专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPH08119955A EPOXY-BASED REACTIVE DILUENT 失效
公开(公告)号：JPH08119955A
公开(公告)日：1996-05-14
申请号：JP28739894
申请日：1994-10-26
申请人： KYOEISHA CHEMICAL
发明人： KUKI YUKIHIRO , TAKENAKA NAOI
IPC分类号： C07D301/24 , C08K5/15 , C08K5/1515 , C08L63/00
摘要： PURPOSE: To obtain an epoxy-based reactive diluent, useful for various coatings, coating agents and adhesives and having high compatibility, diluting properties, a low vapor pressure and low toxicity within a wide temperature range. CONSTITUTION: This compound of the formula [(n) is an integer of 1-10], e.g. 2-ethylhexyl diglycol glycidyl ether, is obtained by adding caustic soda, etc., to an alcohol and epichlorohydrin in the presence a phase-transfer catalyst (a quaternary ammonium salt, a tetravalent phosphonium salt, etc.). Furthermore, 10-30 pts.wt. compound of the formula as a diluent can be mixed with 70-90 pts.wt. general-purpose epoxy resin such as a bisphenol A type epoxy resin and a curing agent such as an aliphatic polyamine in an amount equal to the epoxy equiv. can be blended and utilized for an adhesive, a sealing medium, etc.

2. 发明专利

JPH09157340A NOVEL HEAT-RESISTANT RESIN 失效
公开(公告)号：JPH09157340A
公开(公告)日：1997-06-17
申请号：JP34568295
申请日：1995-12-08
申请人： KYOEISHA CHEMICAL
发明人： KUKI YUKIHIRO , TAKENAKA NAOI
IPC分类号： C08F299/00 , C08F290/00 , C09D4/02 , C09D163/10
摘要： PROBLEM TO BE SOLVED: To obtain a novel heat-resistant resin which has a high glass transition temp. and low moisture absorption and is less likely to create stress and tough by using an epoxy (meth)acrylate resin (BE) having a biphenyl skeleton as a functional polymer material. SOLUTION: The BE resin is represented by formula I (wherein R represents H or methyl; and (n) is an integer of not less than 0) and prepd. by a general epoxy synthetic process. Specifically, it is easily prepd., in the absence of a solvent, by reacting an epoxy resin, with both terminals being glycidyl etherified, with (meth)acrylic acid in the presence of a catalyst (e.g. a quaternary salt or a Lewis base with specific examples thereof including triethylbenzyl chloride) and a polymn. inhibitor (e.g. hydroquinone) at 90 to 100 deg.C for 12 to 15hr. The BE resin may be used, as a photosensitive material, either alone or in combination with other base resin(s) and a reactive diluent for applications such as various coating agents (particularly applications where heat resistance is required), UV coating materials, or resists.

3. 发明专利

JP2000169553A HIGH HEAT RESISTANCE RESIN COMPOSITION 失效
公开(公告)号：JP2000169553A
公开(公告)日：2000-06-20
申请号：JP34960098
申请日：1998-12-09
申请人： KYOEISHA CHEMICAL
发明人： TAKENAKA NAOI
IPC分类号： C08F290/14 , C08G59/20 , C08G59/42
摘要： PROBLEM TO BE SOLVED: To provide high heat resistance resin compositions capable of further raising the Tg of an epoxy (meth)acrylate resin. SOLUTION: High heat resistance resin compositions comprise (a) a (meth) acryloyl group-containing novolak type epoxy resin compound, (b) a carboxyl group-containing (meth)acrylate ester compound, and (c) (i) a radiation radical initiator and (iii) a basic curing agent; (i) a radiation radical initiator, (ii) an organic peroxide and (iii) a basic curing agent; (i) a radiation radical initiator and (iv) a radiation acid generator; or (ii) an organic peroxide and (iii) a basic curing agent.

4. 发明专利

JPH1112345A PRODUCTION OF PARTIALLY (METH)ACRYLATED RESIN EXCELLENT IN PRESERVATION STABILITY AND HAVING PHOTOSENSITIVITY 失效
公开(公告)号：JPH1112345A
公开(公告)日：1999-01-19
申请号：JP18748697
申请日：1997-06-26
申请人： KYOEISHA CHEMICAL
发明人： KUKI YUKIHIRO , TAKENAKA NAOI
IPC分类号： C08G59/17
摘要： PROBLEM TO BE SOLVED: To provide a method for producing the subject resin having photosensitivity excellent in preservation stability, by which a problem in a mixed system is dissolved by using a tertiary phosphine derivative as a catalyst. SOLUTION: (B) A polyfunctional epoxy resin having two or more oxirane rings (preferably glycidyl ether) is reacted with (C) (meth)acrylic acid by using (A) a tertiary phosphine derivative, preferably triphenylphosphine, as a catalyst, and the product is treated with (D) a strong acid ion exchange resin, preferably a sulfonic acid-based ion exchange resin to provide the objective partially (meth) acrylated resin in the method for producing the objective resin. Further, the component B is preferably reacted with the component C so that the proportion of the component C may be 0.1-0.9 eq. per one eq. of the epoxide.

你已经成功收藏专利！

检索式保存成功!

IPRDB