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1. 发明申请

WO2011027973A3 LIQUID MEDIUM PLASMA DISCHARGE GENERATING APPARATUS 审中-公开
标题翻译：液体中等离子体放电发生装置
公开(公告)号：WO2011027973A3
公开(公告)日：2011-04-28
申请号：PCT/KR2010004789
申请日：2010-07-21
申请人： KOREA BASIC SCIENCE INST , SEOK DONG CHAN , LOH TAI HYEOP , YOO SEUNG RYUL , HONG YONG CHEOL , LEE BONG JU
发明人： SEOK DONG CHAN , LOH TAI HYEOP , YOO SEUNG RYUL , HONG YONG CHEOL , LEE BONG JU
IPC分类号： H05H1/34
CPC分类号： H05H1/2406 , H05H2001/2412
摘要： The present invention relates to a liquid medium plasma discharge generating apparatus, and has the aim of providing a microtube liquid medium plasma discharge generating apparatus, capable of applying a high electric field even with low wattage by minimizing conduction current, by filling a liquid medium in a gap between a power electrode and a ground electrode and arranging a dielectric diaphragm member, defining one or more holes or slits, in the middle of the gap. To achieve the above aim, the present invention provides a liquid medium plasma discharge generating apparatus comprising: a main body; a power electrode, provided at one side within the main body, for receiving electric power; a diaphragm member provided within the main body, and consisting of a dielectric defining one or more holes or slits; and a liquid medium charged inside the main body, wherein a ground electrode may be further provided in the main body, opposite the power electrode with the diaphragm member therebetween, whereupon the diaphragm member is arranged contacting the ground electrode.
摘要翻译：本发明涉及一种液体介质等离子体放电产生装置，其目的在于提供一种微管液体介质等离子体放电产生装置，其能够通过使传导电流最小化而实现即使在低瓦数下也施加高电场，功率电极与接地电极之间的间隙，以及在间隙的中间布置电介质隔膜部件，限定一个或多个孔或狭缝。为实现上述目的，本发明提供一种液体介质等离子体放电发生装置，包括：主体; 功率电极，设置在主体内的一侧，用于接收电力; 设置在主体内并由限定一个或多个孔或狭缝的电介质组成的隔膜部件; 以及填充在所述主体内部的液体介质，其中，在所述主体中还可以设置接地电极，所述接地电极与所述功率电极隔着所述隔膜部件相对，从而所述隔膜部件与所述接地电极接触。

2. 发明专利

HUE037466T2 Porplazma kezelõ berendezés 未知
公开(公告)号：HUE037466T2
公开(公告)日：2018-08-28
申请号：HUE13862200
申请日：2013-12-06
申请人： KOREA BASIC SCIENCE INST
发明人： SEOK DONG CHAN , JUNG YONG HO , JEONG HYUN YOUNG
IPC分类号： B01J19/08 , B01J2/00 , H01J37/32 , H05H1/24 , H05H1/42

3. 发明专利

SG178616A1 LIQUID MEDIUM PLASMA DISCHARGE GENERATING APPARATUS 未知
公开(公告)号：SG178616A1
公开(公告)日：2012-04-27
申请号：SG2012015640
申请日：2010-07-21
申请人： KOREA BASIC SCIENCE INST
发明人： SEOK DONG CHAN , LOH TAI HYEOP , YOO SEUNG RYUL , HONG YONG CHEOL , LEE BONG JU
IPC分类号： C25B9/19
摘要： ]The present invention relates to a liquid medium plasma discharge generating apparatus, and has the aim of providing a microtube liquid medium plasma discharge generating apparatus,5 capable of applying a high electric field even with low wattage by minimizing conduction current, by filling a liquid medium in a gap between a power electrode and a ground electrode and arranging a dielectric diaphragm member, defining one or more holes or slits, in the middle of the gap. To achieve the above10 aim, the present invention provides a liquid medium plasma discharge generating apparatus comprising: a main body; a power electrode, provided at one side within the main body, for receiving electric power; a diaphragm member provided within the main body, and consisting of a dielectric defining one or15 more holes or slits; and a liquid medium charged inside the main body, wherein a ground electrode may be further provided in the main body, opposite the power electrode with the diaphragm member therebetween, whereupon the diaphragm member is arranged contacting the ground electrode.

4. 发明专利

PL2929932T3 Urządzenie do plazmowej obróbki proszku 未知
公开(公告)号：PL2929932T3
公开(公告)日：2018-08-31
申请号：PL13862200
申请日：2013-12-06
申请人： KOREA BASIC SCIENCE INST
发明人： SEOK DONG CHAN , JUNG YONG HO , JEONG HYUN YOUNG
IPC分类号： B01J19/08 , B01J2/00 , H01J37/32 , H05H1/24 , H05H1/42

5. 发明公开

EP2475230A4 LIQUID MEDIUM PLASMA DISCHARGE GENERATING APPARATUS 审中-公开
标题翻译：装置确保液体等离子体放电
公开(公告)号：EP2475230A4
公开(公告)日：2015-04-01
申请号：EP10813882
申请日：2010-07-21
申请人： KOREA BASIC SCIENCE INST
发明人： SEOK DONG CHAN , LOH TAI HYEOP , YOO SEUNG RYUL , HONG YONG CHEOL , LEE BONG JU
IPC分类号： H05H1/24
CPC分类号： H05H1/2406 , H05H2001/2412

6. 发明公开

EP2716305A4 APPARATUS FOR MEDICAL STERILIZATION USING PLASMA 有权转让
标题翻译：设备用于医疗绝育等离子对
公开(公告)号：EP2716305A4
公开(公告)日：2014-12-24
申请号：EP12792482
申请日：2012-06-04
申请人： KOREA BASIC SCIENCE INST
发明人： SEOK DONG CHAN , LHO TAI HYEOP
IPC分类号： A61L2/22 , A61L2/12 , A61L2/14 , A61L2/26
CPC分类号： A61L2/14 , A61L2/208 , A61L2202/11 , A61L2202/24 , H05H1/46 , H05H2001/4622 , H05H2245/1225
摘要： The present invention relates to an apparatus for sterilization which may be applied to a medical dry sterilizer, and more particularly, to an apparatus which injects hydrogen peroxide so as to generate plasma and OH radicals which are effective in sterilization, so as to achieve the sterilization of a treated object. According to the present invention, the apparatus for sterilization comprises: a sterilizing reactor in which sterilization is performed on a treated object; a vacuuming unit which is equipped with a vacuum pump connected to the sterilizing reactor and which vacuumizes the interior of the sterilizing reactor; a hydrogen-peroxide supply unit which supplies hydrogen peroxide in a gas state to the interior of the sterilizing reactor; and a microwave-plasma generating unit which generates plasma using microwaves. The microwave-plasma generating unit is provided with an electromagnetic-wave generating source which generates microwaves; a plasma-generating unit which interconnects the hydrogen-peroxide supply unit and the sterilizing reactor such that hydrogen peroxide is supplied to the sterilizing reactor, and which generates plasma using microwaves; and a microwave guide which delivers the microwaves generated from the electromagnetic-wave generating source to the plasma-generating unit.

7. 发明公开

EP2929933A4 POWDER PLASMA TREATMENT APPARATUS 有权转让
标题翻译：粉末等离子治疗设备
公开(公告)号：EP2929933A4
公开(公告)日：2016-07-13
申请号：EP13862922
申请日：2013-12-06
申请人： KOREA BASIC SCIENCE INST
发明人： SEOK DONG CHAN , JUNG YONG HO , JEONG HYUN YOUNG
IPC分类号： B01J19/08 , B01J2/00 , H01J37/32 , H05H1/24 , H05H1/42 , H05H1/48
CPC分类号： H01J37/32568 , B01J19/088 , B01J2219/0835 , B01J2219/0879 , H01J37/32348 , H05H1/48 , H05H2001/2412
摘要： A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus includes: a chamber configured to perform plasma processing on a powder; a powder supply unit disposed in an upper portion of the chamber; and a plurality of plate-like surface discharge plasma modules disposed below the powder supply unit and positioned within the chamber, wherein surfaces of the surface discharge plasma modules are spaced apart from each other. According to the powder plasma processing apparatus, the powder can be uniformly processed, and the time that the powder spends in contact with the plasma can be controlled, thereby allowing efficient powder processing to be performed.

8. 发明公开

EP2929932A4 POWDER PLASMA TREATMENT APPARATUS 有权转让
标题翻译： PULVERPLASMABEHANDLUNGSVORRICHTUNG
公开(公告)号：EP2929932A4
公开(公告)日：2016-07-13
申请号：EP13862200
申请日：2013-12-06
申请人： KOREA BASIC SCIENCE INST
发明人： SEOK DONG CHAN , JUNG YONG HO , JEONG HYUN YOUNG
IPC分类号： B01J19/08 , B01J2/00 , H01J37/32 , H05H1/24 , H05H1/42
CPC分类号： H01J37/32532 , B01J19/088 , B01J2219/083 , B01J2219/0879 , H01J37/32009 , H01J37/32348 , H01J37/32568 , H05H1/2406 , H05H2001/2412 , H05H2001/2431
摘要： A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a cylindrical surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the cylindrical surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the cylindrical surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the cylindrical surface discharge plasma module.

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