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    • 1. 发明授权
    • Dual frequency excitation of plasma for film deposition
    • 用于膜沉积的等离子体的双频激发
    • US06024044A
    • 2000-02-15
    • US948279
    • 1997-10-09
    • Kam S. LawRobert M. RobertsonQuanyuan ShangJeff OlsenCarl Sorensen
    • Kam S. LawRobert M. RobertsonQuanyuan ShangJeff OlsenCarl Sorensen
    • C23C16/505C23C16/509C23C16/517H01J37/32H01L21/205C23C16/50
    • H01J37/32165C23C16/5096C23C16/517
    • An apparatus deposits a high quality film onto a transparent substrate in a reactor. The transparent substrate may be made of glass, quartz or a polymer such as plastic. The transparent substrate is heated in a process chamber and a process gas stream is introduced into the process chamber. The apparatus generates a high frequency power output and a low frequency power output from a high frequency power supply and a low frequency power supply, respectively. The high frequency power output is generated at a frequency of about thirteen megahertz or more, and at a power from about one to five kilowatts, while the low frequency power output is generated at a frequency of about two megahertz or less, and at a power from about 300 to two kilowatts. The high frequency power output and the low frequency power output are superimposed and used to excite a plasma from the process gas stream at a pressure between about 0.4 Torr and 3 Torr, and at a temperature between about 250.degree. C. and 450.degree. C. to deposit a smooth thin film onto the transparent substrate.
    • 一种装置将高质量的膜沉积在反应器中的透明基板上。 透明基材可以由玻璃,石英或聚合物如塑料制成。 将透明基板在处理室中加热并将工艺气体流引入处理室。 该装置分别从高频电源和低频电源产生高频功率输出和低频功率输出。 高频功率输出以大约十三兆赫或更高的频率和大约一到五千瓦的功率产生,而低频功率输出是以大约2兆赫或更小的频率产生的 约300至2千瓦。 高频功率输出和低频功率输出被叠加并用于在约0.4托和3托之间的压力下以及在约250℃至450℃之间的温度下从工艺气流中激发等离子体。 以将平滑的薄膜沉积在透明基板上。
    • 3. 发明授权
    • Components for fiber-optic matrix display systems
    • 光纤矩阵显示系统的组件
    • US5818998A
    • 1998-10-06
    • US625729
    • 1996-03-29
    • Laura Lee HarrisJeff Olsen
    • Laura Lee HarrisJeff Olsen
    • G09F9/305G02B6/04
    • G09F9/305
    • A lightweight display system (10) includes an output matrix (34) of output terminals (28) of optical conductors (30) supported on a preferably flexible substrate (16) by terminal housings (20). Optical conductors (30) are collated into an input matrix (34) that receives light containing a source image (39) from projector (40). Light propagates through optical conductors (30) and exits output terminals (28) to form an enlarged display image (31) that corresponds to the source image. Preferred embodiments of display screen (12) are collapsible and facilitate transportation and reassembly.
    • 轻量级显示系统(10)包括通过端子壳体(20)支撑在优选柔性基板(16)上的光导体(30)的输出端子(28)的输出矩阵(34)。 光导体(30)被对照成从投影仪(40)接收包含源图像(39)的光的输入矩阵(34)。 光通过光导体(30)传播并离开输出端(28)以形成对应于源图像的放大显示图像(31)。 显示屏(12)的优选实施例是可折叠的并且便于运输和重新组装。
    • 4. 发明授权
    • Method of forming silicon oxy-nitride films by plasma-enhanced chemical vapor deposition
    • 通过等离子体增强化学气相沉积法形成氮氧化硅薄膜的方法
    • US06207304B1
    • 2001-03-27
    • US09347067
    • 1999-07-02
    • Kam LawJeff Olsen
    • Kam LawJeff Olsen
    • H01L2136
    • C23C16/45565C23C16/308C23C16/5096H01L21/3144H01L21/3145Y10T428/24942
    • An improved method of producing silicon oxy-nitride films is provided by utilizing a reactant gas mixture of silane, nitrous oxide and nitrogen at a low deposition temperature of less than 250° C. by flowing the reactant gas mixture through a gas inlet manifold which is also an upper electrode in a plasma-enhanced chemical vapor deposition chamber. The gas inlet manifold is the upper plate of a parallel plate plasma chamber for communicating the reactant gas into the chamber. The plate has a plurality of apertures, each comprising an outlet at a chamber or processing side of the plate and an inlet spaced from the processing side, with the outlet being larger than the inlet for enhancing the dissociation and reactivity of the gas.
    • 通过在低于250℃的低沉积温度下利用硅烷,一氧化二氮和氮的反应气体混合物,通过使反应气体混合物流过气体入口歧管来提供改进的氮氧化硅膜的方法, 也是等离子体增强化学气相沉积室中的上电极。 气体入口歧管是用于将反应气体连通到室中的平行板等离子体室的上板。 板具有多个孔,每个孔包括在板的室或处理侧的出口和与处理侧间隔开的入口,出口大于入口以增强气体的解离和反应性。
    • 5. 发明授权
    • Method and apparatus for generating uniform illumination
    • 用于产生均匀照明的方法和装置
    • US5428365A
    • 1995-06-27
    • US219618
    • 1994-03-29
    • Laura HarrisJeff Olsen
    • Laura HarrisJeff Olsen
    • G02B6/00F21V8/00G02B6/06G09F9/305G09G3/22G09G3/34
    • G09F9/305G02B6/0008G02B6/06G09F9/3026F21V2200/15
    • A reflector assembly (60) for a fiber-optic matrix display system (10) designed to improve the coupling efficiency of luminous energy between a light emitting element (52) and an input matrix (26) and to provide one or more input matrices (26) with substantially uniform illumination over their respective surfaces. The reflector assembly (60) preferably includes an input aperture for receiving luminous energy from the light emitting element (52); a larger output aperture (70) through which the luminous energy exits the reflector assembly (60) to impinge on the imaging medium and the input terminals (28) of the input matrix (26); and a reflector head (64) positioned between the input aperture (68) and the output aperture (70) and having a right rectangular pyramidal, hollow frustum shape preferably designed according to the formula ##EQU1## where n.sub.1 is the refractive index of optical conductor cores 82, n.sub.2 is the refractive index of optical conductor claddings 84, and .THETA..sub.RD is the value of angles 86 and 88 by which the respective planar surfaces 72 and 74 diverge from axis 90.
    • 一种用于光纤矩阵显示系统(10)的反射器组件(60),其被设计用于提高发光元件(52)和输入矩阵(26)之间的能量的耦合效率,并提供一个或多个输入矩阵( 26)在它们各自的表面上具有基本均匀的照明。 反射器组件(60)优选地包括用于从发光元件(52)接收光能的输入孔。 较大的输出孔径(70),所述光能通过所述输出孔径离开所述反射器组件(60)以撞击所述输入矩阵(26)的所述成像介质和所述输入端子(28); 和位于所述输入孔(68)和所述输出孔(70)之间的反射器头(64),并且具有根据公式优选设计的正方形金字塔状的中空截头圆锥​​形状,其中n1是光导体的折射率 芯82,n2是光导体包层84的折射率,THETA RD是相应的平面72和74从轴线90发散的角度86和88的值。