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    • 4. 发明专利
    • HIGH SENSITIVITY REPEATER DEFECT DETECTION
    • SG11201903715XA
    • 2019-05-30
    • SG11201903715X
    • 2017-11-08
    • KLA TENCOR CORP
    • BRAUER BJORNBHATTACHARYYA SANTOSHSHIFRIN EUGENELEE HUCHENGMURRAY BENJAMINMATHEW ASHOKBHASKAR CHETANAGAO LISHENG
    • G01N21/95G01N21/88
    • INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 1#111011110111010101111101 11010011111111011110 HE 10111011111011110111111 Organization International Bureau (10) International Publication Number (43) International Publication Date .....0\"\" WO 2018/089459 Al 17 May 2018 (17.05.2018) WIPO I PCT (51) International Patent Classification: Santosh; 5540 Cooney Place, San Jose, California 95123 GO1N 21/95 (2006.01) GO1N 21/88 (2006.01) (US). SHIFRIN, Eugene; 463 Liquidambar Way, Sunny- vale, California 94086 (US). LEE, Hucheng; 1159 Kent- (21) International Application Number: wood Avenue, Cupertino, California 95014 (US). MUR- PCT/US2017/060589 RAY, Benjamin; 17261 NW LaPaloma Lane, Beaver- (22) International Filing Date: ton, California 97006 (US). MATHEW, Ashok; 34782 Si- 08 November 2017 (08.11.2017) ward Drive, Fremont, California 94539 (US). BHASKAR, (25) Filing Language: English Chetana; 1061 Queensbridge Court, San Jose, California 95120 (US). GAO, Lisheng; 21164 Toll Gate Road, Sarato- (26) Publication Language: English ga, California 95070 (US). (30) Priority Data: (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corp., 62/420,409 10 November 2016 (10.11.2016) US Legal Department, One Technology Drive, Milpitas, Cali- 62/443,810 09 January 2017 (09.01.2017) US fornia 95035 (US). 62/455,948 07 February 2017 (07.02.2017) US (81) Designated States (unless otherwise indicated, for every 15/804,980 06 November 2017 (06.11.2017) US kind of national protection available): AE, AG, AL, AM, (71) Applicant: KLA-TENCOR CORPORATION [US/US]; AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, Legal Department, One Technology Drive, Milpitas, Cali- CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, fornia 95035 (US). DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, (72) Inventors: BRAUER, Bjorn; 16698 NW Tucson Street, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, _ Beaverton, Oregon 97006 (US). BHATTACHARYYA, = = (54) Title: HIGH SENSITIVITY REPEATER DEFECT DETECTION = — = Computer subsystem(s) 300 _ _ = = = — = 28 26 24 20 16 18 2 1 ill. '' •• 34 /-10 I A os % 32 = , No = 14 30 = 22 = = Fig. 1 ,-, .. 11 (57) : Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that CN include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main 7 1. user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the C:N user, and an interface component that provides an interface between the one or more image processing components and the main user °O interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect 0 ---. detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, *1 : and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects 11 c;;;; ) that are repeater defects. N O [Continued on next page] WO 2018/089459 Al MIDEDIMOMOIDEIREEMOOMMEIMOHNOCHINVOIMIE MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))