a variety of features such as a slit extending horizontally across at least a portion of the wall at a level designed to provide individuals seated within the interior workspace with a constant view of the area outside of the workspace at both an immediate periphery of the wall as well as areas at a distance from the wall. Furthermore, the slit includes dimensions configured to provide individuals located in the area outside of the workspace with a view into the interior workspace when at a distance from the wall and restrict individuals located in the area outside of the workspace from views into the interior workspace when in close proximity to the wall. Also, the wall may include other feature such as a visual shield extending thereabove and a lining formed by a composite construction element.
摘要翻译：用于分割工作空间的系统包括设计成将工作区划分为工作空间和工作区外的区域的墙壁。墙壁包括各种特征，例如水平地延伸穿过壁的至少一部分的狭缝，其水平设计成提供坐在内部工作空间内的个人，在工作空间外部的区域的恒定视图处墙壁以及距离墙壁一定距离的区域。此外，狭缝包括尺寸，其被配置为当距工作空间一定距离时提供位于工作空间外的区域中的个体，并且将位于工作空间外部的区域中的个体限制在内部工作空间内的个体进入内部工作空间靠近墙壁。此外，壁可以包括其他特征，例如在其上延伸的视觉屏蔽物和由复合结构元件形成的衬里。

10. 发明授权

US4856037A Arrangement for exposing semiconductor wafers by means of a synchrotron radiation in lithographic equipment 失效
标题翻译：用于通过平版印刷设备中的同步加速器辐射曝光半导体晶片的布置
公开(公告)号：US4856037A
公开(公告)日：1989-08-08
申请号：US73435
申请日：1987-07-15
申请人： Karl-Heinz Mueller , Hans Betz , Wilhelm Vach , Johann Krenner
发明人： Karl-Heinz Mueller , Hans Betz , Wilhelm Vach , Johann Krenner
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/68
CPC分类号： G03F7/70008 , G03F7/70358 , G03F7/70691 , G03F7/70808
摘要： An arrangement or apparatus for exposing semiconductor wafers by means of a synchrotron radiation, wherein a mask and semiconductor wafer are movable in a common, perpendicular direction relative to the direction of the X-ray beam in order to sweep an exposure field. The optical devices are provided for observing adjustment marks on the mask and semiconductor wafer to create control signals for the adjustment of the mask and wafer relative to each other. The beam radiation is conducted in a tube having a rectangular slot-shaped radiation window, which is arranged immediately adjacent to the mask and the optical devices are provided next to the beam feed tube and aligned to a part of the exposure fields lying outside of the impingement area of the beam leaving the radiation window.
摘要翻译：一种用于通过同步加速器辐射曝光半导体晶片的装置或装置，其中掩模和半导体晶片可相对于X射线束的方向在共同的垂直方向上移动，以便扫描曝光场。提供光学器件用于观察掩模和半导体晶片上的调整标记，以创建用于调整掩模和晶片相对于彼此的控制信号。光束辐射在具有矩形槽形辐射窗口的管中传导，其被布置成与掩模紧邻，并且光学装置设置在光束馈送管旁边，并且与位于外部的曝光区域的一部分对准离开辐射窗的光束的冲击区域。

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