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1. 发明授权

EP2657957B1 VAPORIZER 有权
公开(公告)号：EP2657957B1
公开(公告)日：2020-03-11
申请号：EP11849995.3
申请日：2011-12-21
申请人： Kabushiki Kaisha Watanabe Shoko , Kusuhara, Masaki , Umeda, Masaru , Toda, Masayuki
发明人： KUSUHARA, Masaki , UMEDA, Masaru , TODA Masayuki , FUKAGAWA, Mitsuru
IPC分类号： C23C16/448 , C23C16/455 , B01D1/00

2. 发明公开

EP2657957A1 VAPORIZER 有权
标题翻译： VERDAMPFER
公开(公告)号：EP2657957A1
公开(公告)日：2013-10-30
申请号：EP11849995.3
申请日：2011-12-21
申请人： Kabushiki Kaisha Watanabe Shoko , Kusuhara, Masaki , Umeda, Masaru , Toda, Masayuki
发明人： KUSUHARA, Masaki , UMEDA, Masaru , TODA Masayuki , FUKAGAWA, Mitsuru
IPC分类号： H01L21/31 , C23C16/448
CPC分类号： C23C16/4481 , B01D1/00
摘要： Provided is a vaporizer that can reduce ripples, particles, and a carbon content of a film and can supply a raw material capable of forming a film having a desired composition. Moreover, a vaporizer is obtained that sufficient vaporization can be performed without heating more than necessary and temperature management can be facilitated. A vaporizer includes a vaporizer main body (3) into which a carrier gas having a film forming liquid material dispersed is introduced and a heater main body (4) disposed in the vaporizer main body (3). The shape of the inlet portion of the heater main body is in a cone.
摘要翻译：提供一种蒸发器，其可以减少膜的波纹，颗粒和碳含量，并且可以提供能够形成具有期望组成的膜的原料。此外，获得能够在不需要加热的情况下进行充分蒸发的蒸发器，并且可以促进温度管理。蒸发器包括引入分散有成膜液体材料的载气的蒸发器主体（3）和设置在蒸发器主体（3）中的加热器主体（4）。加热器主体的入口部分的形状为锥形。

3. 发明公开

EP2154711A1 VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS 有权
标题翻译： VERDAMPFUNGSVORRICHTUNG MIT VERDAMPFUNGSVORRICHTUNG AUSGESTATTETE FILMBILDUNGSVORRICHTUNG
公开(公告)号：EP2154711A1
公开(公告)日：2010-02-17
申请号：EP08752777.6
申请日：2008-05-15
申请人： Kabushiki Kaisha Watanabe Shoko , Toda, Masayuki
发明人： TODA, Masayuki , KUSUHARA, Masaki , UMEDA, Masaru , FUKAGAWA, Mitsuru
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/407 , C23C16/4486
摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.
摘要翻译：由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构，所以该装置难以定位喷嘴，并且该装置不能精确地控制与要发放到蒸发单元中的原料溶液混合的载气的压力和流速，因此难以高精度地控制MOCVD膜的组成。多个气体通道设置在平坦的盘形板上。利用这种结构，可以使喷嘴的精确定位变得更容易，并且可以高精度地控制MOCVD膜的组成。

4. 发明公开

EP2682980A1 VAPORIZER, CENTER ROD USED THEREIN, AND METHOD FOR VAPORIZING MATERIAL CARRIED BY CARRIER GAS 审中-公开
标题翻译：蒸发器，中心杆体和方法的车辆由气体带菌材料膨胀
公开(公告)号：EP2682980A1
公开(公告)日：2014-01-08
申请号：EP12752383.5
申请日：2012-02-27
申请人： Kabushiki Kaisha Watanabe Shoko , Toda, Masayuki
发明人： TODA Masayuki , UMEDA, Masaru
IPC分类号： H01L21/31 , C23C16/448
CPC分类号： C23C16/4481
摘要： To obtain a vaporizer in which a plurality of thin film-forming raw material solutions are stably and reliably carried by a carrier gas while being reliably separated within the dispersion unit body and the plurality of thin film-forming raw material solutions are stably vaporized in the subsequent vaporization unit, a center rod used in the vaporizer, and a method for vaporizing raw materials entrained by a carrier gas. A carrier gas introduction bore is formed in the center axis direction of the dispersion unit body. A center rod 10 is inserted in the carrier gas introduction bore so that the interspace between the inner wall of the carrier gas introduction bore and the outer wall of the center rod forms a gas passage. Thin film-forming material supply units formed at multiple points situated midway of the gas passage of the dispersion unit body and supplying thin film-forming materials are provided. The center rod has sealing members 11a and 11b provided in the longitudinal direction of the center rod.
摘要翻译：以获得其中的薄膜形成用原料的解决方案。多个被稳定且可靠地通过载气携带而分散单元主体和的薄膜形成用原料溶液多元性内被可靠地分离在被稳定地蒸发的蒸发器随后的汽化单元，在气化器中使用的中心杆，和用于汽化通过载气夹带的原料的方法。载气导入孔在所述分散部本体的中心轴线方向形成。中心杆10被插入到所述载气导入孔所以没有载气导入孔的内壁和所述中心杆的外壁之间的间隙形成的气体通道。被设置在所述分散单元体的气体通路的多个点情境中途和供给薄膜形成用材料形成的薄膜形成用材料供给单元。所述中心杆具有密封构件11a和在中心杆的纵向方向11B提供。

5. 发明授权

EP2154711B1 VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS 有权
标题翻译：膨胀装置和与膨胀设备EQUIPPED成膜装置
公开(公告)号：EP2154711B1
公开(公告)日：2013-10-16
申请号：EP08752777.6
申请日：2008-05-15
申请人： Kabushiki Kaisha Watanabe Shoko , Toda, Masayuki
发明人： TODA, Masayuki , KUSUHARA, Masaki , UMEDA, Masaru , FUKAGAWA, Mitsuru
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/407 , C23C16/4486
摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.

6. 发明授权

EP2682980B1 VAPORIZER, CENTER ROD USED THEREIN, AND METHOD FOR VAPORIZING MATERIAL CARRIED BY CARRIER GAS 有权
公开(公告)号：EP2682980B1
公开(公告)日：2019-07-31
申请号：EP12752383.5
申请日：2012-02-27
申请人： Kabushiki Kaisha Watanabe Shoko , Toda, Masayuki
发明人： TODA Masayuki , UMEDA, Masaru
IPC分类号： H01L21/31 , C23C16/448

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