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    • 2. 发明申请
    • Method of producing metal-oxide film
    • 金属氧化物膜的制造方法
    • US20080006522A1
    • 2008-01-10
    • US11600459
    • 2006-11-16
    • Kaoru Yamakawa
    • Kaoru Yamakawa
    • C23C14/32
    • C23C14/0036C23C14/046C23C14/081C23C14/345
    • The method is capable of making a thickness of the metal oxide-film on an edge section in a surface of a work nearly equal to that on a flat section therein so as to uniformly form the metal oxide-film can be on the surface of the work. The method of producing a metal-oxide film comprises the steps of: introducing a sputtering gas and oxygen into a spattering chamber, in which a metal member and a work are mutually faced; and applying DC voltage to the metal member and applying high-frequency negative voltage to the work so as to oxidize the metal member and form a sputtered film on a surface of the work.
    • 该方法能够使工件表面上的边缘部分上的金属氧化物膜的厚度与其中的平坦部分上的厚度大致相等,以便均匀地形成金属氧化物膜可以在 工作。 制造金属氧化物膜的方法包括以下步骤:将溅射气体和氧气引入到金属构件和工件相互面对的溅射室中; 向该金属构件施加直流电压,对工件施加高频负电压,使金属构件氧化,并在工件表面形成溅射膜。