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1. 发明申请

US20120141012A1 APPARATUS AND METHOD FOR INSPECTING DEFECT 有权
标题翻译：检测缺陷的装置和方法
公开(公告)号：US20120141012A1
公开(公告)日：2012-06-07
申请号：US13378427
申请日：2010-06-18
申请人： Kaoru Sakai , Takahiro Urano
发明人： Kaoru Sakai , Takahiro Urano
IPC分类号： G06K9/62
CPC分类号： H01L22/20 , G01N21/9501 , G01N21/956 , G06T7/001 , G06T2207/20212 , G06T2207/30148 , H01L22/12
摘要： A defect inspection apparatus includes an illumination optical system which irradiates an inspection subject under a predetermined optical condition, a detection optical system which obtains image data by detecting a scattered light from the inspection subject irradiated by the illumination optical system, and an image processing unit provided with a defect candidate detection unit which detects defect candidates with respect to plural image data obtained by the detection optical system under different conditions, and a post-inspection processing unit which executes a defect determination by integrating the defect candidates with respect to the plural image data.
摘要翻译：缺陷检查装置包括：在预定的光学条件下照射检查对象的照明光学系统;检测光学系统，其通过检测由照明光学系统照射的检查对象物的散射光获得图像数据;以及图像处理单元，检测处理单元，其利用检测光学系统在不同条件下获得的多个图像数据检测缺陷候选的缺陷候选检测单元，以及检查后处理单元，其通过对所述多个图像数据进行积分而执行缺陷候选。

2. 发明授权

US08737718B2 Apparatus and method for inspecting defect 有权
标题翻译：用于检查缺陷的装置和方法
公开(公告)号：US08737718B2
公开(公告)日：2014-05-27
申请号：US13378427
申请日：2010-06-18
申请人： Kaoru Sakai , Takahiro Urano
发明人： Kaoru Sakai , Takahiro Urano
IPC分类号： G06K9/62
CPC分类号： H01L22/20 , G01N21/9501 , G01N21/956 , G06T7/001 , G06T2207/20212 , G06T2207/30148 , H01L22/12
摘要： A defect inspection apparatus includes an illumination optical system which irradiates an inspection subject under a predetermined optical condition, a detection optical system which obtains image data by detecting a scattered light from the inspection subject irradiated by the illumination optical system, and an image processing unit provided with a defect candidate detection unit which detects defect candidates with respect to plural image data obtained by the detection optical system under different conditions, and a post-inspection processing unit which executes a defect determination by integrating the defect candidates with respect to the plural image data.
摘要翻译：缺陷检查装置包括：在预定的光学条件下照射检查对象的照明光学系统;检测光学系统，其通过检测由照明光学系统照射的检查对象物的散射光获得图像数据;以及图像处理单元，检测处理单元，其利用检测光学系统在不同条件下获得的多个图像数据检测缺陷候选的缺陷候选检测单元，以及检查后处理单元，其通过对所述多个图像数据进行积分而执行缺陷候选。

3. 发明申请

US20120229618A1 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20120229618A1
公开(公告)日：2012-09-13
申请号：US13387369
申请日：2010-08-30
申请人： Takahiro Urano , Kaoru Sakai , Toshifumi Honda
发明人： Takahiro Urano , Kaoru Sakai , Toshifumi Honda
IPC分类号： G06K9/60 , H04N7/18
CPC分类号： G01N21/9501 , G01N21/95607 , G01N2021/8825 , G01N2021/9513 , G06T7/0004 , G06T2207/10061 , G06T2207/30121 , G06T2207/30148 , H01L22/12
摘要： Disclosed is a defect inspection device that has an illumination optical system; a detection optical system; and a processing unit which includes a defect feature quantity calculation unit that calculates the feature quantities of each defect candidate, a defect candidate grouping unit that groups the aforementioned defect candidates on the basis of the feature quantities, a defect classification evaluation value calculation unit that calculates defect classification evaluation values for the aforementioned defect candidates, a defect classification evaluation value updating unit that, on the basis of instructions, updates the evaluation values, a defect classification threshold determination unit that, on the basis of evaluation valued updated by the aforementioned defect classification evaluation value updating unit, determines a classification boundary that is a threshold for classifying defect types of the aforementioned defect candidates, and a defect detection unit that detects defects using the thresholds.
摘要翻译：公开了一种具有照明光学系统的缺陷检查装置，检测光学系统; 以及处理单元，其包括：缺陷特征量计算单元，其计算每个缺陷候选的特征量;缺陷候选分组单元，其基于所述特征量对所述缺陷候选进行分组;缺陷分类评估值计算单元，其计算上述缺陷候补的缺陷分类评价值，基于指示更新评价值的缺陷分类评价值更新部，基于上述缺陷分类更新的评价值的缺陷分类阈值判定部评估值更新单元，确定作为用于分类上述缺陷候选的缺陷类型的阈值的分类边界，以及使用阈值来检测缺陷的缺陷检测单元。

4. 发明授权

US09075026B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US09075026B2
公开(公告)日：2015-07-07
申请号：US13387369
申请日：2010-08-30
申请人： Takahiro Urano , Kaoru Sakai , Toshifumi Honda
发明人： Takahiro Urano , Kaoru Sakai , Toshifumi Honda
IPC分类号： G06K9/60 , G01N21/95 , G06T7/00 , G01N21/956 , G01N21/88 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/95607 , G01N2021/8825 , G01N2021/9513 , G06T7/0004 , G06T2207/10061 , G06T2207/30121 , G06T2207/30148 , H01L22/12
摘要： Disclosed is a defect inspection device that has an illumination optical system; a detection optical system; and a processing unit which includes a defect feature quantity calculation unit that calculates the feature quantities of each defect candidate, a defect candidate grouping unit that groups the aforementioned defect candidates on the basis of the feature quantities, a defect classification evaluation value calculation unit that calculates defect classification evaluation values for the aforementioned defect candidates, a defect classification evaluation value updating unit that, on the basis of instructions, updates the evaluation values, a defect classification threshold determination unit that, on the basis of evaluation valued updated by the aforementioned defect classification evaluation value updating unit, determines a classification boundary that is a threshold for classifying defect types of the aforementioned defect candidates, and a defect detection unit that detects defects using the thresholds.
摘要翻译：公开了一种具有照明光学系统的缺陷检查装置，检测光学系统; 以及处理单元，其包括：缺陷特征量计算单元，其计算每个缺陷候选的特征量;缺陷候选分组单元，其基于所述特征量对所述缺陷候选进行分组;缺陷分类评估值计算单元，其计算上述缺陷候补的缺陷分类评价值，基于指示更新评价值的缺陷分类评价值更新部，基于上述缺陷分类更新的评价值的缺陷分类阈值判定部评估值更新单元，确定作为用于分类上述缺陷候选的缺陷类型的阈值的分类边界，以及使用阈值来检测缺陷的缺陷检测单元。

5. 发明授权

US08427634B2 Defect inspection method and apparatus 失效
标题翻译：缺陷检查方法和装置
公开(公告)号：US08427634B2
公开(公告)日：2013-04-23
申请号：US12647246
申请日：2009-12-24
申请人： Yuta Urano , Akira Hamamatsu , Shunji Maeda , Kaoru Sakai
发明人： Yuta Urano , Akira Hamamatsu , Shunji Maeda , Kaoru Sakai
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/4738 , G01N21/956
摘要： A pattern inspection apparatus is provided to compare images of regions, corresponding to each other, of patterns that are formed so as to be identical and judge that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.
摘要翻译：提供了一种图案检查装置，用于将形成为相同的图案的彼此对应的区域的图像进行比较，并判断图像中的非重合部分是缺陷。图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确地检测缺陷。

6. 发明授权

US08275190B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US08275190B2
公开(公告)日：2012-09-25
申请号：US13214420
申请日：2011-08-22
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the defect detection process performed by the defect detection unit is performed asynchronously with an image acquisition process that is performed by the image acquisition unit.
摘要翻译：一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理，其中由缺陷检测单元执行的缺陷检测处理与图像获取处理异步地执行，由图像获取单元执行。

7. 发明授权

US08005292B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US08005292B2
公开(公告)日：2011-08-23
申请号：US12876699
申请日：2010-09-07
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect detection unit is performed off-line asynchronously with an image acquisition process that is performed by the image acquisition unit.
摘要翻译：一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理和缺陷分类处理，其中由缺陷检测单元执行的处理异步执行具有由图像获取单元执行的图像获取处理。

8. 发明授权

US07903249B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US07903249B2
公开(公告)日：2011-03-08
申请号：US12366003
申请日：2009-02-05
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
IPC分类号： G01N21/55
CPC分类号： G01N21/95684 , G01N2021/9513
摘要： An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor.
摘要翻译：用于检查缺陷的装置和方法包括：照射器，用于将通过光源发射的具有从光源发射的紫外线波长的光通过反射物镜照射到样本上;成像器，用于形成从样本反射的光的图像，至少通过反射物镜的照明器的光，用图像传感器检测由成像器形成的光的图像的检测器，以及用于处理从检测器输出的信号以检测缺陷的图像处理器在标本上。图像传感器是反面照射型图像传感器。

9. 发明授权

US07792352B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US07792352B2
公开(公告)日：2010-09-07
申请号：US12123160
申请日：2008-05-19
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： An apparatus for inspecting pattern defects, the apparatus including: a defect candidate extraction unit configured to perform a defect candidate extraction process by comparing a detected image signal with a reference image signal; and a defect detection unit configured to perform a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect candidate extraction unit and/or the defect detection unit are performed asynchronously with an image acquisition process.
摘要翻译：一种用于检查图案缺陷的装置，所述装置包括：缺陷候选提取单元，被配置为通过将检测到的图像信号与参考图像信号进行比较来执行缺陷候选提取处理; 以及缺陷检测单元，被配置为基于包含由缺陷候选提取单元提取的缺陷候选的部分图像执行缺陷检测处理和缺陷分类处理，其中由缺陷候选提取单元执行的处理和/或缺陷检测单元与图像获取处理异步地执行。

10. 发明授权

US07711178B2 Pattern inspection method and its apparatus 有权
标题翻译：图案检验方法及其装置
公开(公告)号：US07711178B2
公开(公告)日：2010-05-04
申请号：US11869217
申请日：2007-10-09
申请人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Hiroshi Goto , Masayuki Kuwabara , Naoya Takeuchi
发明人： Kaoru Sakai , Shunji Maeda , Takafumi Okabe , Hiroshi Goto , Masayuki Kuwabara , Naoya Takeuchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T7/0002 , G06T7/32 , G06T7/33 , G06T2207/30148
摘要： A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.
摘要翻译：一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中，选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案，通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙，到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较，并提取差异作为缺陷候选。

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