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1. 发明申请

WO2013188547A1 LINEAR STAGE AND METROLOGY ARCHITECTURE FOR REFLECTIVE ELECTRON BEAM LITHOGRAPHY 审中-公开
标题翻译：用于反射电子束光刻的线性阶段和计量结构
公开(公告)号：WO2013188547A1
公开(公告)日：2013-12-19
申请号：PCT/US2013/045431
申请日：2013-06-12
申请人： KLA-TENCOR CORPORATION
发明人： UMMETHALA, Upendra , HALE, Layton , CLYNE, Josh , NAYFEH, Samir , WILLIAMS, Mark , DIREGOLO, Joseph , WILSON, Andrew
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G01B11/02 , B82Y10/00 , B82Y40/00 , G01B11/14 , G01B21/16 , G03F7/70716 , G03F7/70775 , G03F7/70816 , H01J37/20 , H01J37/244 , H01J37/3174 , H01J2237/2445 , H01J2237/24578 , H01J2237/30433 , H01J2237/30438
摘要： A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.
摘要翻译：适用于REBL的舞台计量包括配置成测量短行晶片扫描台的位置和旋转的干涉仪台计量系统，其中干涉仪计量系统包括用于每个测量轴的两个或更多个干涉仪，其中第一干涉仪镜是设置在短冲程晶片扫描台的第一表面上，第二干涉仪镜设置在短行晶片扫描台的第二表面上;以及控制系统，被配置为使用两个第二干涉仪来确定第一干涉仪镜的形状误差或更多的来自与第一干涉仪镜相关联的两个或更多个干涉仪的干涉仪测量，以及使用来自与第二干涉仪镜相关联的两个或更多个干涉仪的两个或更多个干涉仪测量的第二干涉仪镜的形状误差。

2. 发明申请

WO2013155232A1 ARRANGEMENT OF RETICLE POSITIONING DEVICE FOR ACTINIC INSPECTION OF EUV RETICLES 审中-公开
标题翻译：用于非法检验EUV RETICLES的定位装置的安排
公开(公告)号：WO2013155232A1
公开(公告)日：2013-10-17
申请号：PCT/US2013/036041
申请日：2013-04-10
申请人： KLA-TENCOR CORPORATION
发明人： SUBRAHMANYAN, Pradeep , WILLIAMS, Mark , NAYFEH, Samir
IPC分类号： G03F1/84 , G03B27/62
CPC分类号： G01N21/01 , G03F1/84
摘要： A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a magnetically suspended upper stage with a long travel in a "y" direction and a magnetically suspended lower stage with a long travel in an "x" direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the "y" direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end. The tube passes from the cable stage through the inspection chamber through a seal in the chamber wall and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.
摘要翻译：一种用于光化性EUV掩模版检查的掩模版定位装置，包括密封检查室，其包含用于光阑EUV掩模版检查的掩模版定位装置的掩模版平台，所述掩模版平台包括密封检查室，所述密封检查室包含用于保持掩模版的掩模版台。标线片台具有在“y”方向上具有长行程的磁悬浮上段和在“x”方向上具有长行程的磁悬浮下级; 以及通过电缆室壁与检查室隔离的电缆平台室。电缆平台室具有可沿“y”方向移动的电缆台; 以及在另一端连接到标线片台和电缆台的一端的管。管从电缆台通过检查室通过室壁中的密封件并且进入电缆入口室，用于进入电缆级室内的电缆和软管，该电缆和软管通过管道到达标线片级。

3. 发明申请

WO2013036615A1 LINEAR STAGE FOR REFLECTIVE ELECTRON BEAM LITHOGRAPHY 审中-公开
标题翻译：用于反射电子束光刻的线性阶段
公开(公告)号：WO2013036615A1
公开(公告)日：2013-03-14
申请号：PCT/US2012/053927
申请日：2012-09-06
申请人： KLA-TENCOR CORPORATION , UMMETHALA, Upendra , HALE, Layton , CLYNE, Joshua , NAYFEH, Samir , WILLIAMS, Mark , DIREGOLO, Joseph , WILSON, Andrew
发明人： UMMETHALA, Upendra , HALE, Layton , CLYNE, Joshua , NAYFEH, Samir , WILLIAMS, Mark , DIREGOLO, Joseph , WILSON, Andrew
IPC分类号： H01L21/673
CPC分类号： G03F7/70716 , B82Y10/00 , B82Y40/00 , G03F7/70758 , G03F7/70766 , H01J37/20 , H01J37/3174 , H01J2237/20221 , H01J2237/31774 , H01J2237/31789
摘要： A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis.
摘要翻译：适用于REBL的线性堆叠级可以包括第一上部快速级，其被配置为沿着第一轴沿第一方向平移第一多个晶片，所述第一上部快速级被配置为固定第一多个晶片; 第二上快速级，被配置为沿第一轴在第二方向上平移第二多个晶片，第二上快速级被配置为固定第二多个晶片，第二方向与第一方向相反，其中，第一上快速阶段和第二上快速阶段的平移被配置为基本上消除由第一上快速阶段和第二上快速阶段的运动产生的惯性反作用力; 以及载体台，其构造成沿着第二轴平移所述第一和第二上部快速级。

4. 发明授权

EP2836874B1 ARRANGEMENT OF RETICLE POSITIONING DEVICE FOR ACTINIC INSPECTION OF EUV RETICLES 有权
公开(公告)号：EP2836874B1
公开(公告)日：2018-08-01
申请号：EP13775812.4
申请日：2013-04-10
申请人： Kla-Tencor Corporation
发明人： SUBRAHMANYAN, Pradeep , WILLIAMS, Mark , NAYFEH, Samir
IPC分类号： G03F1/84 , G03B27/62 , G03F7/20
CPC分类号： G01N21/01 , G03F1/84
摘要： A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a magnetically suspended upper stage with a long travel in a “y” direction and a magnetically suspended lower stage with a long travel in an “x” direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the “y” direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end. The tube passes from the cable stage through the inspection chamber through a seal in the chamber wall and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.

5. 发明公开

EP2836874A1 ARRANGEMENT OF RETICLE POSITIONING DEVICE FOR ACTINIC INSPECTION OF EUV RETICLES 有权
标题翻译：安排RETIKELPOSITIONIERUNGSVORRICHTUNG辐射调查EUV光罩作者：
公开(公告)号：EP2836874A1
公开(公告)日：2015-02-18
申请号：EP13775812.4
申请日：2013-04-10
申请人： Kla-Tencor Corporation
发明人： SUBRAHMANYAN, Pradeep , WILLIAMS, Mark , NAYFEH, Samir
IPC分类号： G03F1/84 , G03B27/62
CPC分类号： G01N21/01 , G03F1/84
摘要： A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a magnetically suspended upper stage with a long travel in a "y" direction and a magnetically suspended lower stage with a long travel in an "x" direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the "y" direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end. The tube passes from the cable stage through the inspection chamber through a seal in the chamber wall and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.

6. 发明公开

EP2859577A1 LINEAR STAGE AND METROLOGY ARCHITECTURE FOR REFLECTIVE ELECTRON BEAM LITHOGRAPHY 无效
标题翻译：线性步长和测量基础结构反映电子光刻
公开(公告)号：EP2859577A1
公开(公告)日：2015-04-15
申请号：EP13804795.6
申请日：2013-06-12
申请人： Kla-Tencor Corporation
发明人： UMMETHALA, Upendra , HALE, Layton , CLYNE, Josh , NAYFEH, Samir , WILLIAMS, Mark , DIREGOLO, Joseph , WILSON, Andrew
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G01B11/02 , B82Y10/00 , B82Y40/00 , G01B11/14 , G01B21/16 , G03F7/70716 , G03F7/70775 , G03F7/70816 , H01J37/20 , H01J37/244 , H01J37/3174 , H01J2237/2445 , H01J2237/24578 , H01J2237/30433 , H01J2237/30438
摘要： A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

7. 发明公开

EP2754173A1 LINEAR STAGE FOR REFLECTIVE ELECTRON BEAM LITHOGRAPHY 无效
标题翻译：线性平台反映电子版画
公开(公告)号：EP2754173A1
公开(公告)日：2014-07-16
申请号：EP12829998.9
申请日：2012-09-06
申请人： Kla-Tencor Corporation
发明人： UMMETHALA, Upendra , HALE, Layton , CLYNE, Joshua , NAYFEH, Samir , WILLIAMS, Mark , DIREGOLO, Joseph , WILSON, Andrew
IPC分类号： H01L21/673
CPC分类号： G03F7/70716 , B82Y10/00 , B82Y40/00 , G03F7/70758 , G03F7/70766 , H01J37/20 , H01J37/3174 , H01J2237/20221 , H01J2237/31774 , H01J2237/31789
摘要： A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis.

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