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1. 发明申请

WO2012176996A3 INJECTION MEMBER USED IN THE MANUFACTURE OF A SEMICONDUCTOR, AND SUBSTRATE TREATMENT APPARATUS HAVING SAME 审中-公开
标题翻译：在半导体制造中使用的注射成员和具有该半导体的基板处理装置
公开(公告)号：WO2012176996A3
公开(公告)日：2013-04-04
申请号：PCT/KR2012004267
申请日：2012-05-30
申请人： KOOKJE ELECTRIC KOREA CO LTD , PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL , BANG HONG JOO , KIM MIN SEOK
发明人： PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL , BANG HONG JOO , KIM MIN SEOK
IPC分类号： H01L21/3065 , H01L21/205
CPC分类号： H01L21/02104 , B05B1/005 , H01J37/3244 , H01L21/68764 , H01L21/68771
摘要： The present invention relates to a substrate treatment apparatus. The substrate treatment apparatus comprises: a process chamber receiving a plurality of substrates in order to perform a plasma treatment process; a support member installed within the process chamber in order to mount the plurality of substrates on the same plane thereof; an injection member installed opposite the support member and including a plurality of independent baffles for independently injecting at least one reaction gas and a purge gas into positions corresponding to the plurality of substrates placed on the support member; and a driving part for rotating the support member or the injection member so that the baffles of the injection member are successively rotated toward the upper sides of the plurality of substrates placed on the support member. The injection member comprises a plasma generator, installed on at least one baffle for injecting the reaction gas from the plurality of baffles, for plasmarizing the reaction gas to be injected onto the substrates.
摘要翻译：本发明涉及一种基板处理装置。基板处理装置包括：处理室，其接收多个基板以执行等离子体处理工艺; 安装在处理室内的支撑件，以将多个基板安装在同一平面上; 喷射构件，其安装在所述支撑构件的对面并且包括多个独立的挡板，用于独立地将至少一个反应气体和吹扫气体喷射到与放置在所述支撑构件上的所述多个基板相对应的位置中; 以及用于使支撑构件或喷射构件旋转的驱动部件，使得喷射构件的挡板朝向位于支撑构件上的多个基板的上侧依次旋转。注射构件包括等离子体发生器，其安装在至少一个挡板上，用于从多个挡板喷射反应气体，用于使待注射到基底上的反应气体均匀化。

2. 发明公开

KR20120011232A Substrate susceptor and depositon apparatus using sysceptor 有权
标题翻译：使用SYSCEPTOR的衬底不锈钢和沉积设备
公开(公告)号：KR20120011232A
公开(公告)日：2012-02-07
申请号：KR20100072963
申请日：2010-07-28
申请人： KOOKJE ELECTRIC KOREA CO LTD
发明人： PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL
IPC分类号： H01L21/205 , H01L21/683
CPC分类号： C23C16/46 , C23C16/45551 , C23C16/45565 , C23C16/4581 , C23C16/4584 , H01L21/67109 , H01L21/68764 , H01L21/68771
摘要： PURPOSE: A substrate susceptor and a deposition apparatus including the same are provided to utilize thermal energy for heating a substrate. CONSTITUTION: A processing chamber(100) comprises an exhaust duct(120) and an exhaust pipe(114). A substrate susceptor(200) is installed in the internal space of the processing chamber. A spraying member(300) respectively sprays a gas to four substrates placed on the substrate susceptor. The spraying member receives first and second reaction gases and a purge gas from a supply member(400). The supply member comprises a first gas supply member(410a), a second gas supply member(410b), and a purge gas supply member(420).
摘要翻译：目的：提供一种衬底感受体和包括该衬底感光体的沉积设备以利用热能来加热衬底。构成：处理室（100）包括排气管（120）和排气管（114）。衬底基座（200）安装在处理室的内部空间中。喷射构件（300）分别将气体喷射到放置在基板基座上的四个基板上。喷射构件从供应构件（400）接收第一和第二反应气体和净化气体。供给构件包括第一气体供给构件（410a），第二气体供给构件（410b）和净化气体供给构件（420）。

3. 发明授权

KR101108577B1 Tape heater 有权
标题翻译：胶带加热器
公开(公告)号：KR101108577B1
公开(公告)日：2012-01-30
申请号：KR20100072964
申请日：2010-07-28
申请人： KOOKJE ELECTRIC KOREA CO LTD
发明人： PARK YONG SUNG , LEE SUNG KWANG , KIM DONG YEUL
IPC分类号： H01L21/02 , H01L21/205
CPC分类号： H01L21/67098 , F16L53/30 , F16L55/1686
摘要： PURPOSE: A tape heater is provided to be universally used regardless of the size of a pipe and to be easily installed to the pipe. CONSTITUTION: The heat generation film part(100) of a tape form is includes a heating element(130) in inside. A first film sheet and a second film sheet support the heating element. A keeping warm film part(200) is provided to be stepped from the upper side of the heat generation film part and covers the upper side of the heat generation film part. The keeping warm film part comprises a connecting part which is bonded to a part of the upper side of the heat generation film part and a cover part which covers the upper side of the heat generation film part which is exposed. A velcro fastener is installed in the upper side of the heat generation film part and the bottom surface of the cover part.
摘要翻译：目的：无论管道的尺寸如何，都能提供普遍使用的带式加热器，并且易于安装到管道上。构成：带状的发热膜部分（100）包括内部的加热元件（130）。第一膜片和第二膜片支撑加热元件。保温膜部（200）从发热膜部的上侧设置为阶梯状，覆盖发热膜部的上侧。保温膜部分包括粘合到发热膜部分的上侧的一部分的连接部分和覆盖发热膜部分的暴露的上侧的盖部分。天花布紧固件安装在发热膜部分的上侧和盖部分的底表面上。

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