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1. 发明申请

WO2009134031A3 RIGID DUAL-SERVO NANO STAGE 审中-公开
标题翻译：刚性双伺服纳诺舞台
公开(公告)号：WO2009134031A3
公开(公告)日：2010-02-18
申请号：PCT/KR2009002015
申请日：2009-04-17
申请人： KOREA IND TECH INST , KANG EUN GOO , CHOI YOUNG JAE , LEE SEOK WOO , LEE SANG MOO , NAM KYUNG TAE , JI SANG HOON
发明人： KANG EUN GOO , CHOI YOUNG JAE , LEE SEOK WOO , LEE SANG MOO , NAM KYUNG TAE , JI SANG HOON
IPC分类号： H01L21/677
CPC分类号： B28D5/0082 , H02N2/02 , H02N2/04
摘要： The present invention concerns a rigid, dual-servo nano stage, which allows for finer movement and comprises a moving platform of improved rigidity. A stage according to one aspect of the present invention is comprised of a work platform whereupon the object to be worked on is placed, a motor that provides rotary power, a shaft that moves said work platform while being rotated by said motor, a shaft geared with said work platform and a motor that rotates said shaft. Said stage also comprises a linearly-moving part in which a hollow is formed, into which one end of said shaft is inserted, provided between said shaft and motor, which moves said shaft linearly in the axial direction by expanding and contracting, and a telescopic part that expands and contracts by same distance as said shaft has been moved by said linearly-moving part.
摘要翻译：本发明涉及刚性的双伺服纳米级，其允许更精细的运动并且包括具有改进的刚性的移动平台。根据本发明的一个方面的舞台包括放置待加工物体的工作平台，提供旋转动力的电动机，在由所述电动机旋转的同时使所述工作平台移动的轴，轴齿轮所述工作平台和旋转所述轴的电动机。所述台架还包括直线运动部件，其中形成有所述轴的一端插入的中空部，设置在所述轴和马达之间，所述轴和马达通过伸缩收缩而沿轴向线性移动所述轴; 通过所述线性移动部件使所述轴伸展和收缩相同距离的部分。

2. 发明公开

EP2299483A4 RIGID DUAL-SERVO NANO STAGE 有权
标题翻译： RIGGED DOUBLE SERVO NANO BREED
公开(公告)号：EP2299483A4
公开(公告)日：2013-04-03
申请号：EP09738937
申请日：2009-04-17
申请人： KOREA IND TECH INST
发明人： KANG EUN GOO , CHOI YOUNG JAE , LEE SEOK WOO , LEE SANG MOO , NAM KYUNG TAE , JI SANG HOON
IPC分类号： H01L21/677 , H02N2/02 , H02N2/04
CPC分类号： B28D5/0082 , H02N2/02 , H02N2/04

3. 发明授权

KR100786634B1 GRINDING DEVICE AND ARRANGING METHOD FOR CHUCKING PINS OF THE SAME 有权
标题翻译：研磨装置及其固定方法
公开(公告)号：KR100786634B1
公开(公告)日：2007-12-18
申请号：KR20060069361
申请日：2006-07-24
申请人： KOREA IND TECH INST
发明人： LEE SEOK WOO , CHOI HON ZONG , CHOI YOUNG JAE , RYU KWANG YEOL , KANG EUN GOO
IPC分类号： B24B41/06 , B24B5/02 , B24B5/04 , B24B41/00
CPC分类号： B24B5/06 , B24B41/06 , B24B49/00
摘要： A grinding device and an arranging method for chucking pins thereof are provided to predict arrangement state of chucking pins directly and without separation of ferrule, and to predict arrangement state of chucking pins exactly by measuring data related to an object for grinding, and to move chucking pins precisely. A grinding device comprises: a pair of chucking pins(110,130) supporting both ends of an object rotatably, a grinding unit grinding the object, a measuring unit(700) predicting arrangement state of the chucking pins by measuring at least one of change of an outer diameter of the object and the force applied to the object while the object is grinded, and a transfer unit(910,930) changing relative positions of the chucking pins in response to the arrangement state of the chucking pins predicted by the measuring unit.
摘要翻译：提供了研磨装置和夹紧销的布置方法，以直接预测夹紧销的布置状态并且不分离套圈，并且通过测量与用于研磨的物体相关的数据来精确地预测夹紧销的布置状态，并且移动夹紧针脚精确。一种研磨装置，包括：可旋转地支撑物体的两端的一对夹紧销（110,130），研磨所述物体的研磨单元;测量单元（700），其通过测量所述夹紧销的变化中的至少一个来预测所述夹紧销的布置状态物体的外径和在被研磨物体时施加到物体的力;以及传送单元（910,930），其响应于由测量单元预测的夹紧销的布置状态改变夹紧销的相对位置。

4. 发明授权

KR100663699B1 TRANSMISSION JOINT APPARATUS FOR NANO RESOLUTION STAGE 无效
标题翻译：用于纳米解析阶段的传输联合装置
公开(公告)号：KR100663699B1
公开(公告)日：2007-01-05
申请号：KR20060062358
申请日：2006-07-04
申请人： KOREA IND TECH INST
发明人： HONG WON PYO , KANG EUN GOO , CHOI HON ZONG , LEE SEOK WOO
IPC分类号： H01L21/02 , B82B3/00 , H01L21/00 , H01L21/027
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70808
摘要： A coupling unit composed of joining a stage with a driving unit removes an indefinite error due to displacement in a vertical direction and a diagonal direction of a ball screw by coupling a moving block and the stage as using a first coupling unit and a second coupling unit. A pair of first coupling units(110) are arranged to have a symmetrical structure to each other and be slid. The first coupling units are respectively contacted to front side/back side of a moving block(230) moved by a rotation of a ball screw(220). A pair of second coupling units(120) support the first coupling unit to be moved. An end of the second coupling unit is connected by the first coupling unit and a ball joint structure. The other end of the second coupling unit is fixed on a bracket formed on a stage(210). The coupling units have plural balls(111) that are contacted to the front side/the back side of the moving block and then slid.
摘要翻译：通过将平台与驱动单元接合而构成的联接单元通过使用第一联接单元和第二联接单元联接移动块和台来消除由于滚珠丝杠的垂直方向和对角线方向的位移而产生的无限大误差。一对第一联接单元（110）被布置成具有彼此对称的结构并且被滑动。第一联接单元分别接触通过滚珠丝杠（220）的旋转而移动的移动块（230）的前侧/后侧。一对第二联接单元（120）支撑要移动的第一联接单元。第二联接单元的端部通过第一联接单元和球接头结构连接。第二联接单元的另一端固定在形成在平台（210）上的托架上。联接单元具有与移动块的前侧/后侧接触然后滑动的多个球（111）。

5. 发明专利

DE112012002175T5 Fertigstellungsvorrichtung und Verfahren, die/das einen Elektronenstrahl und einen lonenstrahl verwendet 未知
公开(公告)号：DE112012002175T5
公开(公告)日：2014-03-06
申请号：DE112012002175
申请日：2012-10-04
申请人： KOREA IND TECH INST
发明人： LEE SEOK SOO , CHOI YOUNG JAE , LEE DONG YOON , KANG EUN GOO
IPC分类号： H01J37/305 , B23K15/00
摘要： Es ist eine Fertigstellungsvorrichtung und ein Fertigstellungsverfahren unter Verwendung eines Elektronenstrahls und eines Ionenstrahls offenbart. Die Fertigstellungsvorrichtung umfasst: ein Podest, auf dem ein bearbeitetes Objekt angeordnet ist, eine Kammer, die das Podest umgibt und einen Innenraum der Kammer in einem Vakuumzustand hält; einen Elektronenstrahlgenerator, der an einer Seite der Kammer angeordnet ist, und der konfiguriert ist, einen Elektronenstrahl auf das bearbeitete Objekt einzustrahlen; und einen Ionenstrahlgenerator, der konfiguriert ist, eine Oberfläche des bearbeiteten Objekts durch Einstrahlen eines Ionenstrahls auf das bearbeitete Objekt zu bearbeiten, auf das der Elektronenstrahl eingestrahlt ist.

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