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    • 4. 发明申请
    • SEMICONDUCTOR DEVICE WITH A BIPOLAR TRANSISTOR AND METHOD OF MANUFACTURING SUCH A DEVICE
    • 具有双极晶体管的半导体器件及制造这种器件的方法
    • WO2007036861A2
    • 2007-04-05
    • PCT/IB2006/053446
    • 2006-09-22
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.MEUNIER-BEILLARD, PhilippeDUFFY, Raymond, J.AGARWAL, PrabhatHURKX, Godefridus, A., M.
    • MEUNIER-BEILLARD, PhilippeDUFFY, Raymond, J.AGARWAL, PrabhatHURKX, Godefridus, A., M.
    • H01L29/7378H01L29/0817H01L29/66242
    • The invention relates to a semiconductor device (10) with a substrate and a semiconductor body of silicon comprising a bipolar transistor with an emitter region (1), a base region (2) and a collector region (3) which are respectively of the N-type conductivity, the P-type conductivity and the N-type conductivity by the provision of suitable doping atoms, wherein the base region (2) comprises a mixed crystal of silicon and germanium, the base region (2) is separated from the emitter region by an intermediate region (22) of silicon having a doping concentration which is lower than the doping concentration of the emitter region (1) and with a thickness smaller than the thickness of the emitter region (1) and the emitter region (1) comprises a sub-region comprising a mixed crystal of silicon and germanium which is positioned at the side of emitter region (1) remote from the intermediate region (22). According to the invention, the sub-region comprising the mixed crystal of silicon and germanium extend substantially through the whole emitter region (1) up to the interlace with the intermediate region (22) and the doping atoms of the emitter region (1) are arsenic atoms. Such a device has a very steep n-type doping profile (50) and a very steep p- type doping profile (20) at or within the intermediate region (22) and thus excellent high- frequency behavior with a high cut-off frequency (fr). Preferably the emitter region (1) is doped with an arsenic implantation (I) in its upper half, the final doping profile being formed after an RTA. The invention also comprises a method of manufacturing a device (10) according to the invention.
    • 本发明涉及一种具有衬底和硅半导体主体的半导体器件(10),该半导体主体包括具有发射极区(1),基极区(2)和集电极区( 3),其通过提供合适的掺杂原子分别具有N型导电性,P型导电性和N型导电性,其中基极区(2)包括硅和锗的混合晶体,基极区 (2)通过掺杂浓度低于发射极区域(1)的掺杂浓度并且厚度小于发射极区域(1)的厚度的中间区域(22)与发射极区域分开 )并且发射极区(1)包括包含位于发射极区(1)的远离中间区(22)侧的硅和锗的混合晶体的子区。 根据本发明,包含硅和锗的混合晶体的子区域基本上延伸穿过整个发射极区域(1),直到与中间区域(22)交织并且发射极区域(1)的掺杂原子是 砷原子。 这种器件在中间区域(22)处或内部具有非常陡峭的n型掺杂分布(50)和非常陡峭的p型掺杂分布(20),因此具有高截止频率 (FR)。 优选地,发射极区(1)在其上半部分掺杂有砷注入(I),最终的掺杂分布在RTA之后形成。 本发明还包括制造根据本发明的装置(10)的方法。
    • 6. 发明申请
    • CURRENT MIRROR
    • 目前的镜子
    • WO2004081687A1
    • 2004-09-23
    • PCT/IB2004/050169
    • 2004-03-01
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.VEENSTRA, HugoHURKX, Godefridus, A., M.BREKELMANS, Johannes, H., A.VAN GOOR, Dave, W.
    • VEENSTRA, HugoHURKX, Godefridus, A., M.BREKELMANS, Johannes, H., A.VAN GOOR, Dave, W.
    • G05F3/26
    • G05F3/265
    • The present invention relates to Current mirror for generating a constant mirror ratio, comprising an output transistor (T ou t) having a base, an emitter and a collector, wherein a current flowing through the collector of said output transistor (T out ) constitutes an output current (l out ) of said current mirror and the collector of said output transistor (T out ) is connectable to an output circuit, a buffer transistor having a base, an emitter and a collector, wherein the emitter of the buffer transistor is connected to the base of the output transistor, a buffer current source for providing a fixed buffer current, wherein said buffer current source is connected to the collector of the buffer transistor, and a buffer base voltage control means having an input connected to the base of the output transistor and an output connected to the base of the buffer transistor, wherein the base voltage control means is adapted to controlling a voltage at the base of the buffer transistor in response to a current at the input of the buffer base voltage control means.
    • 本发明涉及用于产生恒定镜面比例的电流镜,其包括具有基极,发射极和集电极的输出晶体管(Tout),其中流过所述输出晶体管(Tout)的集电极的电流构成输出电流( 所述电流镜的反射镜和所述输出晶体管(Tout)的集电极可连接到输出电路,具有基极,发射极和集电极的缓冲晶体管,其中所述缓冲晶体管的发射极连接到所述输出晶体管的基极 输出晶体管,用于提供固定缓冲电流的缓冲电流源,其中所述缓冲电流源连接到缓冲晶体管的集电极,以及缓冲器基极电压控制装置,其具有连接到输出晶体管的基极的输入端和输出端 连接到缓冲晶体管的基极,其中基极电压控制装置适于响应于控制缓冲晶体管的基极处的电压 到缓冲器基极电压控制装置的输入端的电流。
    • 8. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 半导体器件及其制造方法
    • WO2006011073A1
    • 2006-02-02
    • PCT/IB2005/052267
    • 2005-07-07
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.HURKX, Godefridus, A., M.AGARWAL, PrabhatHIJZEN, ErwinHUETING, Raymond, J. E.
    • HURKX, Godefridus, A., M.AGARWAL, PrabhatHIJZEN, ErwinHUETING, Raymond, J. E.
    • H01L29/08
    • H01L29/0821B82Y10/00H01L29/06H01L29/0665H01L29/0673H01L29/0676H01L29/08H01L29/423H01L29/42304H01L29/66242H01L29/737H01L29/7378
    • The invention relates to a semiconductor device (10) with a substrate (11) and a semiconductor body (12) comprising a vertical bipolar transistor with an emitter region, a base region and a collector region (1, 2, 3) of, respectively, a first conductivity type, a second conductivity type opposite to the first conductivity type and the first conductivity type, wherein the collector region (3) comprises a first sub-region (3A) bordering the base region (2) and a second sub-region (3B) bordering the first sub-region (3A) which has a lower doping concentration than the second sub-region (3B), and the transistor is provided with a gate electrode (5) which laterally borders the first sub-region (3A) and by means of which the first sub-region (3A) may be depleted. According to the invention the collector region (3) borders the surface of the semiconductor body (12), while the emitter region (1) is recessed in the semiconductor body (12), and the collector region (3) forms part of a mesa structure (6) formed at the surface of the semiconductor body (12). Such a device (10) has very favorable properties at high frequencies and high voltages and, moreover, is easy to manufacture. In a preferred embodiment the collector (3) comprises a nanowire (30) forming the mesa structure (6).
    • 本发明涉及一种具有衬底(11)和半导体本体(12)的半导体器件(10),该半导体器件包括分别具有发射极区,基极区和集电极区(1,2,3)的垂直双极晶体管 ,第一导电类型,与第一导电类型和第一导电类型相反的第二导电类型,其中集电极区域(3)包括与基极区域(2)接壤的第一子区域(3A) 与第二子区域(3A)接合的第一子区域(3A)的区域(3B),其具有比第二子区域(3B)低的掺杂浓度,并且晶体管设置有与第一子区域横向相邻的栅电极(5) 3A),并且借助于此可以使第一子区域(3A)耗尽。 根据本发明,集电极区域(3)与半导体本体(12)的表面相接触,而发射极区域(1)凹入半导体本体(12)中,并且集电极区域(3)形成台面的一部分 结构(6)形成在半导体本体(12)的表面。 这种装置(10)在高频和高电压下具有非常有利的特性,而且易于制造。 在优选实施例中,收集器(3)包括形成台面结构(6)的纳米线(30)。
    • 10. 发明申请
    • CURRENT MIRROR
    • 目前的镜子
    • WO2004081688A1
    • 2004-09-23
    • PCT/IB2004/050172
    • 2004-03-01
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.VEENSTRA, HugoHURKX, Godefridus, A., M.BREKELMANS, Johannes, H., A.VAN GOOR, Dave, W.
    • VEENSTRA, HugoHURKX, Godefridus, A., M.BREKELMANS, Johannes, H., A.VAN GOOR, Dave, W.
    • G05F3/26
    • H03F3/3432G05F3/265
    • Current mirror generating a constant mirror ration comprising a bias current generator (12). The bias current generator (12) generates a bias current (Ib) in a bias conductor connected to the base of the output transistor (T out) and is controlled by the output voltage (U out) at the collector of the output transistor (T out). The purpose of the bias current generator (12) is to prevent an avalanche base current from affecting the base-emitter voltage of the output transistor (T out) and thereby increase the output current. The output transistor (T out) may thus be operated with collector-emitter voltages exceeding the breakdown voltage BVCEO without affecting the accuracy of the current mirror. The bias current generator (12) is further adapted to generating no bias current (Ib) until the output voltage (U out) has reached a predetermined value, thus reducing the power dissipation at low output voltages.
    • 电流镜产生包括偏置电流发生器(12)的恒定镜像比。 偏置电流发生器(12)在连接到输出晶体管(T out)的基极的偏置导体中产生偏置电流(Ib),并由输出晶体管(T)的集电极处的输出电压(U out)控制 出)。 偏置电流发生器(12)的目的是防止雪崩基极电流影响输出晶体管的基极 - 发射极电压(T out),从而增加输出电流。 因此,输出晶体管(T out)可以在超过击穿电压BVCEO的集电极 - 发射极电压下工作,而不会影响电流镜的精度。 偏置电流发生器(12)还适于不产生偏置电流(Ib),直到输出电压(U out)达到预定值,从而降低在低输出电压下的功率消耗。