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    • 8. 发明专利
    • Membrane filtration apparatus and membrane filtration method
    • 膜过滤装置和膜过滤方法
    • JP2013188711A
    • 2013-09-26
    • JP2012057810
    • 2012-03-14
    • Kuraray Co Ltd株式会社クラレ
    • NOBUTO YOSHIKIYAMADA KOJIINOUE KAZUMA
    • C02F1/44B01D63/02
    • Y02W10/37
    • PROBLEM TO BE SOLVED: To provide a membrane filtration apparatus which can be operated for a long period of time by suppressing clogging of a membrane when used for filtering/separating an SS component from a liquid, that is to be treated and contains the SS component, by using the membrane.SOLUTION: A membrane filtration apparatus includes: a membrane filtration unit for separating the SS component from the liquid which is to be treated and contains the SS component; a pressurizing means for supplying the liquid to be treated to the membrane filtration unit; a pipeline (a) for supplying the liquid to be treated to the pressurizing means; a pipeline (b) for supplying the pressurized liquid to be treated to the membrane filtration unit; a pipeline (c) for withdrawing the SS component-separated treated liquid from the membrane filtration unit; and a pressure fluctuation means for cyclically fluctuating the supply pressure of the liquid, which is to be treated and supplied to the membrane filtration unit. The pressure fluctuation means and/or the pressurizing means are controlled so that the supply pressure of the liquid to be treated is fluctuated in ≥±5% of the mean differential pressure from the center thereof in the cycle of 0.5-5 seconds.
    • 要解决的问题:提供一种膜过滤装置,其可以通过在用于从要处理的液体中过滤/分离SS成分并且含有SS成分的情况下抑制膜的堵塞而长时间操作 膜过滤装置包括:膜过滤单元,用于将SS成分与待处理的液体分离并含有SS成分; 用于将待处理液体供给到膜过滤单元的加压装置; 用于将待处理液体供给到加压装置的管线(a) 用于将被处理的加压液体供给到膜过滤单元的管道(b) 用于从所述膜过滤单元中取出SS成分分离处理液的管道(c) 以及用于使被处理并供给到膜过滤单元的液体的供给压力循环变动的压力波动装置。 控制压力波动装置和/或加压装置,使得待处理液体的供给压力在0.5-5秒的循环中从平均压差的±5%波动。
    • 9. 发明专利
    • Washing apparatus of silicon sludge and recovery method of silicon
    • 硅污泥的清洗装置和硅的回收方法
    • JP2014019603A
    • 2014-02-03
    • JP2012159232
    • 2012-07-18
    • Kuraray Co Ltd株式会社クラレ
    • NOBUTO YOSHIKIINOUE KAZUMANISHIDA TAKAHARUIWAI NOBUAKIHASHIMOTO MUNEYUKI
    • C01B33/02C02F1/44C02F11/00
    • PROBLEM TO BE SOLVED: To provide a washing apparatus of silicon sludge and a recovery method of silicon that can recover high-purity silicon from silicon sludge while reducing an amount of water to be used in washing.SOLUTION: A washing apparatus 1 of silicon sludge includes a plurality of separation units comprising a washing tank to hold a dispersion liquid having silicon particles and organic substances dispersed in water, and a dehydrating part for dehydrating the dispersion liquid supplied from the washing tank to separate a material containing the silicon particles from a solution containing at least part of the organic substances and water. The separation units 11, 12, 13, 14 are connected in series. In the washing apparatus 1, water is used to disperse the silicon particles and the organic substances in a washing tank 24 of the most downstream separation unit 14, while in washing tanks 21, 22, 23 of the other separation units 11, 12, 13, a solution separated by dehydration in the immediately downstream separation unit is used to disperse the silicon particles and the organic substances.
    • 要解决的问题:提供硅污泥的洗涤装置和可从硅污泥中回收高纯硅的硅的回收方法,同时减少洗涤中使用的水量。溶液:硅污泥的洗涤装置1 包括多个分离单元,包括:洗涤槽,用于容纳分散有硅颗粒的分散液和分散在水中的有机物;以及脱水部,用于使从洗涤槽供给的分散液脱水,从含有硅颗粒的材料中分离出溶液 含有至少一部分有机物质和水。 分离单元11,12,13,14串联连接。 在洗涤装置1中,使用水将硅粒子和有机物质分散在最下游分离部14的洗涤槽24中,同时在其他分离部11,12,13的洗涤槽21,22,23中 使用在紧下游分离单元中通过脱水分离的溶液来分散硅颗粒和有机物质。
    • 10. 发明专利
    • Method and apparatus for recovering silicon
    • 回收硅的方法和装置
    • JP2012180255A
    • 2012-09-20
    • JP2011045722
    • 2011-03-02
    • Kuraray Co Ltd株式会社クラレ
    • INOUE KAZUMAIWASAKI HIDEJIINAO YUICHIROKOMATSU KENSAKU
    • C01B33/037B03B5/28B03B9/06C02F11/00C02F11/12
    • Y02W30/20Y02W30/524
    • PROBLEM TO BE SOLVED: To provide a method and an apparatus for recovering silicon by refining silicon chips to which carbon-based impurities adhere, and which are contained in waste slurry or its concentrated portion discharged by cutting or polishing a silicon block or a silicon wafer.SOLUTION: This method for recovering silicon by refining silicon chips to which carbon-based impurities adhere has an exfoliation process for exfoliating impurities adhering to silicon chips from the silicon chips, and a separation process for separating the silicon chips from the exfoliated impurities. In the exfoliation process, the silicon chips are irradiated with an ultrasonic wave to exfoliate impurities from the silicon chips, and thereafter in the separation process, the silicon chips irradiated with the ultrasonic wave are separated from the exfoliated impurities. A recovery apparatus comprising an exfoliation apparatus including an ultrasonic wave generation means, and a separation device is also provided.
    • 要解决的问题:提供一种用于通过精炼硅基杂质附着的硅片来回收硅并通过切割或抛光硅块排出废弃物浆料或其浓缩部分而包含的方法和装置,或者 硅晶片。 解决方案:用于通过精炼硅基杂质的硅芯片来回收硅的方法具有剥离硅芯片附着于硅片上的杂质的剥离工艺,以及用于将硅片与剥离的杂质分离的分离方法 。 在剥离处理中,利用超声波照射硅芯片,从硅片剥离杂质,然后在分离工序中,用超声波照射的硅芯片与剥离的杂质分离。 还提供一种包括包括超声波产生装置的剥离装置和分离装置的恢复装置。 版权所有(C)2012,JPO&INPIT