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    • 7. 发明专利
    • PRETREATMENT IN POLISHING OF ALUMINUM SUBSTRATE FOR HDD
    • JPH0963048A
    • 1997-03-07
    • JP20962595
    • 1995-08-17
    • KOBE STEEL LTD
    • HAYASHI YUICHIFUJIMOTO HIDEO
    • G11B5/84
    • PROBLEM TO BE SOLVED: To accelerate the substrate working (polishing) speed of a blank, to improve the productivity of the substrate and to decrease the margins for polishing of an Ni-P plating film after Ni-P plating by limiting a phosphoric acid bath before polishing, the temp. of a mixed acid bath, the concn. of phosphoric acid, the concn. of nitric acid, the concn. of the total acids and immersion time. SOLUTION: The aluminum substrate (blank) for HDD is immersed for 10 to 180 seconds in the phosphoric acid bath of 3 to 30wt.% phosphoric acid concn. at 30 to 80 deg.C or the mixed acid bath (total acid concn.: 5 to 40wt.%) contg. 3 to 30wt.% phosphoric acid concn. and 2 to 30% nitric acid concn. at 30 to 80 deg.C prior to polishing. The oxidized film layer of the blank is thus removed by one time of the immersion stage without the occurrence of overetching of the surface. As a result, the polishing speed of the blank is accelerated, the productivity of the substrate is improved and the margins for polishing of the Ni-P plating film after the Ni-P plating on the substrate are decreased.