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1. 发明专利

JPH062277B2 失效
公开(公告)号：JPH062277B2
公开(公告)日：1994-01-12
申请号：JP17963085
申请日：1985-08-15
申请人： KURITA WATER IND LTD
发明人： YABE KOICHI , TAKANO MAOMI , GOTO YUKIO
IPC分类号： C02F1/44 , B01D61/58 , C02F1/50 , C02F1/66 , C02F1/68 , C02F9/00

2. 发明专利

JPH081172A TREATMENT OF AMMONIA NITROGEN-CONTAINING WATER 失效
公开(公告)号：JPH081172A
公开(公告)日：1996-01-09
申请号：JP15800194
申请日：1994-06-16
申请人： KURITA WATER IND LTD
发明人： TAKANO MAOMI , NAKAHARA TOSHIJI , TAKABAYASHI YASUHIKO
IPC分类号： C02F1/58 , C02F1/62 , C02F1/72
摘要： PURPOSE:To prevent the lowering of catalytic capacity by adding a nitrite to ammonia nitrogen-containing water to execute catalytic oxidative decomposition in the presence of a noble metal-supported catalyst and preliminarily removing a heavy metal ion in ammonia nitrogen-containing water when ammonia nitrogen is treated to be converted to nitrogen gas. CONSTITUTION:The ammonia nitrogen-containing water guided to a raw water tank 1 is adjusted in its pH to be sent to a chelate resin-packed tower 3 by a pump 2. The treated water from which a heavy metal ion is removed in the chelate resin-packed tower 3 is sent to a conditioning tank 4 to receive the addition of nitrite. Thereafter, the ammonia nitrogen-containing water is sent to a catalyst packed tower 8 packed with a noble metal supported catalyst by a pump 5 while preheated if necessary by a heat exchanger 6 and a heater 7. The treated water wherein ammonia is decomposed and removed in the catalyst-packed tower 8 is sent to a next process through the heat exchanger 6 and a pressure control valve 9. By this constitution, the lowering of catalytic capacity caused by the precipitation of heavy metals on the surface of the catalyst is prevented.

3. 发明专利

JPS6242787A APPARATUS FOR PRODUCING HIGH-PURITY WATER 失效
公开(公告)号：JPS6242787A
公开(公告)日：1987-02-24
申请号：JP17963085
申请日：1985-08-15
申请人： KURITA WATER IND LTD
发明人： YABE KOICHI , TAKANO MAOMI , GOTO YUKIO
IPC分类号： C02F1/44 , B01D61/58 , C02F1/50 , C02F1/66 , C02F1/68 , C02F9/00
摘要： PURPOSE:To permit the continuous production of high-purity water to be widely used in a semiconductor production plant, etc., by providing means for adding a sterilizer and pH adjusting agent, the 1st reverse osmosis membrane separator, means for adding hydrazine, the 2nd reverse osmosis membrane separator, etc. CONSTITUTION:The sterilizer and/or pH adjusting agent are added to the raw water pretreated with activated carbon, etc., in the means 12, 13. The raw water added with the sterilizer and/or pH adjusting agent is subjected to a reverse osmosis membrane treatment in the 1st reverse osmosis membrane separator 2. The hydrazine is added to the permeated water of the separator 2 in the succeeding means 16 and the permeated water of the separator 2 added with the hydrazine is further subjected to the reverse osmosis membrane in the 2nd reverse osmosis membrane separator 3. The permeated water of the separator 3 is taken out in the system 18 and the concd. water of the separator 3 is returned to the raw water supply system of the separator 2 in the system 10. As a result, the high-purity water widely used in the semiconductor production plant, etc., is continuously produced.

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